Tool List: Difference between revisions
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* [[Stepper 1]] |
* [[Stepper 1]] |
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* [[Stepper 2]] |
* [[Stepper 2]] |
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* [[Stepper 3]] |
* [[Stepper 3 (ASML)]] |
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* [[E-Beam Lithography System]] |
* [[E-Beam Lithography System]] |
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Revision as of 00:40, 28 June 2012
Lithography
Vacuum Deposition
Dry Etch
Wet Processing
Thermal Processing
Packaging
Inspection, Test and Characterization
- Field Emission SEM 1
- Field Emission SEM 2
- Step Profile
- Step Profilometer
- Ellipsometer
- Microscopes
- Probe Station & Curve Tracer
- Optical Film Thickness (Filmetrics)
- Scanning Probe Microscope
- Tencor Flexus Film Stress
- Optical Film Thickness (Nanometric)
- SEM Sample Coater
- Surface Analysis
- Photo-emission & IR Microscope
- Ellipsometer (Woollam)
- Goniometer
- 4-Point Probe Resistivity Mapper