PECVD1 Recipes: Difference between revisions
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* [[media:PECVD1-SiON-Recipe.pdf|Low Stress Si<sub>3</sub>N<sub>4</sub> - Variable Stress Recipes]] |
* [[media:PECVD1-SiON-Recipe.pdf|Low Stress Si<sub>3</sub>N<sub>4</sub> - Variable Stress Recipes]] |
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* [[media:PECVD1-SiON-Recipe.pdf|Low Stress Si<sub>3</sub>N<sub>4</sub> - Variable Stress Plot]] |
* [[media:PECVD1-SiON-Recipe.pdf|Low Stress Si<sub>3</sub>N<sub>4</sub> - Variable Stress Plot]] |
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== LS SiO<sub>x</sub>N<sub>y</sub> deposition (PECVD #1) == |
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*[[media:PECVD1-SiON-Recipe.pdf|SiO<sub>x</sub>N<sub>y</sub> Deposition Recipes - Varying N/O Ratio]] |
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*[[media:PECVD1-SiON-Plot.pdf|SiO<sub>x</sub>N<sub>y</sub> Stress/Index vs. O/N Ratio]] |
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*[[media:PECVD1-LS SION recipe 2014.pdf|SiO<sub>x</sub>N<sub>y</sub> Recipe]] |
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*[https://docs.google.com/spreadsheets/d/1rixyzAAq6q08M5OwvZiDVoh3K8B566XKM-UZAQIAnsg/edit#gid=sharing SiO<sub>x</sub>N<sub>y</sub> Data December 2014] |
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*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dEttR2JSTkRoamR0SUZ4bE5QUW9uS2c&usp=sharing SiO<sub>x</sub>N<sub>y</sub> 3000A Thickness uniformity 2014] |
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== LS SiN deposition (PECVD #1) == |
== LS SiN deposition (PECVD #1) == |
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Revision as of 17:00, 10 December 2014
PECVD 1 (PlasmaTherm 790)
SiN deposition (PECVD #1)
SiO2 deposition (PECVD #1)
Other recipes (PECVD1)
- SiOxNy Recipe
- SiOxNy Data 2014
- SiOxNy 3000A Thickness uniformity 2014
- LS SiN Recipe
- LS SiN Data 2014
- LS SiN 3000A Thickness uniformity 2014