Stepper 3 (ASML DUV): Difference between revisions
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=Operating Procedures= |
=Operating Procedures= |
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* [[media:ASML_Job_Set- |
* [[media:ASML_Job_Set-Up_Guide_v2.pdf|Training Manual]] |
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* [[media:ASML_Mask_Making_Guidelines.pdf|Mask Making Guidelines]] |
* [[media:ASML_Mask_Making_Guidelines.pdf|Mask Making Guidelines]] |
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Revision as of 23:47, 10 April 2015
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About
The ASML 5500 stepper is a 248nm DUV stepper for imaging dense features down to below 200nm and isolated line structures down to below 150nm. The system has a variable NA system and has a field image size of 21 x 21mm for 0.63 NA and a field size of 22mm x 27mm for 0.4 to 0.57 NA. Overlay accuracy is better than 30nm. The system is configured for 4” wafers and pieces down to 14mm in size can be exposed using a 4” wafer as a carrier.