Molecular Vapor Deposition: Difference between revisions
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(link to nanoimprint FDTS recipe) |
(Updated contact info to Lee S.) |
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|picture=MVD.jpg |
|picture=MVD.jpg |
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|type = Vacuum Deposition |
|type = Vacuum Deposition |
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|super= |
|super= Lee Sawyer |
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|phone=(805) |
|phone=(805) 893-2123 |
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|location=Bay 4 |
|location=Bay 4 |
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|email= |
|email=lee_sawyer@ucsb.edu |
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|description = Molecular Vapor Deposition System |
|description = Molecular Vapor Deposition System |
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|manufacturer = [http://www.appliedmst.com/ Applied Microstructures Inc.] |
|manufacturer = [http://www.appliedmst.com/ Applied Microstructures Inc.] |
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Revision as of 18:36, 9 April 2019
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About
The Molecular Vapor deposition system is used for deposition of a monolayer-thick fluorocarbon film for producing extremely hydrophobic surfaces used for anti-sticking layers for nanoimprinting or anti-stiction layers for MEMS. The system has integrated Oxygen plasma cleaning for organic removal and surface activation and can be run at temperatures up to 80°C. Multi-step recipes can be created. The system is currently configured for FDTS (perflourodecyltricholorsilane) and water to producing the coatings. Up to 6” wafers can be coated in the system.
Recipes
- Nanoimprinting recipes using FDTS non-stick layer