Template:Announcements: Difference between revisions
(Updated status on CARY500, RIE5 and PECVD - deleted old announcements) |
(updates to RIE5, PECVD1) |
||
| Line 8: | Line 8: | ||
<!----------------------------------------------> |
<!----------------------------------------------> |
||
<!------------- Announcements ----------------> |
<!------------- Announcements ----------------> |
||
===== Gasonics Up ===== |
|||
===== RIE#5: Software Upgrades ===== |
===== RIE#5: Software Upgrades ===== |
||
[[RIE_5_(PlasmaTherm)|RIE#5]] |
[[RIE_5_(PlasmaTherm)|RIE#5]] system has undergone a software upgrade. |
||
All users will need to be retrained to use the new Cortex software. |
All users will need to be retrained to use the new Cortex software. |
||
// [[User: |
// [[User:John d|John d]] 14:39, 16 October 2018 (PDT) |
||
===== PECVD#1: Software Upgrade ===== |
===== PECVD#1: Software Upgrade ===== |
||
Software upgrade |
Software upgrade completed, everyone must be re-certified to use the tool. All old recipe files have been backed up but not reinstated - let us know if you need your old recipe parameters. |
||
// [[User: |
// [[User:John d|John d]] 14:39, 16 October 2018 (PDT) |
||
===== CARY500 - Down - Decomissioned ===== |
===== CARY500 - Down - Decomissioned ===== |
||
Revision as of 21:39, 16 October 2018
UCSB NanoFab Announcements
RIE#5: Software Upgrades
RIE#5 system has undergone a software upgrade. All users will need to be retrained to use the new Cortex software. // John d 14:39, 16 October 2018 (PDT)
PECVD#1: Software Upgrade
Software upgrade completed, everyone must be re-certified to use the tool. All old recipe files have been backed up but not reinstated - let us know if you need your old recipe parameters. // John d 14:39, 16 October 2018 (PDT)
CARY500 - Down - Decomissioned
CARY 500 Spectrophotometer has failed - Will not be repaired - being decomissioned. New Filmetrics F10-RT-UVX being ordered as a replacement. // Thibeault 16:40, 26 September 2018 (PDT)
RIE#5: SiCl4 Issue
We have a flow rate problem on the SiCl4 gas line. You can only flow the SiCl4 for 5 minutes and then you have to wait 5 minutes before you flow it again. So in order to to do a 10 minute Etch you will have to do it in three steps flow 5 mi, wait 5mi, then flow 5min. // John d 17:22, 15 June 2018 (PDT)