Vacuum Deposition Recipes: Difference between revisions

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| bgcolor="#eeffff" |[[PECVD Recipes#SiO2 deposition .28PECVD .231.29|R6]]
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| bgcolor="#eeffff" |[[PECVD Recipes#ICP-PECVD .28Unaxis VLR.29|R6]]
| bgcolor="#eeffff" |[[Atomic Layer Deposition Recipes#Pt deposition .28ALD CHAMBER 1.29|R4]]
| bgcolor="#eeffff" |[[Atomic Layer Deposition Recipes#Pt deposition .28ALD CHAMBER 1.29|R4]]
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Revision as of 21:13, 31 July 2024

Process Control Data

See linked page for process control data (calibration data over time, such as dep. rate, refractive index, stress etc.) over time, for a selection of highly used tools/films.

Deposition Tools/Materials Table

  • R: Recipe is available. Clicking this link will take you to the recipe.
  • A: Material is available for use, but no recipes are provided.
Vacuum Deposition Recipes

 E-Beam Evaporation Sputtering Thermal Evaporation Plasma Enhanced Chemical
Vapor Deposition (PECVD) 		Atomic Layer Deposition Molecular Vapor Deposition
Material E-Beam 1 (Sharon) E-Beam 2 (Custom) E-Beam 3 (Temescal) E-Beam 4 (CHA) Sputter 3
(AJA ATC 2000-F) 		Sputter 4
(AJA ATC 2200-V) 		Sputter 5 (AJA ATC 2200-V) Ion Beam
Deposition (Veeco Nexus) 		Thermal
Evap 1 		Thermal Evap 2 (Solder) PECVD 1
(PlasmaTherm 790) 		PECVD 2
(Advanced Vacuum) 		Unaxis VLR ICP-PECVD Atomic Layer Deposition (Oxford FlexAL) Molecular Vapor Deposition (Tool)
Ag A
A A A A








Al A
A A A R1
R1 A A




Al2O3 A A

A R1
R5




R4
AlN



A A
R1




R4
Au A
A A A R1

A A




B














C R1
CeO2
CeO2 deposition (E-Beam 2)












Co A

A R









Cr A

A R


A A




Cu A


R1 A








Fe A

A R









Ge A
A A A A








GeO2 A
Gd A

A










Hf A













HfO2



A A






R4
In








A




Ir A













ITO
ITO deposition (E-Beam 2)

A A
R1






MgF2 A A
MgO A
Mo A


R A








Nb A



R








Nd



A








Ni A
A A R1


A A




NiCr A A
NiFe A A A
Pd A
A A



A A




Pt A
A A A R1 R1





R4
Ru A

A
R






R4
Si
A

R A
R1


R3

SiN



R1 A
R6

R6 R6 R6

SiN - Low Stress R4 R6 R6
SiO2 A A

R1 A A R6

R6 R6 R6 R4
SiOxNy






R3

R4



Sn








A




SrF2
A












Ta A


R1 A
R1






Ta2O5


A


R6






Ti A
A A R1 R1 R1 R1






TiN




R
R1




R4
TiW A


A R1








TiO2
A

A R1
R5




R4
V



A A








W A


A R1








Zn







A A




ZnO












R3
Zr A

A A A








ZrO2












R4
Material E-Beam 1 (Sharon) E-Beam 2 (Custom) E-Beam 3 (Temescal) E-Beam 4 (CHA) Sputter 3
(ATC 2000-F) 		Sputter 4
(ATC 2200-V) 		Sputter 5 (ATC 2200-V) Ion Beam
Deposition (Veeco Nexus) 		Thermal
Evap 1 		Thermal Evap 2 (Solder) PECVD 1
(PlasmaTherm 790) 		PECVD 2
(Advanced Vacuum) 		Unaxis VLR ICP-PECVD Atomic Layer Deposition (Oxford FlexAl) Molecular Vapor Deposition (Tool)
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