Tube Furnace (Tystar 8300): Difference between revisions
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= About = |
= About = |
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The three stack Tystar 8” furnace is used primarily for 3 processes. The processes are dedicated for one tube each: |
The three stack Tystar 8” furnace is used primarily for 3 processes. The processes are dedicated for one tube each: |
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# Dry or wet oxidation of silicon |
# Dry or wet oxidation of silicon - Tubes 2 and 3 |
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# SOG curing - Tube 1 |
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# Dry or wet oxidation of AlGaAs (or other materials) |
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# General furnace annealing |
# General furnace annealing - Tube 3 |
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The tubes can hold up to |
The tubes can hold up to one hundred 8” wafers per tube per cycle. We have boats for various wafer sizes, including pieces. The maximum temperature is 1050°C for the system. Gases used are O<sub>2</sub>, Steam from DI-H<sub>2</sub>O, N<sub>2</sub>. |
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Under the “ambient” variable use the following:<br> |
Under the “ambient” variable use the following:<br> |
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Revision as of 18:12, 28 June 2012
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About
The three stack Tystar 8” furnace is used primarily for 3 processes. The processes are dedicated for one tube each:
- Dry or wet oxidation of silicon - Tubes 2 and 3
- SOG curing - Tube 1
- General furnace annealing - Tube 3
The tubes can hold up to one hundred 8” wafers per tube per cycle. We have boats for various wafer sizes, including pieces. The maximum temperature is 1050°C for the system. Gases used are O2, Steam from DI-H2O, N2.
Under the “ambient” variable use the following:
- Wet – 0.945
- Dry – 1.298
These numbers will give accurate growth calculations.
See Also
- Tystar - Manufacturer of the tool
- Silicon Thermal Oxide Thickness Calculator - Use this on-line calculator to calculate times for silicon oxidation.