Tube Furnace (Tystar 8300): Difference between revisions
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|super= Tony Bosch |
|super= Tony Bosch |
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|phone=(805)839-3918x217 |
|phone=(805)839-3918x217 |
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|location=Bay |
|location=Bay 4 |
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|email=bosch@ece.ucsb.edu |
|email=bosch@ece.ucsb.edu |
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|description = Tystar 8" 3-Tube Oxidation/Annealing System |
|description = Tystar 8" 3-Tube Oxidation/Annealing System |
Revision as of 18:15, 28 June 2012
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About
The three stack Tystar 8” furnace is used primarily for 3 processes. The processes are dedicated for one tube each:
- Dry or wet oxidation of silicon - Tubes 2 and 3
- SOG curing - Tube 1
- General furnace annealing - Tube 3
The tubes can hold up to one hundred 8” wafers per tube per cycle. We have boats for various wafer sizes, including pieces. The maximum temperature is 1050°C for the system. Gases used are O2, Steam from DI-H2O, N2.
See Also
- Tystar - Manufacturer of the tool
- Silicon Thermal Oxide Thickness Calculator - Use this on-line calculator to calculate times for silicon oxidation.