Tube Furnace AlGaAs Oxidation (Lindberg): Difference between revisions
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== Description == |
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The Lindberg Furnace is designed for thermal oxidation of small piece parts (less than ~2" wide), under atmospheric pressure water vapor, at temperatures around 400°C. It is commonly used for VCSEL Current Aperture oxidation, via the selective oxidation of AlGaAs layers with high Aluminum content (>95%). |
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== Procedures == |
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Please ask staff for methods of performing your oxidation using this tool. |
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== Recipes == |
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Please ask staff or frequent users of the tool, for recipes and oxidation rates. Recipes are highly dependent on your epitaxy and epitaxial structure, and the specifics of the oxidation you are trying to perform. |
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Revision as of 16:03, 16 October 2018
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Description
The Lindberg Furnace is designed for thermal oxidation of small piece parts (less than ~2" wide), under atmospheric pressure water vapor, at temperatures around 400°C. It is commonly used for VCSEL Current Aperture oxidation, via the selective oxidation of AlGaAs layers with high Aluminum content (>95%).
Procedures
Please ask staff for methods of performing your oxidation using this tool.
Recipes
Please ask staff or frequent users of the tool, for recipes and oxidation rates. Recipes are highly dependent on your epitaxy and epitaxial structure, and the specifics of the oxidation you are trying to perform.