Spin Rinse Dryer (SemiTool): Difference between revisions

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Two Spin-Rinse Dryers are available, one for 4-inch wafers and one for 6-inch wafers.

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Each has a dedicated cassette that can hold up to 25 wafers.

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The tool is set up to rinse at ~1000 rpm while spraying DI water, and then Dry in nitrogen at ~2000 rpm. A "Dry Only" option is also available.

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⚫
Two Spin-Rinse Dryers are available, one for 4-inch wafers and one for 6-inch wafers.

⚫
Each has a dedicated cassette that can hold up to 25 wafers.

⚫
The tool is set up to rinse at ~1000 rpm while spraying DI water, and then Dry in nitrogen at ~2000 rpm. A "Dry Only" option is also available.

Revision as of 00:13, 8 September 2017

Spin Rinse Dryer (SemiTool)
SpinRinse.jpg
Tool Type Wet Processing
Location Bay 7
Supervisor Don Freeborn
Supervisor Phone (805) 893-7975
Supervisor E-Mail dfreeborn@ece.ucsb.edu
Description ?
Manufacturer SemiTool



Two Spin-Rinse Dryers are available, one for 4-inch wafers and one for 6-inch wafers.

Each has a dedicated cassette that can hold up to 25 wafers.

The tool is set up to rinse at ~1000 rpm while spraying DI water, and then Dry in nitrogen at ~2000 rpm. A "Dry Only" option is also available.

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