Spin Rinse Dryer (SemiTool): Difference between revisions
Jump to navigation
Jump to search
m (tool template @ top) |
No edit summary |
||
Line 3: | Line 3: | ||
|type = Wet Processing |
|type = Wet Processing |
||
|super= Don Freeborn |
|super= Don Freeborn |
||
|location=Bay |
|location=Bay 5 |
||
|description = ? |
|description = ? |
||
|manufacturer = SemiTool |
|manufacturer = SemiTool |
Revision as of 17:22, 15 April 2020
|
Two Spin-Rinse Dryers are available, one for 4-inch wafers and one for 6-inch wafers.
Each has a dedicated cassette that can hold up to 25 wafers.
The tool is set up to rinse at ~1000 rpm while spraying DI water, and then Dry in nitrogen at ~2000 rpm. A "Dry Only" option is also available.