Direct-Write Lithography Recipes: Difference between revisions
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Photolithography Recipes for the Heidelberg MLA150 |
Photolithography Recipes for the [[Maskless Aligner (Heidelberg MLA150)|Heidelberg MLA150]]. |
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== Positive Resist (MLA150) == |
== Positive Resist (MLA150) == |
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Revision as of 06:17, 14 September 2020
 Work In Progress This article is still under construction. It may contain factual errors. Content is subject to change. |
Photolithography Recipes for the Heidelberg MLA150.
Positive Resist (MLA150)
General notes: Hotplates used, filters, laser wavelengths, etc.
| Resist | Spin Cond. | Bake | Thickness | Exposure Time | Focus Offset | PEB | Developer | Developer Time | Comments |
|---|---|---|---|---|---|---|---|---|---|
| SPR955CM0.9 | 3 krpm/30” | 95°C/60” | ~ 0.9 um | AZ300MIF |
Negative Resist (MLA150)
General notes: Hotplates used, filters, laser wavelengths, etc.
| Resist | Spin Cond. | Bake | Thickness | Exposure Time | Focus Offset | PEB | Flood | Developer | Developer Time | Comments |
|---|---|---|---|---|---|---|---|---|---|---|
| AZ5214 | 6 krpm/30” | 95°C/60” | ~ 1.0 um | 60" | AZ300MIF | 60" |
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