Bill Millerski: Difference between revisions

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* [[Stepper 2 (AutoStep 200)]]
* [[Stepper 2 (AutoStep 200)]]
* [[Ion Beam Deposition (Veeco NEXUS)]]
* [[Ion Beam Deposition (Veeco NEXUS)]]
* [[RIE 5 (PlasmaTherm)]]
* [[Rapid Thermal Processor (AET RX6)]]
* [[Rapid Thermal Processor (SSI Solaris 150)]]
* [[Step Profilometer (KLA Tencor P-7)]]
* [[Chemical-Mechanical Polisher (Logitech)]]
||
* [[XeF2 Etch (Xetch)]]
* [[Mechanical Polisher (Allied)]]
* [[Tube Furnace Wafer Bonding (Thermco)]]
* [[E-Beam 1 (Sharon)]]
* [[Resistivity Mapper (CDE RESMAP)]]
* [[Optical Film Thickness (Nanometric)]]
* [[Vapor HF Etch]]
* [[Wafer Bonder (Logitech WBS7)]]
|}
|}

Latest revision as of 15:28, 28 October 2021