Bill Millerski: Difference between revisions
Jump to navigation
Jump to search
No edit summary |
No edit summary |
||
Line 22: | Line 22: | ||
* [[Stepper 2 (AutoStep 200)]] |
* [[Stepper 2 (AutoStep 200)]] |
||
* [[Ion Beam Deposition (Veeco NEXUS)]] |
* [[Ion Beam Deposition (Veeco NEXUS)]] |
||
* [[RIE 5 (PlasmaTherm)]] |
|||
* [[Rapid Thermal Processor (AET RX6)]] |
|||
* [[Rapid Thermal Processor (SSI Solaris 150)]] |
|||
* [[Step Profilometer (KLA Tencor P-7)]] |
|||
* [[Chemical-Mechanical Polisher (Logitech)]] |
|||
|| |
|||
* [[XeF2 Etch (Xetch)]] |
|||
* [[Mechanical Polisher (Allied)]] |
|||
* [[Tube Furnace Wafer Bonding (Thermco)]] |
|||
* [[E-Beam 1 (Sharon)]] |
|||
* [[Resistivity Mapper (CDE RESMAP)]] |
|||
* [[Optical Film Thickness (Nanometric)]] |
|||
* [[Vapor HF Etch]] |
|||
* [[Wafer Bonder (Logitech WBS7)]] |
|||
|} |
|} |
Latest revision as of 15:28, 28 October 2021
|
About
.
.
.
Tools
Bill Millerski is the supervisor for the following tools.