Chemical-Mechanical Polisher (Logitech): Difference between revisions

From UCSB Nanofab Wiki
Jump to navigation Jump to search
Line 19: Line 19:


=[[Instructions]]=
=[[Instructions]]=
https://wiki.nanotech.ucsb.edu/wiki/File:CMP.pdf
CMP SOP

Revision as of 20:18, 23 August 2022

Chemical-Mechanical Polisher (Logitech)
CMP.jpg
Tool Type Dry Etch
Location Bay 5
Supervisor Bill Millerski
Supervisor Phone (805) 893-2655
Supervisor E-Mail wmillerski@ucsb.edu
Description ORBIS Chemical Mechanical Polisher
Manufacturer Logitech
Dry Etch Recipes
Sign up for this tool


About

The Logitech Orbis system is used in the facility for fine-scale polishing and planarization of a variety of materials including glass, silicon, GaAs, InP, GaN, etc. Wafers up to 6” diameter can be polished on the system.

Several slurries and pads are available to provide a range of polishing options depending on the material being processed. Pieces can also be handled on the system by wax-mounting with the Logitech Bonder.

Each process is often unique in geometry and material combinations so that independent process development is required for most CMP applications.

Instructions

https://wiki.nanotech.ucsb.edu/wiki/File:CMP.pdf