Dry Etching Recipes: Difference between revisions
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! colspan="17" width="725" height="45" |<div style="font-size: 150%;">Dry Etching Recipes</div> |
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! colspan="3" |'''[[RIE Etching Recipes|RIE Etching]]''' |
! colspan="3" |'''[[RIE Etching Recipes|RIE Etching]]''' |
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! colspan="6" |'''[[ICP Etching Recipes|ICP Etching]]''' |
! colspan="6" |'''[[ICP Etching Recipes|ICP Etching]]''' |
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! colspan="4" bgcolor="#d0e7ff" align="center" |'''[[Oxygen Plasma System Recipes|Oxygen Plasma Systems]]''' |
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! colspan="3" bgcolor="#d0e7ff" align="center" |'''[[Other Dry Etching Recipes|Other Dry Etchers]]''' |
! colspan="3" bgcolor="#d0e7ff" align="center" |'''[[Other Dry Etching Recipes|Other Dry Etchers]]''' |
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| bgcolor="#daf1ff" |[[ICP_Etching_Recipes#ICP-Etch_.28Unaxis_VLR.29|ICP-Etch<br><span style="font-size: 88%;">(Unaxis VLR)</span>]] |
| bgcolor="#daf1ff" |[[ICP_Etching_Recipes#ICP-Etch_.28Unaxis_VLR.29|ICP-Etch<br><span style="font-size: 88%;">(Unaxis VLR)</span>]] |
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| bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#Ashers_.28Technics_PEII.29|Ashers<br><span style="font-size: 88%;">(Technics PEII)</span>]] |
| bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#Ashers_.28Technics_PEII.29|Ashers<br><span style="font-size: 88%;">(Technics PEII)</span>]] |
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| bgcolor="#daf1ff" |[[Oxygen Plasma System Recipes#Plasma Clean .28YES EcoClean.29|Plasma Clean <span style="font-size: 88%;">(YES EcoClean)</span>]] |
| bgcolor="#daf1ff" |[[Oxygen Plasma System Recipes#Plasma Clean .28YES EcoClean.29|Plasma Clean <span style="font-size: 88%;">(YES EcoClean)</span>]] |
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| bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#UV_Ozone_Reactor|UV Ozone Reactor]] |
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|{{rl|ICP Etching Recipes|Al Etch (Panasonic 1)}} |
|{{rl|ICP Etching Recipes|Al Etch (Panasonic 1)}} |
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|{{rl|ICP Etching Recipes|Al Etch (Panasonic 2)}} |
|{{rl|ICP Etching Recipes|Al Etch (Panasonic 2)}} |
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|{{rl|ICP Etching Recipes|Cr Etch (Panasonic 1)}} |
|{{rl|ICP Etching Recipes|Cr Etch (Panasonic 1)}} |
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|{{Rl|ICP Etching Recipes|Ru (Ruthenium) Etch (Panasonic 2)}} |
|{{Rl|ICP Etching Recipes|Ru (Ruthenium) Etch (Panasonic 2)}} |
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|{{rl|ICP Etching Recipes|Ti Etch (Panasonic 1)}} |
|{{rl|ICP Etching Recipes|Ti Etch (Panasonic 1)}} |
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|[https://wiki.nanotech.ucsb.edu/w/index.php?title=ICP_Etching_Recipes#Al2O3_Etching_.28Panasonic_2.29 R] |
|[https://wiki.nanotech.ucsb.edu/w/index.php?title=ICP_Etching_Recipes#Al2O3_Etching_.28Panasonic_2.29 R] |
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|{{rl|ICP Etching Recipes|Sapphire Etch (Panasonic 1)}} |
|{{rl|ICP Etching Recipes|Sapphire Etch (Panasonic 1)}} |
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|[[ICP Etching Recipes#GaAs Etch .28Oxford ICP Etcher.29|R]] |
|[[ICP Etching Recipes#GaAs Etch .28Oxford ICP Etcher.29|R]] |
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|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|GaAs-AlGaAs Etch (Unaxis VLR)|AlGaAs Etch (Unaxis VLR)}} |
|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|GaAs-AlGaAs Etch (Unaxis VLR)|AlGaAs Etch (Unaxis VLR)}} |
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|[[ICP Etching Recipes#GaN Etch .28Oxford ICP Etcher.29|R]] |
|[[ICP Etching Recipes#GaN Etch .28Oxford ICP Etcher.29|R]] |
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|{{rl|ICP Etching Recipes|GaN Etch (Unaxis VLR)}} |
|{{rl|ICP Etching Recipes|GaN Etch (Unaxis VLR)}} |
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|{{rl|ICP Etching Recipes|GaN Etch (Unaxis VLR)}} |
|{{rl|ICP Etching Recipes|GaN Etch (Unaxis VLR)}} |
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! bgcolor="#d0e7ff" align="center" |CdZnTe |
! bgcolor="#d0e7ff" align="center" |CdZnTe |
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|{{rl|RIE Etching Recipes|CdZnTe Etch (RIE 2)}} |
|{{rl|RIE Etching Recipes|CdZnTe Etch (RIE 2)}} |
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|[[ICP Etching Recipes#GaAs Etch .28Oxford ICP Etcher.29|R]] |
|[[ICP Etching Recipes#GaAs Etch .28Oxford ICP Etcher.29|R]] |
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|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|GaAs-AlGaAs Etch (Unaxis VLR)|GaAs Etch (Unaxis VLR)}} |
|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|GaAs-AlGaAs Etch (Unaxis VLR)|GaAs Etch (Unaxis VLR)}} |
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|[[ICP Etching Recipes#GaN Etch .28Oxford ICP Etcher.29|R]] |
|[[ICP Etching Recipes#GaN Etch .28Oxford ICP Etcher.29|R]] |
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|{{rl|ICP Etching Recipes|GaN Etch (Unaxis VLR)}} |
|{{rl|ICP Etching Recipes|GaN Etch (Unaxis VLR)}} |
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|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|GaSb Etch Unaxis VLR)}} |
|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|GaSb Etch Unaxis VLR)}} |
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! bgcolor="#d0e7ff" align="center" |HfO<sub>2</sub> |
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|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|InP-InGaAs-InAlAs Etch (Unaxis VLR)|InP Etch (Unaxis VLR)}} |
|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|InP-InGaAs-InAlAs Etch (Unaxis VLR)|InP Etch (Unaxis VLR)}} |
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|[[ICP Etching Recipes#InP Ridge Etch .28Oxford ICP Etcher.29|R]] |
|[[ICP Etching Recipes#InP Ridge Etch .28Oxford ICP Etcher.29|R]] |
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|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|InP-InGaAs-InAlAs Etch (Unaxis VLR)|InP Etch (Unaxis VLR)}} |
|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|InP-InGaAs-InAlAs Etch (Unaxis VLR)|InP Etch (Unaxis VLR)}} |
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|[[ICP Etching Recipes#InP Ridge Etch .28Oxford ICP Etcher.29|R]] |
|[[ICP Etching Recipes#InP Ridge Etch .28Oxford ICP Etcher.29|R]] |
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|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|InP-InGaAs-InAlAs Etch (Unaxis VLR)|InP Etch (Unaxis VLR)}} |
|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|InP-InGaAs-InAlAs Etch (Unaxis VLR)|InP Etch (Unaxis VLR)}} |
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! bgcolor="#d0e7ff" align="center" |ITO |
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|{{rl|RIE Etching Recipes|ITO Etch (RIE 2)}} |
|{{rl|RIE Etching Recipes|ITO Etch (RIE 2)}} |
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|[[Oxygen Plasma System Recipes#O2 Ashing|R]] |
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|[[ICP Etching Recipes#Ru .28Ruthenium.29 Etch .28Panasonic 2.29|R]] |
|[[ICP Etching Recipes#Ru .28Ruthenium.29 Etch .28Panasonic 2.29|R]] |
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|{{rl|ICP Etching Recipes|SiC Etch (Panasonic 1)}} |
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|[https://www.osapublishing.org/optica/abstract.cfm?uri=optica-4-5-532 A] |
|[https://www.osapublishing.org/optica/abstract.cfm?uri=optica-4-5-532 A] |
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! bgcolor="#d0e7ff" align="center" |ZnS |
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|{{rl|RIE Etching Recipes|ZnS Etching (RIE 2)}} |
|{{rl|RIE Etching Recipes|ZnS Etching (RIE 2)}} |
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|{{rl|RIE Etching Recipes|ZnS Etching (RIE 2)}} |
|{{rl|RIE Etching Recipes|ZnS Etching (RIE 2)}} |
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| bgcolor="#daf1ff" |[[ICP_Etching_Recipes#ICP-Etch_.28Unaxis_VLR.29|ICP-Etch<br><span style="font-size: 88%;">(Unaxis VLR)</span>]] |
| bgcolor="#daf1ff" |[[ICP_Etching_Recipes#ICP-Etch_.28Unaxis_VLR.29|ICP-Etch<br><span style="font-size: 88%;">(Unaxis VLR)</span>]] |
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| bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#Ashers_.28Technics_PEII.29|Ashers<br><span style="font-size: 88%;">(Technics PEII)</span>]] |
| bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#Ashers_.28Technics_PEII.29|Ashers<br><span style="font-size: 88%;">(Technics PEII)</span>]] |
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| bgcolor="#daf1ff" |[[Oxygen Plasma System Recipes#Plasma Clean .28YES EcoClean.29|Plasma Clean <span style="font-size: 88%;">(YES EcoClean)</span>]] |
| bgcolor="#daf1ff" |[[Oxygen Plasma System Recipes#Plasma Clean .28YES EcoClean.29|Plasma Clean <span style="font-size: 88%;">(YES EcoClean)</span>]] |
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| bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#UV_Ozone_Reactor|UV Ozone Reactor]] |
| bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#UV_Ozone_Reactor|UV Ozone Reactor]] |
Revision as of 22:40, 17 July 2023
Process Control Data
See linked page for process control data (dep rate/stress etc. over time), for a selection of often-used thin-film depositions.
Dry Etching Tools/Materials Table
- R: Recipe is available. Clicking this link will take you to the recipe.
- A: Material is available for use, but no recipes are provided.