Vacuum Deposition Recipes: Difference between revisions
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|{{rl|PECVD Recipes|SiN deposition (PECVD #1)}} |
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|[[PECVD Recipes#SiN deposition .28PECVD .232.29|R6]] |
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|{{rl|PECVD Recipes|SiN 250C deposition (Unaxis VLR)}} |
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|{{rl|PECVD Recipes|Low-Stress SiN - LS-SiN (PECVD#1)}} |
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|[[PECVD Recipes#Low-Stress SiN deposition .28PECVD .232.29|R6]] |
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|{{rl|PECVD Recipes|SiN LS 250C Deposition (Unaxis VLR)}} |
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| bgcolor="#eeffff" |{{rl|PECVD Recipes|SiO2 deposition (PECVD #1)}} |
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| bgcolor="#eeffff" |[[PECVD Recipes#SiO2 deposition .28PECVD .232.29|R6]] |
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| bgcolor="#eeffff" |{{rl|PECVD Recipes|SiO2 LDR 250C Deposition (Unaxis VLR)}} |
| bgcolor="#eeffff" |{{rl|PECVD Recipes|SiO2 LDR 250C Deposition (Unaxis VLR)}} |
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| bgcolor="#eeffff" |{{rl|Atomic Layer Deposition Recipes|SiO2 deposition (ALD CHAMBER 3)}} |
| bgcolor="#eeffff" |{{rl|Atomic Layer Deposition Recipes|SiO2 deposition (ALD CHAMBER 3)}} |
Revision as of 22:18, 30 July 2024
Process Control Data
See linked page for process control data (calibration data over time, such as dep. rate, refractive index, stress etc.) over time, for a selection of highly used tools/films.
Deposition Tools/Materials Table
- R: Recipe is available. Clicking this link will take you to the recipe.
- A: Material is available for use, but no recipes are provided.