Vacuum Deposition Recipes: Difference between revisions

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| <!-- INTENTIONALLY LEFT BLANK --> <br>
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! bgcolor="#D0E7FF" align="center" colspan="4" | '''[[E-Beam Evaporation Recipes|E-Beam Evaporation]]'''
! bgcolor="#D0E7FF" align="center" colspan="4" | '''[[E-Beam Evaporation Recipes|E-Beam Evaporation]]'''
! bgcolor="#D0E7FF" align="center" colspan="5" | '''[[Sputtering Recipes|Sputtering]]'''
! bgcolor="#D0E7FF" align="center" colspan="6" | '''[[Sputtering Recipes|Sputtering]]'''
! bgcolor="#D0E7FF" align="center" colspan="2" | '''[[Thermal Evaporation Recipes|Thermal Evaporation]]'''
! bgcolor="#D0E7FF" align="center" colspan="2" | '''[[Thermal Evaporation Recipes|Thermal Evaporation]]'''
! bgcolor="#D0E7FF" align="center" colspan="3" | '''[[PECVD Recipes|Plasma Enhanced Chemical<br>Vapor Deposition (PECVD)]]'''
! bgcolor="#D0E7FF" align="center" colspan="3" | '''[[PECVD Recipes|Plasma Enhanced Chemical<br>Vapor Deposition (PECVD)]]'''
! width="90" bgcolor="#D0E7FF" align="center" | '''[[Atomic Layer Deposition Recipes|Atomic Layer Deposition]]'''
! width="90" bgcolor="#D0E7FF" align="center" | '''[[Atomic Layer Deposition Recipes|Atomic Layer Deposition]]'''
! width="100" bgcolor="#D0E7FF" align="center" | '''[[Ion Beam Deposition Recipes|Ion Beam Deposition (IBD)]]'''
! width="80" bgcolor="#D0E7FF" align="center" | '''[[Molecular Vapor Deposition Recipes|Molecular Vapor Deposition]]'''
! width="100" bgcolor="#D0E7FF" align="center" | '''[[Molecular Vapor Deposition Recipes|Molecular Vapor Deposition]]'''
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! width="20" bgcolor="#D0E7FF" align="center" | '''Material'''
! width="20" bgcolor="#D0E7FF" align="center" | '''Material'''
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| width="65" bgcolor="#DAF1FF" | [[Sputtering Recipes#Sputter_4_.28ATC_2200-V.29|Sputter 4<br>(ATC 2200-V)]]
| width="65" bgcolor="#DAF1FF" | [[Sputtering Recipes#Sputter_4_.28ATC_2200-V.29|Sputter 4<br>(ATC 2200-V)]]
| width="65" bgcolor="#DAF1FF" | [[Sputtering Recipes#Sputter_5_.28Lesker_AXXIS.29|Sputter 5 (Lesker AXXIS)]]
| width="65" bgcolor="#DAF1FF" | [[Sputtering Recipes#Sputter_5_.28Lesker_AXXIS.29|Sputter 5 (Lesker AXXIS)]]
| width="65" bgcolor="#DAF1FF" | [[Thermal Evaporation Recipes#Thermal_Evap_1|Thermal Evap 1]]
| width="55" bgcolor="#DAF1FF" | [[Ion Beam Deposition (Veeco NEXUS)|Ion Beam<br>Deposition (Tool)]]
| width="45" bgcolor="#DAF1FF" | [[Thermal Evaporation Recipes#Thermal_Evap_1|Thermal<br>Evap 1]]
| width="65" bgcolor="#DAF1FF" | [[Thermal Evaporation Recipes#Thermal_Evap_2_.28Solder.29|Thermal Evap 2 (Solder)]]
| width="65" bgcolor="#DAF1FF" | [[Thermal Evaporation Recipes#Thermal_Evap_2_.28Solder.29|Thermal Evap 2 (Solder)]]
| width="65" bgcolor="#DAF1FF" | [[PECVD Recipes#PECVD_1_.28PlasmaTherm_790.29|PECVD 1<br>(PlasmaTherm 790)]]
| width="65" bgcolor="#DAF1FF" | [[PECVD Recipes#PECVD_1_.28PlasmaTherm_790.29|PECVD 1<br>(PlasmaTherm 790)]]
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| width="65" bgcolor="#DAF1FF" | [[PECVD Recipes#Unaxis_VLR_ICP-PECVD|Unaxis VLR ICP-PECVD]]
| width="65" bgcolor="#DAF1FF" | [[PECVD Recipes#Unaxis_VLR_ICP-PECVD|Unaxis VLR ICP-PECVD]]
| width="65" bgcolor="#DAF1FF" | [[Atomic Layer Deposition (Oxford FlexAL)|Atomic Layer Deposition (Tool)]]
| width="65" bgcolor="#DAF1FF" | [[Atomic Layer Deposition (Oxford FlexAL)|Atomic Layer Deposition (Tool)]]
| width="65" bgcolor="#DAF1FF" | [[Ion Beam Deposition (Veeco NEXUS)|Ion Beam<br>Deposition (Tool)]]
| width="65" bgcolor="#DAF1FF" | [[Molecular Vapor Deposition|Molecular Vapor Deposition (Tool)]]
| width="65" bgcolor="#DAF1FF" | [[Molecular Vapor Deposition|Molecular Vapor Deposition (Tool)]]
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| bgcolor="EEFFFF" | {{rl|Atomic Layer Deposition Recipes|Al2O3 deposition (ALD)}}
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| bgcolor="EEFFFF" | {{rl|Atomic Layer Deposition Recipes|Al2O3 deposition (ALD)}}
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| {{rl|Atomic Layer Deposition Recipes|AlN deposition (ALD)}}
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| {{rl|Atomic Layer Deposition Recipes|AlN deposition (ALD)}}
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| bgcolor="EEFFFF" | {{rl|Atomic Layer Deposition Recipes|HfO2 deposition (ALD)}}
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| bgcolor="EEFFFF" | {{rl|Atomic Layer Deposition Recipes|HfO2 deposition (ALD)}}
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| {{rl|Ion Beam Deposition Recipes|SiN deposition (IBD)}}
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| {{rl|PECVD Recipes|SiN deposition (Unaxis VLR)}}
| {{rl|PECVD Recipes|SiN deposition (Unaxis VLR)}}
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| {{rl|Ion Beam Deposition Recipes|SiN deposition (IBD)}}
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| bgcolor="EEFFFF" | {{rl|Ion Beam Deposition Recipes|SiO2 deposition (IBD)}}
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| bgcolor="EEFFFF" | {{rl|PECVD Recipes|SiO2 deposition (Unaxis VLR)}}
| bgcolor="EEFFFF" | {{rl|PECVD Recipes|SiO2 deposition (Unaxis VLR)}}
| bgcolor="EEFFFF" | {{rl|Atomic Layer Deposition Recipes|SiO2 deposition (ALD)}}
| bgcolor="EEFFFF" | {{rl|Atomic Layer Deposition Recipes|SiO2 deposition (ALD)}}
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| bgcolor="EEFFFF" | {{rl|Ion Beam Deposition Recipes|SiO2 deposition (IBD)}}
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| {{rl|Ion Beam Deposition Recipes|Ta2O5 deposition (IBD)}}
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| {{rl|Ion Beam Deposition Recipes|Ta2O5 deposition (IBD)}}
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| bgcolor="EEFFFF" | <br>
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| bgcolor="EEFFFF" | {{rl|Atomic Layer Deposition Recipes|ZrO2 deposition (ALD)}}
| bgcolor="EEFFFF" | {{rl|Atomic Layer Deposition Recipes|ZrO2 deposition (ALD)}}
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! bgcolor="#D0E7FF" align="center" | '''Material'''
! width="20" bgcolor="#D0E7FF" align="center" | '''Material'''
| bgcolor="#DAF1FF" | [[E-Beam 1 (Sharon)]]
| width="65" bgcolor="#DAF1FF" | [[E-Beam Evaporation Recipes#E-Beam_1_.28Sharon.29|E-Beam 1 (Sharon)]]
| bgcolor="#DAF1FF" | [[E-Beam 2 (Custom)]]
| width="65" bgcolor="#DAF1FF" | [[E-Beam Evaporation Recipes#E-Beam_2_.28Custom.29|E-Beam 2 (Custom)]]
| bgcolor="#DAF1FF" | [[E-Beam 3 (Temescal)]]
| width="65" bgcolor="#DAF1FF" | [[E-Beam Evaporation Recipes#E-Beam_3_.28Temescal.29|E-Beam 3 (Temescal)]]
| bgcolor="#DAF1FF" | [[E-Beam 4 (CHA)]]
| width="65" bgcolor="#DAF1FF" | [[E-Beam Evaporation Recipes#E-Beam_4_.28CHA.29|E-Beam 4 (CHA)]]
| bgcolor="#DAF1FF" | [[Sputter 1 (Custom)]]
| width="65" bgcolor="#DAF1FF" | [[Sputtering Recipes#Sputter_1_.28Custom.29|Sputter 1 (Custom)]]
| bgcolor="#DAF1FF" | [[Sputter 2 (SFI Endeavor)|Sputter 2<br>(SFI Endeavor)]]
| width="65" bgcolor="#DAF1FF" | [[Sputtering Recipes#Sputter_2_.28SFI_Endeavor.29|Sputter 2<br>(SFI Endeavor)]]
| bgcolor="#DAF1FF" | [[Sputter 3 (ATC 2000-F)|Sputter 3<br>(ATC 2000-F)]]
| width="65" bgcolor="#DAF1FF" | [[Sputtering Recipes#Sputter_3_.28ATC_2000-F.29|Sputter 3<br>(ATC 2000-F)]]
| bgcolor="#DAF1FF" | [[Sputter 4 (ATC 2200-V)|Sputter 4<br>(ATC 2200-V)]]
| width="65" bgcolor="#DAF1FF" | [[Sputtering Recipes#Sputter_4_.28ATC_2200-V.29|Sputter 4<br>(ATC 2200-V)]]
| bgcolor="#DAF1FF" | [[Sputter 5 (Lesker AXXIS)]]
| width="65" bgcolor="#DAF1FF" | [[Sputtering Recipes#Sputter_5_.28Lesker_AXXIS.29|Sputter 5 (Lesker AXXIS)]]
| bgcolor="#DAF1FF" | [[Thermal Evap 1]]
| width="55" bgcolor="#DAF1FF" | [[Ion Beam Deposition (Veeco NEXUS)|Ion Beam<br>Deposition (Tool)]]
| bgcolor="#DAF1FF" | [[Thermal Evap 2 (Solder)]]
| width="45" bgcolor="#DAF1FF" | [[Thermal Evaporation Recipes#Thermal_Evap_1|Thermal<br>Evap 1]]
| bgcolor="#DAF1FF" | [[PECVD 1 (PlasmaTherm 790)|PECVD 1<br>(PlasmaTherm 790)]]
| width="65" bgcolor="#DAF1FF" | [[Thermal Evaporation Recipes#Thermal_Evap_2_.28Solder.29|Thermal Evap 2 (Solder)]]
| bgcolor="#DAF1FF" | [[PECVD 2 (Advanced Vacuum)|PECVD 2<br>(Advanced Vacuum)]]
| width="65" bgcolor="#DAF1FF" | [[PECVD Recipes#PECVD_1_.28PlasmaTherm_790.29|PECVD 1<br>(PlasmaTherm 790)]]
| bgcolor="#DAF1FF" | [[Unaxis VLR ICP-PECVD]]
| width="65" bgcolor="#DAF1FF" | [[PECVD Recipes#PECVD_2_.28Advanced_Vacuum.29|PECVD 2<br>(Advanced Vacuum)]]
| bgcolor="#DAF1FF" | [[Atomic Layer Deposition (Oxford FlexAL)|Atomic Layer Deposition (Tool)]]
| width="65" bgcolor="#DAF1FF" | [[PECVD Recipes#Unaxis_VLR_ICP-PECVD|Unaxis VLR ICP-PECVD]]
| bgcolor="#DAF1FF" | [[Ion Beam Deposition (Veeco NEXUS)|Ion Beam<br>Deposition (Tool)]]
| width="65" bgcolor="#DAF1FF" | [[Atomic Layer Deposition (Oxford FlexAL)|Atomic Layer Deposition (Tool)]]
| bgcolor="#DAF1FF" | [[Molecular Vapor Deposition|Molecular Vapor Deposition (Tool)]]
| width="65" bgcolor="#DAF1FF" | [[Molecular Vapor Deposition|Molecular Vapor Deposition (Tool)]]
|}
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Revision as of 15:04, 7 September 2012

Vacuum Deposition Recipes

 E-Beam Evaporation Sputtering Thermal Evaporation Plasma Enhanced Chemical
Vapor Deposition (PECVD) 		Atomic Layer Deposition Molecular Vapor Deposition
Material E-Beam 1 (Sharon) E-Beam 2 (Custom) E-Beam 3 (Temescal) E-Beam 4 (CHA) Sputter 1 (Custom) Sputter 2
(SFI Endeavor) 		Sputter 3
(ATC 2000-F) 		Sputter 4
(ATC 2200-V) 		Sputter 5 (Lesker AXXIS) Ion Beam
Deposition (Tool) 		Thermal
Evap 1 		Thermal Evap 2 (Solder) PECVD 1
(PlasmaTherm 790) 		PECVD 2
(Advanced Vacuum) 		Unaxis VLR ICP-PECVD Atomic Layer Deposition (Tool) Molecular Vapor Deposition (Tool)
Ag
















Al
















Al2O3














R1
AlN














R1
Au
















B
















Co
















Cr
















Cu
















Fe
















Ge
















Hf
















HfO2














R1
In
















Ir
















ITO
















Mo
















Nb
















Ni
















Pd
















Pt
















Ru
















Si
















SiN








R1

R1 R1 R1

SiO2








R1

R1 R1 R1 R1
SiOxNy
















Sn
















SrF2
















Ta
















Ta2O5








R1






Ti
















TiN
















TiO2
















V
















W
















Zn
















ZnO2
















Zr
















ZrO2














R1
Material E-Beam 1 (Sharon) E-Beam 2 (Custom) E-Beam 3 (Temescal) E-Beam 4 (CHA) Sputter 1 (Custom) Sputter 2
(SFI Endeavor) 		Sputter 3
(ATC 2000-F) 		Sputter 4
(ATC 2200-V) 		Sputter 5 (Lesker AXXIS) Ion Beam
Deposition (Tool) 		Thermal
Evap 1 		Thermal Evap 2 (Solder) PECVD 1
(PlasmaTherm 790) 		PECVD 2
(Advanced Vacuum) 		Unaxis VLR ICP-PECVD Atomic Layer Deposition (Tool) Molecular Vapor Deposition (Tool)
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