Vacuum Deposition Recipes: Difference between revisions

Revision as of 15:36, 7 September 2012

Vacuum Deposition Recipes
	E-Beam Evaporation				Sputtering						Thermal Evaporation		Plasma Enhanced Chemical Vapor Deposition (PECVD)			Atomic Layer Deposition	Molecular Vapor Deposition
Material	E-Beam 1 (Sharon)	E-Beam 2 (Custom)	E-Beam 3 (Temescal)	E-Beam 4 (CHA)	Sputter 1 (Custom)	Sputter 2 (SFI Endeavor)	Sputter 3 (ATC 2000-F)	Sputter 4 (ATC 2200-V)	Sputter 5 (Lesker AXXIS)	Ion Beam Deposition (Tool)	Thermal Evap 1	Thermal Evap 2 (Solder)	PECVD 1 (PlasmaTherm 790)	PECVD 2 (Advanced Vacuum)	Unaxis VLR ICP-PECVD	Atomic Layer Deposition (Tool)	Molecular Vapor Deposition (Tool)
Ag
Al
Al₂O₃																R1
AlN																R1
Au
B
Co
Cr
Cu
Fe
Ge
Hf
HfO₂																R1
In
Ir
ITO
Mo
Nb
Ni
Pd
Pt
Ru
Si
SiN										R1			R1	R1	R1
SiO₂										R1			R1	R1	R1	R1
SiO_xN_y
Sn
SrF₂
Ta
Ta₂O₅										R1
Ti
TiN
TiO₂
V
W
Zn
ZnO₂
Zr
ZrO₂																R1
Material	E-Beam 1 (Sharon)	E-Beam 2 (Custom)	E-Beam 3 (Temescal)	E-Beam 4 (CHA)	Sputter 1 (Custom)	Sputter 2 (SFI Endeavor)	Sputter 3 (ATC 2000-F)	Sputter 4 (ATC 2200-V)	Sputter 5 (Lesker AXXIS)	Ion Beam Deposition (Tool)	Thermal Evap 1	Thermal Evap 2 (Solder)	PECVD 1 (PlasmaTherm 790)	PECVD 2 (Advanced Vacuum)	Unaxis VLR ICP-PECVD	Atomic Layer Deposition (Tool)	Molecular Vapor Deposition (Tool)

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-| bgcolor="EEFFFF" | {{rl|Ion Beam Deposition Recipes|SiO2 deposition (IBD)}}
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-| {{rl|Ion Beam Deposition Recipes|Ta2O5 deposition (IBD)}}
+| {{rl|Sputtering Recipes|Ta2O5 deposition (IBD)}}
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