ICP Etching Recipes

Back to Dry Etching Recipes.

Si Deep RIE (PlasmaTherm/Bosch Etch)

Single-step Si Etching (not Bosch Process!) (Si Deep RIE)

• Single-step Si Vertical Etch Recipe - SF₆-C₄F₈-Ar

ICP Etch 1 (Panasonic E626I)

SiO₂ Etching (Panasonic 1)

• SiO₂ Vertical Etch Recipe Parameters - CHF₃
• SiO₂ CHF₃ Etch Variations

SiN_x Etching (Panasonic 1)

• SiN_x Etch Rates and Variations - CF₄-O₂

Al Etch (Panasonic 1)

• Al Etch Recipes - Cl₂BCl₃

Cr Etch (Panasonic 1)

• Cr Etch Recipes - Cl₂O₂

Ti Etch (Panasonic 1)

• Ti Deep Etch Recipes - Cl₂Ar

W-TiW Etch (Panasonic 1)

• Ti-TiW Etch Recipes - SF₆Ar

GaAs-AlGaAs Etch (Panasonic 1)

• GaAs-Nanoscale Etch Recipe - PR mask - Cl₂-BCl₃-Ar
• AlGaAs Etch Recipes - Cl₂N₂
• GaAs DRIE via Etch Recipes - Cl₂-BCl₃-Ar PR passivation

GaN Etch (Panasonic 1)

• GaN Etch Recipes Cl₂N₂
• GaN Selective Etch over AlGaN Recipes BCl₃-SF₆

SiC Etch (Panasonic 1)

• SiC Etch Recipes Ni Mask - SF₆

Sapphire Etch (Panasonic 1)

• Sapphire Etch Recipes Ni and PR Mask - BCl₃-Cl₂

ICP Etch 2 (Panasonic E640)

SiO₂ Etching (Panasonic 2)

• SiO₂ Vertical Etch Recipe - CHF₃
• SiO₂ Nanoscale Etch Recipe - CHF₃/O₂

SiN_x Etching (Panasonic 2)

• SiN_x Nanoscale Etch Recipe - CHF₃/O₂

Al Etch (Panasonic 2)

• Al Etch Recipes - use panasonic 1 parameters, etch rate 50% higher

GaAs Etch (Panasonic 2)

• GaAs Etch Recipes - Panasonic 2 - Cl₂N₂

ICP-Etch (Unaxis VLR)

GaAs-AlGaAs Etch (Unaxis VLR)

• GaAs Etch Recipe (Cl₂N₂ 30C)
• AlGaAs Etch Recipe (Cl₂N₂ 30C)

InP-InGaAs-InAlAs Etch (Unaxis VLR)

• InP Etch Recipe (Cl₂N₂Ar 200C)
• InP-based Material Etch Profile (Cl₂N₂Ar200C)
• Unaxis InP Etch Recipe (Cl₂H₂ Ar 200C) Parameters
• InP-InGaAs Etch Profile (Cl₂H₂ Ar 200C)

GaN Etch (Unaxis VLR)

• GaN Etch Recipe (Cl₂BCl₃ Ar 85C)