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- 08:59, 26 February 2022 diff hist +27 m ICP Etching Recipes →Old Deleted Recipes: changed "don" to "supervisor" Tag: Visual edit
- 09:44, 21 February 2022 diff hist +108 Process Group - Remote Fabrication Jobs link to takss/priority list Tag: Visual edit
- 13:44, 17 February 2022 diff hist +327 ICP-PECVD (Unaxis VLR) →About: mention SiD4 config and expense/applicaiton Tag: Visual edit
- 13:43, 17 February 2022 diff hist +116 PECVD Recipes →ICP-PECVD (Unaxis VLR): mention cost/application to optics Tag: Visual edit
- 18:03, 16 February 2022 diff hist +340 Maskless Aligner (Heidelberg MLA150) added minimum fearture size and note on DSP transparent substrates Tag: Visual edit
- 11:48, 14 February 2022 diff hist +72 N File:ASML Reticle Programming Params - MyReticleBarCode v1.xlsx John d moved page File:ASML Reticle Programming Params - MyReticleBarCode v1.xlsx to File:ASML Reticle Programming Params - MASKJAN2020 v1.xlsx: Rename to include reticle barcode in filename current Tag: New redirect
- 11:48, 14 February 2022 diff hist 0 m File:ASML Reticle Programming Params - MASKJAN2020 v1.xlsx John d moved page File:ASML Reticle Programming Params - MyReticleBarCode v1.xlsx to File:ASML Reticle Programming Params - MASKJAN2020 v1.xlsx: Rename to include reticle barcode in filename current
- 11:47, 14 February 2022 diff hist 0 File:ASML Reticle Programming Params - MASKJAN2020 v1.xlsx John d uploaded a new version of File:ASML Reticle Programming Params - MyReticleBarCode v1.xlsx
- 13:49, 11 February 2022 diff hist +53 m ICP Etch 2 (Panasonic E626I) →Recipes Tag: Visual edit
- 13:48, 11 February 2022 diff hist +97 ICP Etch 1 (Panasonic E646V) separate process control section/link Tag: Visual edit
- 13:47, 11 February 2022 diff hist +59 ICP Etch 2 (Panasonic E626I) →Recipes: separate Process Control section/link Tag: Visual edit
- 13:24, 11 February 2022 diff hist +31 Test Data of etching SiO2 with CHF3/CF4 minor update to diamond experiemnt comment. Tag: Visual edit
- 13:23, 11 February 2022 diff hist -36 ICP Etching Recipes →ICP Etch 2 (Panasonic E640): updated ICP1 and ICP2 with Process Control sections for SiO2 etch tests. Tag: Visual edit
- 13:22, 11 February 2022 diff hist +252 N MediaWiki:Deletereason-dropdown added common NanoFab reasons for deletion current
- 13:19, 11 February 2022 diff hist +504 Test Data of etching SiO2 with CHF3/CF4-ICP1 new section :pasted data from CHF3/CF4/O2 etch data
- 13:13, 11 February 2022 diff hist +22 ICP Etching Recipes →SiO2 Etch Historical Data: reanmed to include tool name Tag: Visual edit
- 13:12, 11 February 2022 diff hist -37 ICP Etching Recipes →SiO2 Etching (Fluorine ICP Etcher): consolidated FL-ICP Prcoess Control data Tag: Visual edit
- 13:11, 11 February 2022 diff hist +493 Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher pasted Ning's 2nd data table, hilighted recipe changes and comment about data being "in progress"
- 12:28, 11 February 2022 diff hist +1 ICP Etching Recipes →PlasmaTherm/SLR Fluorine Etcher: moved historical data to top Tag: Visual edit
- 12:46, 4 February 2022 diff hist +260 Template:Announcements ASML maintenance
- 15:24, 1 February 2022 diff hist +3 m Autostep 200 Mask Making Guidance →Mask Layout Tag: Visual edit
- 15:23, 1 February 2022 diff hist +119 m Autostep 200 Mask Making Guidance →Photomask Ordering Info Tag: Visual edit
- 10:00, 1 February 2022 diff hist +327 Autostep 200 Mask Making Guidance →Photomask Ordering Info: added info Tag: Visual edit
- 09:39, 1 February 2022 diff hist +428 Autostep 200 Mask Making Guidance →Alignment Marks: adde Vernier CAD file Tag: Visual edit
- 09:37, 1 February 2022 diff hist +110 N File:Vernier Template.gds Vernier Registration/Alignment Test structure for lithography. Designed by Demis D. John, 2008.
- 09:03, 1 February 2022 diff hist -14 m Stepper 2 (AutoStep 200) →Process Information Tag: Visual edit
- 17:30, 31 January 2022 diff hist +185 Autostep 200 Mask Making Guidance →Mask Layout: 2nd attempt to describe Shutter positioning Tag: Visual edit
- 17:19, 31 January 2022 diff hist +352 Autostep 200 Mask Making Guidance →Mask Layout: 1st attempt at describing shutter blades Tag: Visual edit
- 17:00, 31 January 2022 diff hist +172 Autostep 200 Mask Making Guidance →Mask Layout / Alignment Marks: split into Mask layout separate section Tag: Visual edit
- 16:55, 31 January 2022 diff hist +30 Autostep 200 Troubleshooting and Recovery →What to do if you cannot undo the problem or need some help: link to each contact, update to use "Report tool issue' button on SUM current Tag: Visual edit
- 17:09, 28 January 2022 diff hist +358 m Oxford ICP Etcher - Process Control Data →Data - InP Ridge Etch (Oxford ICP Etcher) Tag: Visual edit
- 17:06, 28 January 2022 diff hist +805 Oxford ICP Etcher - Process Control Data updated tables, split into "sample size dpeendence" table Tag: Visual edit
- 21:43, 27 January 2022 diff hist +356 MLA150 - Troubleshooting →Solutions for small substrates: added THomas Messner's solution: disable Overview Camera before starting exposure Tag: Visual edit
- 11:42, 24 January 2022 diff hist -26 Packaging Recipes →Blade Exposure Calculation: image size increase Tag: Visual edit: Switched
- 11:13, 24 January 2022 diff hist +40 m Packaging Recipes →Anatomy of a Blade Tag: Visual edit
- 10:55, 21 January 2022 diff hist +346 Atomic Layer Deposition Recipes →Temperature: mentioned "thermal" and slower rate. Tag: Visual edit
- 10:53, 21 January 2022 diff hist +661 Atomic Layer Deposition Recipes →Al2O3 deposition (ALD CHAMBER 3): added terms "Plasma/Thermal/Ozone". Also added Chamber 1 Al2O3 Tag: Visual edit
- 23:12, 13 January 2022 diff hist +133 ICP Etching Recipes →Oxford ICP Etcher (PlasmaPro 100 Cobra): GaN ALE section started Tag: Visual edit
- 23:11, 13 January 2022 diff hist +238 ICP Etching Recipes →Oxford ICP Etcher (PlasmaPro 100 Cobra): NOTE: Rates in these 2021-09 characterizations are lower than current due to a software timing bug, fixed in 2022-01 Tag: Visual edit
- 23:09, 13 January 2022 diff hist +174 Oxford ICP Etcher - Process Control Data described basic 'fab process Tag: Visual edit
- 23:07, 13 January 2022 diff hist +55 ICP Etching Recipes →Process Control Data (Oxford ICP Etcher) Tag: Visual edit
- 23:05, 13 January 2022 diff hist -17 m Oxford ICP Etcher - Process Control Data removed WIP Tag: Visual edit
- 23:03, 13 January 2022 diff hist +56 Oxford ICP Etcher - Process Control Data added SEM images for Jan 11th-12th cals Tag: Visual edit
- 23:03, 13 January 2022 diff hist +36 N File:2022-01-12 Oxford InP Ridge Wiki Post - Cal03.pdf Oxford ICP Etch Cals03 current
- 22:55, 13 January 2022 diff hist +33 N File:2022-01-12 Oxford InP Ridge Wiki Post - Cal02.pdf Oxford ICP Cal SEMs current
- 22:51, 13 January 2022 diff hist +161 Oxford ICP Etcher - Process Control Data →Data - InP Ridge Etch (Oxford ICP Etcher): updated SEM 1 Tag: Visual edit
- 22:51, 13 January 2022 diff hist +38 N File:2022-01-11 Oxford InP Ridge Wiki Post - Cal01.pdf Oxford ICP Etch Cal SEMs current
- 21:43, 13 January 2022 diff hist +84 m MLA150 - Troubleshooting →Unexpected Behavior Tag: Visual edit
- 21:41, 13 January 2022 diff hist +271 MLA150 - Troubleshooting →Out Of Focus Exposures: Boris’ solutionnadded Tag: Visual edit
- 14:24, 13 January 2022 diff hist -1,009 Oxford ICP Etcher - Process Control Data in progress InP Ridge Etch Tag: Visual edit