Surface Analysis (KLA/Tencor Surfscan)
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About
This system uses a laser-based scattering method to count size and distribution of particles (or other scattering defects) on a flat wafer surface. It could scan from 4 to 6 inch wafers.
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This system uses a laser-based scattering method to count size and distribution of particles (or other scattering defects) on a flat wafer surface. It could scan from 4 to 6 inch wafers.