Direct-Write Lithography Recipes
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 Work In Progress This article is still under construction. It may contain factual errors. Content is subject to change. |
Maskless Aligner (Heidelberg MLA150)
Photolithography Recipes for the Heidelberg MLA150. Description of litho params- different lasers available, greyscale etc.
Positive Resist (MLA150)
General notes: Hotplates used, filters, laser wavelengths, etc.
| Resist | Spin Cond. | Bake | Thickness | Laser (nm) | Exposure Time| | DeFocus | PEB | Developer | Developer Time | Comments |
|---|---|---|---|---|---|---|---|---|---|---|
| AZ4110 | 4 krpm/30s | 95°C/60s | ~ 1.1 µm | 405 | 240 | 5 | none | AZ400K:DI 1:4 | 50s | Used MLA design (good for isolated lines 0.8-1um) |
| AZ4330 | 4 krpm/30s | 95°C/60s | ~ 3.3 µm | 405 | 320 | 6 | none | AZ400K:DI 1:4 | 90s | Used MLA design |
| AZ4620 | ||||||||||
| SPR 220-3.0 | 2.5 krpm/30s | 115°C/90” | ~ 2.7 µm | 405 | 115°C/90s | AZ300MIF | 60s | |||
| SPR 955-CM0.9 | 3 krpm/30s | 95°C/60” | ~ 0.9 µm | 405 | 110°C/60s | AZ300MIF | 60s | |||
| THMR-3600HP |
Negative Resist (MLA150)
General notes: Hotplates used, filters, laser wavelengths, etc.
| Resist | Spin Cond. | Bake | Thickness | Laser (nm) | Exposure Time | DeFocus | PEB | Flood | Developer | Developer Time | Comments |
|---|---|---|---|---|---|---|---|---|---|---|---|
| AZ5214 | 6 krpm/30s | 95°C/60s | ~ 1.0 µm | 405 | 60" | AZ300MIF | 60s |
| |||
| AZnLOF2020 | 3 krpm/30s | 110°C/90s | ~ 2.1µm | 405 | none | AZ300MIF | 60s | ||||
| SU-8 2075 | ~70µm | 375 | Extremely viscous. Pour into a wide-mouthed bottle, dispense directly from bottle. Replace napkin at end. |
Greyscale Lithography (MLA150)
Description...
| Resist | Spin Cond. | Bake | Thickness | Exposure Time | Focus Offset | PEB | Flood | Developer | Developer Time | Comments |
|---|---|---|---|---|---|---|---|---|---|---|
| AZ4620Z5214 | ?? krpm/30” | 95°C/60” | ?? µm | 60" | AZ300MIF | 60" |
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