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Combined display of all available logs of UCSB Nanofab Wiki. You can narrow down the view by selecting a log type, the username (case-sensitive), or the affected page (also case-sensitive).
- 18:29, 9 June 2020 John d talk contribs uploaded File:SiO2 Etch, Ru HardMask - Fluorine ICP Etch Process - Ning Cao 2019-06.pdf (Procedure for SiO2 deep etching on Plasma-Therm SLR Fluorine Etcher, using Sputtered Ruthenium hardmask)