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- 669 bytes (132 words) - 12:12, 30 November 2023
File:PECVD1-LS SIN recipe 2014.pdf (1.03 MB) - 16:37, 5 December 2014File:PECVD1-LS SION recipe 2014.pdf (1.24 MB) - 16:23, 3 December 2014File:PECVD2-SiO2-Recipe-NoAr-250C.pdf (42 KB) - 11:17, 20 August 2012File:EVG Plasma Activation Recipe Copying.pdf (580 KB) - 14:15, 9 October 2019File:PECVD2-SiO2-Recipe-NoAr-100C.pdf (42 KB) - 11:17, 20 August 2012File:PECVD1-SiN-standard recipe 2014.pdf (298 KB) - 14:58, 15 April 2014File:51-SiNx-Etch-Recipe-using-RIE3.pdf (1.07 MB) - 15:54, 13 January 2017File:PECVD2-SiO2-Recipe-NoAr-50C.pdf (41 KB) - 11:17, 20 August 2012File:PECVD1-SiO2-standard recipe 2014.pdf (299 KB) - 15:42, 15 April 2014File:PECVD1-SiN-standard recipe 1000A.pdf (295 KB) - 12:08, 20 March 2014File:NewPECVD1-SiN-standard recipe 2014.pdf (299 KB) - 14:58, 11 December 2014- |[[File:STD-N2-O2-180C-3KW-1min - steps.jpg|alt=screenshot of recipe STD-N2-O2-180C-3KW-1min - steps|none|thumb|STD-N2-O2-180C-3KW-1min - steps]725 bytes (147 words) - 12:08, 30 November 2023
File:SiO2-Etch-Recipe-using-RIE-3-a.pdf (283 KB) - 11:35, 2 August 2016- ...uBs1GfMrpnXcEdXanZQNko3X0lUcHhVUlNyYnVDUkE&usp=sharing PECVD1-SiN Standard Recipe Spreadsheet]174 bytes (20 words) - 15:37, 18 March 2014
File:PECVD2-SiN-Recipe-5W-250C-High-Stress.pdf (41 KB) - 09:18, 20 August 2012File:PECVD2-SiO2-Recipe-100%SiH4-HDR-100C.pdf (42 KB) - 11:20, 20 August 2012File:PECVD2-SiN-Recipe-50W-250C-Medium-Stress.pdf (41 KB) - 09:19, 20 August 2012File:PECVD2-SiO2-Recipe-100%SiH4-HDR-250C.pdf (42 KB) - 11:20, 20 August 2012File:PECVD2-SiN-Recipe-120W-250C-Low-Stress.pdf (41 KB) - 09:20, 20 August 2012
Page text matches
File:UCSBTEST2 - gain4 for (0.160-1.60)um particles.png Standard recipe for scanning small particles ( 0.160-1.60)um using GAIN4(1,105 × 765 (1.45 MB)) - 13:40, 26 March 2019File:BlueM Instructions.pdf Instructions on operation and recipe editing for the BlueM oven.(221 KB) - 10:30, 8 September 2022File:STD-N2-O2-180C-3KW-1min - header.jpg Screenshot of YES recipe - STD-N2-O2-180C-3KW-1min - header(471 × 553 (116 KB)) - 12:03, 30 November 2023File:STD-N2-O2-180C-3KW-1min - steps.jpg Screenshot of YES recipe STD-N2-O2-180C-3KW-1min - steps(639 × 553 (118 KB)) - 12:05, 30 November 2023- #* Load the seasoning recipe (SiN seasoning), and run it. The goal of this step is to coat chamber walls #* Load the deposition recipe (SiN@250C), and run it. Deposition time is variable. Get the rate from [htt2 KB (270 words) - 13:16, 10 December 2020
- *[[media:NewAdvPECVD OXIDE 300C standard recipe.pdf|Oxide Standard Recipe]] *[[media:NewAdvPECVD-Nitride2 300C standard recipe.pdf|Nitride2 Standard Recipe]]1 KB (189 words) - 12:28, 3 March 2022
- #*Load the seasoning recipe (STD SiO2), and run it. The goal of this step is to coat oxide on chamber w #*Load the deposition recipe (STD SiO2), and run it. Deposition time is variable. Get the rate from [htt3 KB (416 words) - 16:54, 22 April 2020
File:Au oxidation by O2-N2 ash.jpg In high oxidation environment, in this case by O2/N2 mixture recipe, gold surface can oxidize as shown by the XPS data.(1,388 × 697 (124 KB)) - 16:17, 9 June 2023- *[//wiki.nanotech.ucsb.edu/w/images/b/b4/ZnS_Plasma_Etch-1.pdf ZnS Etch Recipe - CH<sub>4</sub>-H<sub>2</sub>-Ar] ....edu/w/images/2/2f/SiO2-Etch-Recipe-using-RIE-3-a.pdf SiO<sub>2</sub> Etch Recipe with a very low surface damage - CHF<sub>3]2 KB (253 words) - 10:02, 14 June 2021
- * Seasoning recipe name: '''SiO2 seasoning''', '''t=2min''' * Deposition recipe name: '''SiO2 LDR 250°C, t=780 sec'''4 KB (711 words) - 13:32, 30 March 2020
- # Choose a recipe to run from the '''Recipe''' menu list. # Choose a recipe to run from the list of available recipes.2 KB (377 words) - 14:09, 17 October 2018
- ...E_917R6jF_K-btCHjsiIM/edit#gid= SiO<sub>2</sub><nowiki> [PECVD 1] Standard Recipe</nowiki>] ...VYcMxHRKE/edit#gid= Si<sub>3</sub>N<sub>4</sub><nowiki> [PECVD 1] Standard Recipe</nowiki>]15 KB (2,272 words) - 15:27, 4 June 2024
- * Set up POLOS recipe * Run recipe:823 bytes (131 words) - 08:12, 11 August 2020
- ...as location - 800px annot quarterwf.png|none|thumb|200x200px|Quarter Wafer recipe measurement location]] # Select Operator > Run Recipe1 KB (214 words) - 13:01, 17 April 2018
- ...of Dec. 2019), users may '''only edit <u>Deposition Time</u>''', no other recipe modifications or customizations are permitted without staff approval. * Seasoning recipe name: '''SiO2 seasoning''', '''t=2min'''5 KB (801 words) - 21:29, 12 August 2020
- ...ction. This Ozone-generator must be manually turned on before running the recipe - check with [[Atomic Layer Deposition (Oxford FlexAL)|supervisor]] for det For some recipes such as TiN, there are two loops in the recipe. The outermost loop controls the total thickness of the film, the inner lo7 KB (1,104 words) - 10:27, 15 June 2023
- ...BTEST1 (for scanning 8” wafers) and UCSBTEST2 (for scanning 4"wafers). The recipe UCSBTEST2 is used as a template to create other two standard recipes: "UCSB #** (Recipe "UCSBTEST2" is used as a template to create recipes UCSB Gain2 and UCSB Gai2 KB (339 words) - 11:31, 22 April 2020
- * Example of how to run process for the standard recipe "SiO2 LDR 250°C" ** Load seasoning recipe " SiO2 seasoning" , time=2min3 KB (515 words) - 13:41, 20 April 2020
- * SiO<sub>2</sub> [PECVD 1] Standard Recipe * Si<sub>3</sub>N<sub>4</sub> [PECVD 1] Standard Recipe36 KB (5,386 words) - 09:31, 14 December 2021
- ...k if hot plates are set to the needs temperatures. If not, run Temp-change recipe: #run recipe: Staff>SET-<HP#>-<TEMP> recipe corresponding to needed temp.2 KB (396 words) - 14:39, 8 November 2022