User contributions for Biljana

Results for Biljana talk block log uploads logs

A user with 3,318 edits. Account created on 27 June 2012.

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17:3917:39, 20 April 2020 diff hist +330 Wafer Scanning/Coating Process Traveler ( combined/less detailed) No edit summary Tag: Visual edit
17:1217:12, 20 April 2020 diff hist +7 N Wafer Scanning/Coating Process Traveler ( combined/less detailed) wip Tag: Visual edit
17:1117:11, 20 April 2020 diff hist +4 ICP-PECVD (Unaxis VLR) →Documentation Tag: Visual edit
17:1117:11, 20 April 2020 diff hist +113 ICP-PECVD (Unaxis VLR) →Documentation: scan/coat Tag: Visual edit
17:0317:03, 20 April 2020 diff hist +44 PECVD Recipes →" Post-Dep Clean" recipe Tag: Visual edit
17:0117:01, 20 April 2020 diff hist −650 PECVD Recipes →SiN deposition (Unaxis VLR) Tag: Visual edit
16:3616:36, 20 April 2020 diff hist +1,374 Wafer Scanning process Traveler scanning wafers Tag: Visual edit
16:2016:20, 20 April 2020 diff hist +2,131 N Wafer Scanning process Traveler Scanning wafers Tag: Visual edit
15:1315:13, 20 April 2020 diff hist +4 ICP-PECVD (Unaxis VLR) →Documentation Tag: Visual edit
15:1115:11, 20 April 2020 diff hist +5 ICP-PECVD (Unaxis VLR) →Documentation Tag: Visual edit
15:0915:09, 20 April 2020 diff hist +28 ICP-PECVD (Unaxis VLR) →Documentation Tag: Visual edit

21:3621:36, 15 April 2020 diff hist +102 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →First layer Tag: Visual edit
21:3621:36, 15 April 2020 diff hist 0 N File:Single centered mask-Piece 1st litho AUTOSTEP 200.pptx No edit summary current
21:3521:35, 15 April 2020 diff hist −110 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →First layer Tag: Visual edit
21:3221:32, 15 April 2020 diff hist +98 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →Single centered mask plate Tag: Visual edit
21:3021:30, 15 April 2020 diff hist +4 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →Multi layered mask plate Tag: Visual edit
21:2821:28, 15 April 2020 diff hist −4 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →Multi layered mask plate Tag: Visual edit
21:2321:23, 15 April 2020 diff hist +50 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →Multi layered mask plate Tag: Visual edit
21:2221:22, 15 April 2020 diff hist +102 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →Single centered mask plate Tag: Visual edit
21:1721:17, 15 April 2020 diff hist +50 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences No edit summary Tag: Visual edit
21:1521:15, 15 April 2020 diff hist 0 N File:Single centerd mask- Piece 1st litho AUTOSTEP 200-PIECES.pptx No edit summary current
21:1521:15, 15 April 2020 diff hist 0 N File:Single centered mask-Piece 2nd litho AUTOSTEP 200.pptx No edit summary
21:1421:14, 15 April 2020 diff hist 0 N File:4 Quads mask plate Piece - 2nd litho AUTOSTEP 200.pptx No edit summary current
17:0817:08, 15 April 2020 diff hist +82 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →Second layer Tag: Visual edit
17:0617:06, 15 April 2020 diff hist +153 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →Second layer Tag: Visual edit
17:0217:02, 15 April 2020 diff hist +229 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →First layer Tag: Visual edit
16:4116:41, 15 April 2020 diff hist −8,781 Wafer scanning process traveler →Calibration Tag: Visual edit
16:3916:39, 15 April 2020 diff hist −216 Wafer scanning process traveler →Start the scan application Tag: Visual edit
16:3316:33, 15 April 2020 diff hist +207 Wafer scanning process traveler →Wafers to Use: wafer scan basic info Tag: Visual edit
16:2516:25, 15 April 2020 diff hist −7,690 Glossary glossary items current Tag: Visual edit
16:1416:14, 15 April 2020 diff hist +15 Errors errors current Tag: Visual edit

19:0819:08, 8 April 2020 diff hist +100 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences fixced PPTX link Tag: Visual edit
17:0317:03, 8 April 2020 diff hist +60 N AUTOSTEP 200-PIECES 1st litho BL and BR orientation.pptx 1st litho current Tag: Visual edit
17:0217:02, 8 April 2020 diff hist +62 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →First layer: 1st litho on pieces Tag: Visual edit
17:0117:01, 8 April 2020 diff hist 0 N File:AUTOSTEP 200-PIECES 1st litho BL and BR orientation.pptx No edit summary current
17:0017:00, 8 April 2020 diff hist +92 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →First layer Tag: Visual edit
16:5816:58, 8 April 2020 diff hist −3 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →Exposing wafer pieces: 1st litho Tag: Visual edit
03:3403:34, 8 April 2020 diff hist +26 N AUTOSTEP 200-PIECES instruction 6-20-19.pptx exposing a piece current Tag: Visual edit
03:3303:33, 8 April 2020 diff hist +4 Exposing a wafer piece wafer piece current Tag: Visual edit
03:3303:33, 8 April 2020 diff hist +44 N Exposing a wafer piece Created page with "AUTOSTEP_200-PIECES_instruction_6-20-19.pptx"
03:3203:32, 8 April 2020 diff hist +28 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →Exposing wafer pieces Tag: Visual edit
03:3203:32, 8 April 2020 diff hist 0 N File:AUTOSTEP 200-PIECES instruction 6-20-19.pptx No edit summary current
03:3103:31, 8 April 2020 diff hist 0 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →Exposing wafer pieces Tag: Visual edit

23:1323:13, 7 April 2020 diff hist +543 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →Exposing wafer pieces Tag: Visual edit
23:0523:05, 7 April 2020 diff hist +1,435 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →Exposing wafers substrates Tag: Visual edit
22:4322:43, 7 April 2020 diff hist +66 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →Job Programming Tag: Visual edit
22:3822:38, 7 April 2020 diff hist +17 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →Job Programming Tag: Visual edit
22:3522:35, 7 April 2020 diff hist −11 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →<<PASS>> (writing the pass for first layer) Tag: Visual edit
22:3222:32, 7 April 2020 diff hist +206 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →Job Programming Tag: Visual edit
22:2622:26, 7 April 2020 diff hist +10 N File:Mask plate-Sign convention.png No edit summary current

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