User contributions for Biljana

Results for Biljana talk block log uploads logs

A user with 3,318 edits. Account created on 27 June 2012.

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16:5716:57, 21 April 2020 diff hist +73 PECVD Recipes →Standard Recipe Tag: Visual edit
16:5716:57, 21 April 2020 diff hist −93 PECVD Recipes →Standard Recipe: Updated recipe for STD SiO2 Tag: Visual edit
16:5516:55, 21 April 2020 diff hist +9 PECVD Recipes →Standard Recipe: updated recipe for STD SiO2 Tag: Visual edit
16:5416:54, 21 April 2020 diff hist 0 N File:Adv. PECVD2-STD SiO2.xlsx No edit summary

21:1021:10, 20 April 2020 diff hist −181 PECVD Recipes →SiO2 250C Data 2019: recipe cleanup Tag: Visual edit
20:5220:52, 20 April 2020 diff hist +24 PECVD Recipes →SiN deposition (Unaxis VLR): change in name of recipe Tag: Visual edit
20:4920:49, 20 April 2020 diff hist −855 PECVD Recipes →SiO2 deposition (Unaxis VLR): deleting some recipes Tag: Visual edit
20:4120:41, 20 April 2020 diff hist +123 Wafer Scanning/Coating Process Traveler ( combined/less detailed) →Run on "real wafer" current Tag: Visual edit
20:3220:32, 20 April 2020 diff hist −132 Wafer Scanning/Coating Process Traveler ( combined/less detailed) corrections on unaxis scan Tag: Visual edit
18:2818:28, 20 April 2020 diff hist −6 Wafer Scanning/Coating Process Traveler ( combined/less detailed) →Scan After process calibration Tag: Visual edit
18:2818:28, 20 April 2020 diff hist +7 Wafer Scanning/Coating Process Traveler ( combined/less detailed) →Scan Before Deposition Tag: Visual edit
18:2718:27, 20 April 2020 diff hist +3,040 Wafer Scanning/Coating Process Traveler ( combined/less detailed) →Scan before process calibration Tag: Visual edit
17:3917:39, 20 April 2020 diff hist +330 Wafer Scanning/Coating Process Traveler ( combined/less detailed) No edit summary Tag: Visual edit
17:1217:12, 20 April 2020 diff hist +7 N Wafer Scanning/Coating Process Traveler ( combined/less detailed) wip Tag: Visual edit
17:1117:11, 20 April 2020 diff hist +4 ICP-PECVD (Unaxis VLR) →Documentation Tag: Visual edit
17:1117:11, 20 April 2020 diff hist +113 ICP-PECVD (Unaxis VLR) →Documentation: scan/coat Tag: Visual edit
17:0317:03, 20 April 2020 diff hist +44 PECVD Recipes →" Post-Dep Clean" recipe Tag: Visual edit
17:0117:01, 20 April 2020 diff hist −650 PECVD Recipes →SiN deposition (Unaxis VLR) Tag: Visual edit
16:3616:36, 20 April 2020 diff hist +1,374 Wafer Scanning process Traveler scanning wafers Tag: Visual edit
16:2016:20, 20 April 2020 diff hist +2,131 N Wafer Scanning process Traveler Scanning wafers Tag: Visual edit
15:1315:13, 20 April 2020 diff hist +4 ICP-PECVD (Unaxis VLR) →Documentation Tag: Visual edit
15:1115:11, 20 April 2020 diff hist +5 ICP-PECVD (Unaxis VLR) →Documentation Tag: Visual edit
15:0915:09, 20 April 2020 diff hist +28 ICP-PECVD (Unaxis VLR) →Documentation Tag: Visual edit

21:3621:36, 15 April 2020 diff hist +102 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →First layer Tag: Visual edit
21:3621:36, 15 April 2020 diff hist 0 N File:Single centered mask-Piece 1st litho AUTOSTEP 200.pptx No edit summary current
21:3521:35, 15 April 2020 diff hist −110 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →First layer Tag: Visual edit
21:3221:32, 15 April 2020 diff hist +98 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →Single centered mask plate Tag: Visual edit
21:3021:30, 15 April 2020 diff hist +4 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →Multi layered mask plate Tag: Visual edit
21:2821:28, 15 April 2020 diff hist −4 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →Multi layered mask plate Tag: Visual edit
21:2321:23, 15 April 2020 diff hist +50 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →Multi layered mask plate Tag: Visual edit
21:2221:22, 15 April 2020 diff hist +102 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →Single centered mask plate Tag: Visual edit
21:1721:17, 15 April 2020 diff hist +50 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences No edit summary Tag: Visual edit
21:1521:15, 15 April 2020 diff hist 0 N File:Single centerd mask- Piece 1st litho AUTOSTEP 200-PIECES.pptx No edit summary current
21:1521:15, 15 April 2020 diff hist 0 N File:Single centered mask-Piece 2nd litho AUTOSTEP 200.pptx No edit summary
21:1421:14, 15 April 2020 diff hist 0 N File:4 Quads mask plate Piece - 2nd litho AUTOSTEP 200.pptx No edit summary current
17:0817:08, 15 April 2020 diff hist +82 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →Second layer Tag: Visual edit
17:0617:06, 15 April 2020 diff hist +153 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →Second layer Tag: Visual edit
17:0217:02, 15 April 2020 diff hist +229 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →First layer Tag: Visual edit
16:4116:41, 15 April 2020 diff hist −8,781 Wafer scanning process traveler →Calibration Tag: Visual edit
16:3916:39, 15 April 2020 diff hist −216 Wafer scanning process traveler →Start the scan application Tag: Visual edit
16:3316:33, 15 April 2020 diff hist +207 Wafer scanning process traveler →Wafers to Use: wafer scan basic info Tag: Visual edit
16:2516:25, 15 April 2020 diff hist −7,690 Glossary glossary items current Tag: Visual edit
16:1416:14, 15 April 2020 diff hist +15 Errors errors current Tag: Visual edit

19:0819:08, 8 April 2020 diff hist +100 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences fixced PPTX link Tag: Visual edit
17:0317:03, 8 April 2020 diff hist +60 N AUTOSTEP 200-PIECES 1st litho BL and BR orientation.pptx 1st litho current Tag: Visual edit
17:0217:02, 8 April 2020 diff hist +62 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →First layer: 1st litho on pieces Tag: Visual edit
17:0117:01, 8 April 2020 diff hist 0 N File:AUTOSTEP 200-PIECES 1st litho BL and BR orientation.pptx No edit summary current
17:0017:00, 8 April 2020 diff hist +92 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →First layer Tag: Visual edit
16:5816:58, 8 April 2020 diff hist −3 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →Exposing wafer pieces: 1st litho Tag: Visual edit
03:3403:34, 8 April 2020 diff hist +26 N AUTOSTEP 200-PIECES instruction 6-20-19.pptx exposing a piece current Tag: Visual edit

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