User contributions for Biljana

Results for Biljana talk block log uploads logs

A user with 3,318 edits. Account created on 27 June 2012.

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23:5223:52, 22 April 2020 diff hist +54 Wafer Coating Process Traveler No edit summary Tag: Visual edit
23:5023:50, 22 April 2020 diff hist +1,475 Wafer Coating Process Traveler →STD SiO2 Tag: Visual edit
23:4823:48, 22 April 2020 diff hist −8 Wafer Coating Process Traveler →STD SiO2 Tag: Visual edit
23:4723:47, 22 April 2020 diff hist +724 Wafer Coating Process Traveler →Standard oxide deposition Tag: Visual edit
23:4323:43, 22 April 2020 diff hist −7 Wafer Coating Process Traveler →STD LS Nitride2 at 300C Tag: Visual edit
23:4223:42, 22 April 2020 diff hist −3,906 Wafer Coating Process Traveler Replaced content with "There are three standard recipes : STD SiO2, STD Nitride2, and STD LS Nitride2 at 300C. Instructions bellow explain how to run each of the recipes ( seasoning, deposition,..." Tags: Replaced Visual edit
23:3823:38, 22 April 2020 diff hist +4 PECVD 2 (Advanced Vacuum) →Documentation Tag: Visual edit
23:3823:38, 22 April 2020 diff hist −9 PECVD 2 (Advanced Vacuum) →Documentation Tag: Visual edit
23:3723:37, 22 April 2020 diff hist +78 PECVD 2 (Advanced Vacuum) →Documentation Tag: Visual edit
23:3623:36, 22 April 2020 diff hist +93 PECVD 2 (Advanced Vacuum) →Documentation Tag: Visual edit
23:3523:35, 22 April 2020 diff hist +21 PECVD 2 (Advanced Vacuum) No edit summary Tag: Visual edit
23:3323:33, 22 April 2020 diff hist +11 PECVD1 Wafer Coating Process SiN and SiO2 depositions Tag: Visual edit
23:3123:31, 22 April 2020 diff hist −13 PECVD1 Wafer Coating Process →PECVD#1 SiN @250C Tag: Visual edit
23:3023:30, 22 April 2020 diff hist +49 PECVD1 Wafer Coating Process →PECVD#1 SiN @250C Tag: Visual edit
23:2823:28, 22 April 2020 diff hist +4 PECVD1 Wafer Coating Process No edit summary Tag: Visual edit
23:2623:26, 22 April 2020 diff hist +16 PECVD1 Wafer Coating Process No edit summary
23:2323:23, 22 April 2020 diff hist −897 PECVD1 Wafer Coating Process No edit summary Tag: Visual edit
23:2123:21, 22 April 2020 diff hist +137 PECVD 1 (PlasmaTherm 790) →Documentation Tag: Visual edit
23:1923:19, 22 April 2020 diff hist +112 PECVD1 Wafer Coating Process →SiO2 @250C Tag: Visual edit
23:1823:18, 22 April 2020 diff hist +18 PECVD1 Wafer Coating Process No edit summary Tag: Visual edit
23:1423:14, 22 April 2020 diff hist +783 PECVD1 Wafer Coating Process No edit summary Tag: Visual edit
23:0923:09, 22 April 2020 diff hist −217 PECVD1 Wafer Coating Process →SiN @250C Tag: Visual edit
22:5922:59, 22 April 2020 diff hist −6 ICP-PECVD (Unaxis VLR) →Documentation Tag: Visual edit
20:2720:27, 22 April 2020 diff hist +11 ICP-PECVD (Unaxis VLR) →Documentation Tag: Visual edit
20:2520:25, 22 April 2020 diff hist +1 Wafer Coating Process Traveler →Unaxis deposition - SiO2 LDR film @250°C Tag: Visual edit
20:2420:24, 22 April 2020 diff hist +1 Wafer Coating Process Traveler →Unaxis deposition - 300nm SiO2 HDR film @250°C Tag: Visual edit
20:2420:24, 22 April 2020 diff hist +1 Wafer Coating Process Traveler →Unaxis deposition - 300nm SiN film @250°C Tag: Visual edit
20:2420:24, 22 April 2020 diff hist +28 Wafer Coating Process Traveler →Unaxis deposition - 300nm SiN film @250°C Tag: Visual edit
18:3318:33, 22 April 2020 diff hist −13 ICP-PECVD (Unaxis VLR) →Documentation Tag: Visual edit
18:3318:33, 22 April 2020 diff hist −131 ICP-PECVD (Unaxis VLR) →Documentation Tag: Visual edit
18:3118:31, 22 April 2020 diff hist −988 Wafer Scanning process Traveler wafers scanning procedure current Tag: Visual edit
18:2918:29, 22 April 2020 diff hist −744 Wafer scanning process traveler →Scan before process calibration Tag: Visual edit
18:2518:25, 22 April 2020 diff hist −316 Wafer Scanning process Traveler →Wafers to Use Tag: Visual edit
18:2318:23, 22 April 2020 diff hist +454 Wafer scanning process traveler →Wafers to Use Tag: Visual edit
18:1418:14, 22 April 2020 diff hist −917 Wafer Coating Process Traveler →Unaxis deposition - SiO2 LDR film @250°C Tag: Visual edit
18:1018:10, 22 April 2020 diff hist +766 Wafer Coating Process Traveler →Unaxis deposition - SiO2 LDR film @250°C: correction on Unaxis recipes Tag: Visual edit
18:0218:02, 22 April 2020 diff hist −4 Wafer Coating Process Traveler →Unaxis deposition - SiO2 LDR film @250°C Tag: Visual edit
17:5717:57, 22 April 2020 diff hist +97 Wafer Coating Process Traveler →Unaxis deposition - SiO2 LDR film @250°C Tag: Visual edit
17:3717:37, 22 April 2020 diff hist +151 PECVD Recipes →Historical Particulate Data
17:3417:34, 22 April 2020 diff hist +1 PECVD Recipes →Historical Particulate Data
00:3600:36, 22 April 2020 diff hist +254 PECVD Recipes →Thin-Film Properties: corrections in Unaxis films Tag: Visual edit
00:3300:33, 22 April 2020 diff hist +237 PECVD Recipes →SiO2 250C Deposition (Unaxis VLR)

20:3920:39, 21 April 2020 diff hist +123 ICP-PECVD (Unaxis VLR) →Documentation: added link Tag: Visual edit
20:2920:29, 21 April 2020 diff hist +105 PECVD Recipes →Thin-Film Properties: added one sentence Tag: Visual edit
20:2520:25, 21 April 2020 diff hist +116 Wafer Coating Process Traveler →Unaxis deposition - 300nm SiO2 LDR film @250°C Tag: Visual edit
19:2819:28, 21 April 2020 diff hist −3 PECVD Recipes →ICP-PECVD (Unaxis VLR)
19:2719:27, 21 April 2020 diff hist −4 PECVD Recipes →ICP-PECVD (Unaxis VLR)
19:2519:25, 21 April 2020 diff hist +32 PECVD Recipes →SiO2 250C Deposition (Unaxis VLR)
19:2419:24, 21 April 2020 diff hist +34 PECVD Recipes →SiN LS 250C Deposition (Unaxis VLR)
19:2219:22, 21 April 2020 diff hist −3 PECVD Recipes →ICP-PECVD (Unaxis VLR)

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