User contributions for John d

26 February 2022

• 15:5915:59, 26 February 2022 diff hist +27‎ m ICP Etching Recipes ‎ →‎Old Deleted Recipes: changed "don" to "supervisor" Tag: Visual edit

21 February 2022

• 16:4416:44, 21 February 2022 diff hist +108‎ Process Group - Remote Fabrication Jobs ‎ link to takss/priority list Tag: Visual edit

17 February 2022

• 20:4420:44, 17 February 2022 diff hist +327‎ ICP-PECVD (Unaxis VLR) ‎ →‎About: mention SiD4 config and expense/applicaiton Tag: Visual edit
• 20:4320:43, 17 February 2022 diff hist +116‎ PECVD Recipes ‎ →‎ICP-PECVD (Unaxis VLR): mention cost/application to optics Tag: Visual edit
• 01:0301:03, 17 February 2022 diff hist +340‎ Maskless Aligner (Heidelberg MLA150) ‎ added minimum fearture size and note on DSP transparent substrates Tag: Visual edit

14 February 2022

• 18:4818:48, 14 February 2022 diff hist +72‎ N File:ASML Reticle Programming Params - MyReticleBarCode v1.xlsx ‎ John d moved page File:ASML Reticle Programming Params - MyReticleBarCode v1.xlsx to File:ASML Reticle Programming Params - MASKJAN2020 v1.xlsx: Rename to include reticle barcode in filename current Tag: New redirect
• 18:4818:48, 14 February 2022 diff hist 0‎ m File:ASML Reticle Programming Params - MASKJAN2020 v1.xlsx ‎ John d moved page File:ASML Reticle Programming Params - MyReticleBarCode v1.xlsx to File:ASML Reticle Programming Params - MASKJAN2020 v1.xlsx: Rename to include reticle barcode in filename current
• 18:4718:47, 14 February 2022 diff hist 0‎ File:ASML Reticle Programming Params - MASKJAN2020 v1.xlsx ‎ John d uploaded a new version of File:ASML Reticle Programming Params - MyReticleBarCode v1.xlsx

11 February 2022

• 20:4920:49, 11 February 2022 diff hist +53‎ m ICP Etch 2 (Panasonic E626I) ‎ →‎Recipes Tag: Visual edit
• 20:4820:48, 11 February 2022 diff hist +97‎ ICP Etch 1 (Panasonic E646V) ‎ separate process control section/link Tag: Visual edit
• 20:4720:47, 11 February 2022 diff hist +59‎ ICP Etch 2 (Panasonic E626I) ‎ →‎Recipes: separate Process Control section/link Tag: Visual edit
• 20:2420:24, 11 February 2022 diff hist +31‎ Test Data of etching SiO2 with CHF3/CF4 ‎ minor update to diamond experiemnt comment. Tag: Visual edit
• 20:2320:23, 11 February 2022 diff hist −36‎ ICP Etching Recipes ‎ →‎ICP Etch 2 (Panasonic E640): updated ICP1 and ICP2 with Process Control sections for SiO2 etch tests. Tag: Visual edit
• 20:2220:22, 11 February 2022 diff hist +252‎ N MediaWiki:Deletereason-dropdown ‎ added common NanoFab reasons for deletion current
• 20:1920:19, 11 February 2022 diff hist +504‎ Test Data of etching SiO2 with CHF3/CF4-ICP1 ‎ new section :pasted data from CHF3/CF4/O2 etch data
• 20:1320:13, 11 February 2022 diff hist +22‎ ICP Etching Recipes ‎ →‎SiO2 Etch Historical Data: reanmed to include tool name Tag: Visual edit
• 20:1220:12, 11 February 2022 diff hist −37‎ ICP Etching Recipes ‎ →‎SiO2 Etching (Fluorine ICP Etcher): consolidated FL-ICP Prcoess Control data Tag: Visual edit
• 20:1120:11, 11 February 2022 diff hist +493‎ Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher ‎ pasted Ning's 2nd data table, hilighted recipe changes and comment about data being "in progress"
• 19:2819:28, 11 February 2022 diff hist +1‎ ICP Etching Recipes ‎ →‎PlasmaTherm/SLR Fluorine Etcher: moved historical data to top Tag: Visual edit

4 February 2022

• 19:4619:46, 4 February 2022 diff hist +260‎ Template:Announcements ‎ ASML maintenance

1 February 2022

• 22:2422:24, 1 February 2022 diff hist +3‎ m Autostep 200 Mask Making Guidance ‎ →‎Mask Layout Tag: Visual edit
• 22:2322:23, 1 February 2022 diff hist +119‎ m Autostep 200 Mask Making Guidance ‎ →‎Photomask Ordering Info Tag: Visual edit
• 17:0017:00, 1 February 2022 diff hist +327‎ Autostep 200 Mask Making Guidance ‎ →‎Photomask Ordering Info: added info Tag: Visual edit
• 16:3916:39, 1 February 2022 diff hist +428‎ Autostep 200 Mask Making Guidance ‎ →‎Alignment Marks: adde Vernier CAD file Tag: Visual edit
• 16:3716:37, 1 February 2022 diff hist +110‎ N File:Vernier Template.gds ‎ Vernier Registration/Alignment Test structure for lithography. Designed by Demis D. John, 2008.
• 16:0316:03, 1 February 2022 diff hist −14‎ m Stepper 2 (AutoStep 200) ‎ →‎Process Information Tag: Visual edit
• 00:3000:30, 1 February 2022 diff hist +185‎ Autostep 200 Mask Making Guidance ‎ →‎Mask Layout: 2nd attempt to describe Shutter positioning Tag: Visual edit
• 00:1900:19, 1 February 2022 diff hist +352‎ Autostep 200 Mask Making Guidance ‎ →‎Mask Layout: 1st attempt at describing shutter blades Tag: Visual edit
• 00:0000:00, 1 February 2022 diff hist +172‎ Autostep 200 Mask Making Guidance ‎ →‎Mask Layout / Alignment Marks: split into Mask layout separate section Tag: Visual edit

31 January 2022

• 23:5523:55, 31 January 2022 diff hist +30‎ Autostep 200 Troubleshooting and Recovery ‎ →‎What to do if you cannot undo the problem or need some help: link to each contact, update to use "Report tool issue' button on SUM current Tag: Visual edit

29 January 2022

• 00:0900:09, 29 January 2022 diff hist +358‎ m Oxford ICP Etcher - Process Control Data ‎ →‎Data - InP Ridge Etch (Oxford ICP Etcher) Tag: Visual edit
• 00:0600:06, 29 January 2022 diff hist +805‎ Oxford ICP Etcher - Process Control Data ‎ updated tables, split into "sample size dpeendence" table Tag: Visual edit

28 January 2022

• 04:4304:43, 28 January 2022 diff hist +356‎ MLA150 - Troubleshooting ‎ →‎Solutions for small substrates: added THomas Messner's solution: disable Overview Camera before starting exposure Tag: Visual edit

24 January 2022

• 18:4218:42, 24 January 2022 diff hist −26‎ Packaging Recipes ‎ →‎Blade Exposure Calculation: image size increase Tag: Visual edit: Switched
• 18:1318:13, 24 January 2022 diff hist +40‎ m Packaging Recipes ‎ →‎Anatomy of a Blade Tag: Visual edit

21 January 2022

• 17:5517:55, 21 January 2022 diff hist +346‎ Atomic Layer Deposition Recipes ‎ →‎Temperature: mentioned "thermal" and slower rate. Tag: Visual edit
• 17:5317:53, 21 January 2022 diff hist +661‎ Atomic Layer Deposition Recipes ‎ →‎Al2O3 deposition (ALD CHAMBER 3): added terms "Plasma/Thermal/Ozone". Also added Chamber 1 Al2O3 Tag: Visual edit

14 January 2022

• 06:1206:12, 14 January 2022 diff hist +133‎ ICP Etching Recipes ‎ →‎Oxford ICP Etcher (PlasmaPro 100 Cobra): GaN ALE section started Tag: Visual edit
• 06:1106:11, 14 January 2022 diff hist +238‎ ICP Etching Recipes ‎ →‎Oxford ICP Etcher (PlasmaPro 100 Cobra): NOTE: Rates in these 2021-09 characterizations are lower than current due to a software timing bug, fixed in 2022-01 Tag: Visual edit
• 06:0906:09, 14 January 2022 diff hist +174‎ Oxford ICP Etcher - Process Control Data ‎ described basic 'fab process Tag: Visual edit
• 06:0706:07, 14 January 2022 diff hist +55‎ ICP Etching Recipes ‎ →‎Process Control Data (Oxford ICP Etcher) Tag: Visual edit
• 06:0506:05, 14 January 2022 diff hist −17‎ m Oxford ICP Etcher - Process Control Data ‎ removed WIP Tag: Visual edit
• 06:0306:03, 14 January 2022 diff hist +56‎ Oxford ICP Etcher - Process Control Data ‎ added SEM images for Jan 11th-12th cals Tag: Visual edit
• 06:0306:03, 14 January 2022 diff hist +36‎ N File:2022-01-12 Oxford InP Ridge Wiki Post - Cal03.pdf ‎ Oxford ICP Etch Cals03 current
• 05:5505:55, 14 January 2022 diff hist +33‎ N File:2022-01-12 Oxford InP Ridge Wiki Post - Cal02.pdf ‎ Oxford ICP Cal SEMs current
• 05:5105:51, 14 January 2022 diff hist +161‎ Oxford ICP Etcher - Process Control Data ‎ →‎Data - InP Ridge Etch (Oxford ICP Etcher): updated SEM 1 Tag: Visual edit
• 05:5105:51, 14 January 2022 diff hist +38‎ N File:2022-01-11 Oxford InP Ridge Wiki Post - Cal01.pdf ‎ Oxford ICP Etch Cal SEMs current
• 04:4304:43, 14 January 2022 diff hist +84‎ m MLA150 - Troubleshooting ‎ →‎Unexpected Behavior Tag: Visual edit
• 04:4104:41, 14 January 2022 diff hist +271‎ MLA150 - Troubleshooting ‎ →‎Out Of Focus Exposures: Boris’ solutionnadded Tag: Visual edit

13 January 2022

• 21:2421:24, 13 January 2022 diff hist −1,009‎ Oxford ICP Etcher - Process Control Data ‎ in progress InP Ridge Etch Tag: Visual edit