User contributions for Biljana
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24 January 2024
- 17:4517:45, 24 January 2024 diff hist −12 Surface Analysis (KLA/Tencor Surfscan) →Operating Procedures
- 17:4117:41, 24 January 2024 diff hist +130 Surface Analysis (KLA/Tencor Surfscan) →Operating Procedures
- 17:3917:39, 24 January 2024 diff hist 0 File:Wafer Particle Count-Process Traveler.pdf Biljana uploaded a new version of File:Wafer Particle Count-Process Traveler.pdf current
11 January 2024
- 18:0418:04, 11 January 2024 diff hist +116 Ion Beam Deposition (Veeco NEXUS) →Documentation
- 18:0318:03, 11 January 2024 diff hist +103 Ion Beam Deposition (Veeco NEXUS) →Documentation
- 18:0218:02, 11 January 2024 diff hist 0 N File:IBD Troubleshooting Guide.pdf No edit summary current
- 18:0218:02, 11 January 2024 diff hist 0 N File:IBD SOP.pdf No edit summary current
- 17:5717:57, 11 January 2024 diff hist 0 N File:IBD SOP.docx No edit summary current
9 January 2024
- 22:2722:27, 9 January 2024 diff hist +100 Stepper 2 (AutoStep 200) →Operating Procedures
- 22:2622:26, 9 January 2024 diff hist 0 N File:Autostep 200 Stepper manual focus.pdf No edit summary current
8 January 2024
- 23:5223:52, 8 January 2024 diff hist +2 Stepper 2 (AutoStep 200) →Operating Procedures
- 23:5123:51, 8 January 2024 diff hist −201 Stepper 2 (AutoStep 200) →Operating Procedures
- 23:4723:47, 8 January 2024 diff hist +124 Stepper 2 (AutoStep 200) →Operating Procedures
- 23:4623:46, 8 January 2024 diff hist 0 N File:Focus and exposure optimization- Autostep200-II.pdf No edit summary current
- 23:3523:35, 8 January 2024 diff hist +131 Stepper 2 (AutoStep 200) →Operating Procedures
- 23:3423:34, 8 January 2024 diff hist 0 N File:General information about AUTOSTEP 200.pdf No edit summary current
- 23:3423:34, 8 January 2024 diff hist +4 Stepper 2 (AutoStep 200) →Operating Procedures
- 23:3323:33, 8 January 2024 diff hist −3 Stepper 2 (AutoStep 200) →Operating Procedures Tag: Visual edit
- 23:3223:32, 8 January 2024 diff hist −82 Stepper 2 (AutoStep 200) →Operating Procedures
- 23:3123:31, 8 January 2024 diff hist +124 Stepper 2 (AutoStep 200) →Operating Procedures
- 23:3023:30, 8 January 2024 diff hist +78 Stepper 2 (AutoStep 200) →Operating Procedures
- 23:2823:28, 8 January 2024 diff hist +2 Stepper 2 (AutoStep 200) →Operating Procedures
- 23:2823:28, 8 January 2024 diff hist −23 Stepper 2 (AutoStep 200) →Operating Procedures
- 23:2723:27, 8 January 2024 diff hist −141 Stepper 2 (AutoStep 200) →Recipes
- 23:2723:27, 8 January 2024 diff hist +110 Stepper 2 (AutoStep 200) →Recipes
- 23:2423:24, 8 January 2024 diff hist +35 Stepper 2 (AutoStep 200) Operating Procedures →Other Useful links for this system:: two alignments current Tag: Visual edit
- 23:1723:17, 8 January 2024 diff hist +24 Stepper 2 (AutoStep 200) Operating Procedures →Other Useful links for this system:
- 22:5322:53, 8 January 2024 diff hist 0 N File:AUTOSTEP 200 User Accessible Commands 010524.pdf No edit summary current
- 22:4322:43, 8 January 2024 diff hist 0 N File:Autostep200 Training Old Training Manual.pdf No edit summary current
- 19:5119:51, 8 January 2024 diff hist −2 Stepper 2 (AutoStep 200) →Operating Procedures
- 19:5019:50, 8 January 2024 diff hist −2 Stepper 2 (AutoStep 200) →Operating Procedures
- 19:4919:49, 8 January 2024 diff hist +18 Stepper 2 (AutoStep 200) →Operating Procedures
- 19:4519:45, 8 January 2024 diff hist +30 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →2. Second layer
- 19:4419:44, 8 January 2024 diff hist +102 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →2. Second layer
- 19:4119:41, 8 January 2024 diff hist +126 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →2. Second layer
- 19:3919:39, 8 January 2024 diff hist 0 N File:Single centered mask-Piece 2nd litho AUTOSTEP 200.pdf No edit summary current
- 19:3919:39, 8 January 2024 diff hist −257 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →2. Second layer
- 19:3819:38, 8 January 2024 diff hist +50 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →2. Second layer Tag: Visual edit
- 19:3619:36, 8 January 2024 diff hist −7 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →2. Second layer Tag: Visual edit
- 19:3519:35, 8 January 2024 diff hist −3 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →2. Second layer Tag: Visual edit
- 19:3519:35, 8 January 2024 diff hist +8 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →2. Second layer
- 19:3319:33, 8 January 2024 diff hist 0 N File:4 Quads mask plate Piece - 2nd litho AUTOSTEP 200 (1).pdf No edit summary current
- 19:2919:29, 8 January 2024 diff hist +47 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →2. Second layer Tag: Visual edit
- 19:2719:27, 8 January 2024 diff hist −148 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →2. Second layer
- 19:2719:27, 8 January 2024 diff hist −5 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →Single centered mask plate Tag: Visual edit
- 19:2319:23, 8 January 2024 diff hist +156 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →Single centered mask plate
- 19:1719:17, 8 January 2024 diff hist −13,866 Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences →JOB Programming - FULL: corrections regarding exposing pieces Tag: Visual edit
- 19:0619:06, 8 January 2024 diff hist −14 Stepper 2 (AutoStep 200) →Operating Procedures
- 19:0519:05, 8 January 2024 diff hist −2,710 Stepper 2 (AutoStep 200) Operating Procedures →Running a FOCUS and\or EXPOSURE matrix Tag: Visual edit
- 19:0519:05, 8 January 2024 diff hist −7,008 Stepper 2 (AutoStep 200) Operating Procedures →Resist spin coating and cleaning the back-side of wafer: organizing SOP as they are for GCA 6300 Tag: Visual edit