Stepper 3 (ASML DUV)

Stepper 3 (ASML DUV) Tool Type Lithography Location Bay 3 Supervisor Brian Thibeault Supervisor Phone (805) 893-2268 Supervisor E-Mail thibeault@ece.ucsb.edu Description ASML PAS 5500/300 DUV Stepper Manufacturer ASML Sign up for this tool

About

The ASML 5500 stepper is a 248nm DUV stepper for imaging dense features down to below 200nm and isolated line structures down to below 150nm. The system has a variable NA system and has a field image size of 21 x 21mm for 0.63 NA and a field size of 22mm x 27mm for 0.4 to 0.57 NA. Overlay accuracy is better than 30nm. The system is configured for 4” wafers and pieces down to 14mm in size can be exposed using a 4” wafer as a carrier.

Process Information

• Process Page

Service Provider

• ASML

Operating Procedures

• Job Programming - Full
• Job Programming- Simplified -Full Wafers
• Mask Making Guidelines