ASML Stepper 3 - UCSB Test Reticles

Reticle ID: "UCSB-OPC1"

Alignment Markers

Image ID	Image Size X , Y (Wafer, mm)	Image Shift X , Y (Wafer, mm)	Notes/Description	Schematics
GCA_Align	0.530000 , 0.140000	-6.750000 , 9.450000	ImageShift references the center of the -X- "global" mark. The ==||| "Local" mark is X+200µm to the right has 1.1mm margin on all sides	White is Chrome, Pattern is Clear
Multi-Purpose Alignment Mark - Positive	0.900000 , 0.900000	-6.750000 , -9.450000	ImageShift is the center coords of the larger "+" mark Smaller "+" mark is (0.225,-0.225)mm down-right 0.925mm margin on all sides >> Use this for Dicing Alginment Guides	White is Chrome, Pattern is Clear
Multi-Purpose Alignment Mark - Negative	0.710000 , 0.710000	6.750000 , -9.450000	ImageShift is the center coords of the larger "+" mark Smaller "+" mark is (0.225,-0.225)mm down-right Blank (masked) space on left+top sides 1.0mm margin on all sides	Pattern is Clear
Contact_Mark	0.564000 , 0.564000	6.750000 , 9.450000	ImageShift references the center of the contact alignment mark "+" with 1.1mm margin on all sides

Resolution Test Charts

The Resolution test charts are repeated all across the reticle, in order to test for lens aberrations. You can have the system window-off only a single resolution chart, but since they are placed closely together on the reticle, it's very likely that partial shots of adjacent charts will also be exposed.

In addition, the repeating cells allow us to test for the proper optical proximity correction algorithm. The Five Dense_... patterns are for calibrating the OPC algorithm, and are not for user analysis.

Calibration Chart Layout

Layout of the repeating calibration charts

Resolution Chart Schematic

"resolution_chart_ORIG" cell in the above.

Resolution Chart Layout, with res. test from 2.00µm to 0.130µm

The ""resolution_chart_OPC" version has an optical proximity correction algorithm applied:

OPC'd Resolution Chart Layout, with res. test from 2.0µm to 0.130µm

Coords for "UCSB_Cal" Resolution Test Patterns

Each of the above cells is repeated on the following coordinates:

Image Size X , Y (Wafer, mm)	Image Shift X (Wafer, mm)	Image Shift Y (Wafer, mm)
2.610000 , 2.610000	-9.450000	12.150000
same as above	-6.750000	12.150000
	-4.050000	12.150000
	-1.350000	12.150000
	1.350000	12.150000
	4.050000	12.150000
	6.750000	12.150000
	9.450000	12.150000
	-9.450000	9.450000
Alignment Marker	–	–
	-4.050000	9.450000
	-1.350000	9.450000
	1.350000	9.450000
	4.050000	9.450000
Alignment Marker	–	–
	9.450000	9.450000
	-9.450000	6.750000
	-6.750000	6.750000
	-4.050000	6.750000
	-1.350000	6.750000
	1.350000	6.750000
	4.050000	6.750000
	6.750000	6.750000
	9.450000	6.750000
	-9.450000	4.050000
	-6.750000	4.050000
	-4.050000	4.050000
	-1.350000	4.050000
	1.350000	4.050000
	4.050000	4.050000
	6.750000	4.050000
	9.450000	4.050000
	-9.450000	1.350000
	-6.750000	1.350000
	-4.050000	1.350000
	-1.350000	1.350000
	1.350000	1.350000
	4.050000	1.350000
	6.750000	1.350000
	9.450000	1.350000
	-9.450000	-1.350000
	-6.750000	-1.350000
	-4.050000	-1.350000
	-1.350000	-1.350000
	1.350000	-1.350000
	4.050000	-1.350000
	6.750000	-1.350000
	9.450000	-1.350000
	-9.450000	-4.050000
	-6.750000	-4.050000
	-4.050000	-4.050000
	-1.350000	-4.050000
	1.350000	-4.050000
	4.050000	-4.050000
	6.750000	-4.050000
	9.450000	-4.050000
	-9.450000	-6.750000
	-6.750000	-6.750000
	-4.050000	-6.750000
	-1.350000	-6.750000
	1.350000	-6.750000
	4.050000	-6.750000
	6.750000	-6.750000
	9.450000	-6.750000
	-9.450000	-9.450000
Alignment Marker	–	–
	-4.050000	-9.450000
	-1.350000	-9.450000
	1.350000	-9.450000
	4.050000	-9.450000
Alignment Marker	–	–
	9.450000	-9.450000
	-9.450000	-12.150000
	-6.750000	-12.150000
	-4.050000	-12.150000
	-1.350000	-12.150000
	1.350000	-12.150000
	4.050000	-12.150000
	6.750000	-12.150000
	9.450000	-12.150000