Wafer Coating Process Traveler

There are three standard recipes : STD SiO2, STD Nitride2, and STD LS Nitride2 at 300C. Instructions bellow explain how to run each of the recipes ( seasoning, deposition, cleaning)

Standard Oxide Deposition

STD SiO2

1. Log in to Advanced PECVD #2
2. Seasoning
   • Load the seasoning recipe (STD SiO2), and run it. The goal of this step is to coat oxide on chamber walls and prepare it for deposition.
3. Deposition
   • Vent the chamber and load the substrate (place it in the center of platen). You can place small pieces around the wafer to protect it from moving.
   • Pump down.
   • Load the deposition recipe (STD SiO2), and run it. Deposition time is variable. Get the rate from historical data.
   • Unload the wafer.
4. Cleaning
   • Wipe sidewall first with DI water, followed by IPA.
   • Load the cleaning recipe (CH4/O2 clean). Edit the recipe and enter required time for cleaning.
   • Log out

Standard Nitride Deposition

STD Nitride2

1. Log in to Advanced PECVD #2
2. Seasoning
   • Load the seasoning recipe (STD Nitride2), and run it. The goal of this step is to coat oxide on chamber walls and prepare it for deposition.
3. Deposition
   • Vent the chamber and load the substrate (place it in the center of platen). You can place small pieces around the wafer to protect it from moving.
   • Pump down.
   • Load the deposition recipe (STD Nitride2), and run it. Deposition time is variable. Get the rate from historical data.
   • Unload the wafer.
4. Cleaning
   • Wipe sidewall first with DI water, followed by IPA.
   • Load the cleaning recipe (CH4/O2 clean). Edit the recipe and enter required time for cleaning.
   • Log out

Standard Low Stress Deposition

STD LS Nitride2

1. Log in to Advanced PECVD #2
2. Seasoning
   • Load the seasoning recipe (STD LS Nitride2), and run it. The goal of this step is to coat oxide on chamber walls and prepare it for deposition.
3. Deposition
   • Vent the chamber and load the substrate (place it in the center of platen). You can place small pieces around the wafer to protect it from moving.
   • Pump down.
   • Load the deposition recipe (STD LS Nitride2), and run it. Deposition time is variable. Get the rate from historical data.
   • Unload the wafer.
4. Cleaning
   • Wipe sidewall first with DI water, followed by IPA.
   • Load the cleaning recipe (CH4/O2 clean). Edit the recipe and enter required time for cleaning.
   • Log out