Difference between revisions of "Surface Analysis (KLA/Tencor Surfscan)"
Jump to navigation
Jump to search
(→About) |
|||
(39 intermediate revisions by 2 users not shown) | |||
Line 12: | Line 12: | ||
}} |
}} |
||
==About== |
==About== |
||
− | This system uses a laser-based scattering method to count size and distribution of particles (or other scattering defects) on a flat wafer surface. |
+ | This system uses a laser-based scattering method to count size and distribution of particles (or other scattering defects) on a flat wafer surface. |
+ | |||
+ | It can scan wafers in size from 4 to 8 inches. Piece-parts are more difficult but can be scanned with a custom recipe. |
||
+ | |||
+ | 4-inch wafers are the most standard size to measure. |
||
+ | |||
+ | For measuring very low particle counts accurately, purchase "low particle count" (LPC) wafers from a Silicon wafer vendor, and keep the wafers in the case and clean at all times until use. |
||
==Documentation== |
==Documentation== |
||
+ | ===Operating Procedures=== |
||
− | *[[KLA-Tencor Surfscan - Standard Operating Procedure|Standard Operating Procedure]] |
||
⚫ | |||
⚫ | |||
⚫ | |||
⚫ | |||
− | *[[Errors]] |
||
+ | *[https://wiki.nanofab.ucsb.edu/w/images/a/a2/SURFSCAN_6200_122123_for_8inch_wafers.pdf Surfscan 6200 8inch wafers] * |
||
− | Recipes |
||
+ | *[https://wiki.nanofab.ucsb.edu/w/images/1/1a/SURFSCAN_6200_122023_for_6inch_wafers.pdf Surfscan 6200 6inch wafers] * |
||
+ | *[https://wiki.nanofab.ucsb.edu/w/images/9/9f/SURFSCAN_6200_122123_for_4inch_wafers.pdf Surfscan 6200 4inch wafers] * |
||
+ | *[https://wiki.nanofab.ucsb.edu/w/images/a/a7/SURFSCAN_6200_122123_small_substrates.pdf Surfscan 6200 [Small samples, and 2inch and 3inch wafers]] * |
||
+ | **''You must water-mount your small sample or wafer(2inch or 3 inch) to a 4-inch wafer.'' |
||
− | <br /> |
||
⚫ | |||
+ | |||
+ | *[https://wiki.nanofab.ucsb.edu/w/images/2/29/Wafer_Particle_Count-Process_Traveler.pdf Wafer Scanning Instructions] |
||
+ | **''This is the procedure Staff uses to calibrate particle counts on our deposition tools.'' |
||
+ | |||
+ | ===Other Documentation=== |
||
+ | |||
⚫ | |||
⚫ | |||
+ | |||
⚫ | |||
+ | *[[Surfscan Errors and Workarounds|Common Errors & Workarounds]] |
||
− | <br /> |
||
==Examples== |
==Examples== |
||
− | <br /> |
||
{| class="wikitable" |
{| class="wikitable" |
||
|+A low-particle 4-inch wafer example: |
|+A low-particle 4-inch wafer example: |
Latest revision as of 18:02, 2 February 2024
|
About
This system uses a laser-based scattering method to count size and distribution of particles (or other scattering defects) on a flat wafer surface.
It can scan wafers in size from 4 to 8 inches. Piece-parts are more difficult but can be scanned with a custom recipe.
4-inch wafers are the most standard size to measure.
For measuring very low particle counts accurately, purchase "low particle count" (LPC) wafers from a Silicon wafer vendor, and keep the wafers in the case and clean at all times until use.
Documentation
Operating Procedures
- Surfscan 6200 8inch wafers *
- Surfscan 6200 6inch wafers *
- Surfscan 6200 4inch wafers *
- Surfscan 6200 [Small samples, and 2inch and 3inch wafers] *
- You must water-mount your small sample or wafer(2inch or 3 inch) to a 4-inch wafer.
- Wafer Particle Count - Process Traveler
- Wafer Scanning Instructions
- This is the procedure Staff uses to calibrate particle counts on our deposition tools.
Other Documentation
- Operations Manual
- For detailed measurement info, it is highly recommended that you read the manual.
Examples
Gain 4: Small Particles
(0.160µm – 1.60µm) |
Gain 2: Large Particles
(1.60µm – 28.0µm) |
---|---|
Gain 4: Small Particles
(0.160µm – 1.60µm) |
Gain 2: Large Particles
(1.60µm – 28.0µm) |
---|---|