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24 August 2026
| 16:24 | Lithography Recipes diffhist −152 John d talk contribs (→Chemicals Stocked + Datasheets: removed honewell SOG) | ||||
22 August 2026
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15:57 | Template:News 5 changes history +2,280 [John d (5×)] | |||
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15:57 (cur | prev) +162 John d talk contribs (linked to CSMANTECH paper) | ||||
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15:53 (cur | prev) +794 John d talk contribs (added csmantech paper) | ||||
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15:39 (cur | prev) +791 John d talk contribs (added carp HS CHIP program) | ||||
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15:30 (cur | prev) +2 John d talk contribs | ||||
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15:30 (cur | prev) +531 John d talk contribs (added make microchips) | ||||
| 15:55 | Upload log John d talk contribs uploaded File:2026 CSMANTECH Paper-2366 - Foong Fatt - Machine Matching Methodology for Single-shot Lab to Lab Dry Etch Process Transfer.pdf (Machine Matching Methodology for Single-shot Lab to Lab Dry Etch Process Transfer Fatt Foong, Brian Thibeault, Noah Dutra, Demis D. John, Vraj Mehalana, Chandan Ramakrishnaiah, Shivakumar Bhaskaran, Jacky Tseng, Shimin Huang, Michio Aruga, Weldom Xie, Bokai Ma, Jeongho Ha, John Tamelier, Fubo Rao Conference: CS MANTECH Year: 2026 Topics Process Transfer Compound Semiconductors GaAs Design of Experiments InP Dry Etch Nanofabrication Abstract Small start-up companies benefit significantly...) | ||||