Dry Etching Recipes: Difference between revisions

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{| class="wikitable" border="1" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center; font-size: 95%"
{| class="wikitable" border="1" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center; font-size: 95%"
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! colspan="16" width="725" height="45" | <div style="font-size: 150%;">Dry Etching Recipes</div>
! colspan="17" width="725" height="45" | <div style="font-size: 150%;">Dry Etching Recipes</div>
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! colspan="4" width="300" bgcolor="#D0E7FF" align="center" height="35" | '''[[RIE Etching Recipes|RIE Etching]]'''
! colspan="4" width="300" bgcolor="#D0E7FF" align="center" height="35" | '''[[RIE Etching Recipes|RIE Etching]]'''
! colspan="4" width="300" bgcolor="#D0E7FF" align="center" | '''[[ICP Etching Recipes|ICP Etching]]'''
! colspan="5" |'''[[ICP Etching Recipes|ICP Etching]]'''
! colspan="4" bgcolor="#D0E7FF" align="center" |'''[[Oxygen Plasma System Recipes|Oxygen Plasma Systems]]'''
! colspan="4" bgcolor="#D0E7FF" align="center" |'''[[Oxygen Plasma System Recipes|Oxygen Plasma Systems]]'''
! colspan="3" bgcolor="#D0E7FF" align="center" |'''[[Other Dry Etching Recipes|Other Dry Etchers]]'''
! colspan="3" bgcolor="#D0E7FF" align="center" |'''[[Other Dry Etching Recipes|Other Dry Etchers]]'''
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| width="65" bgcolor="#DAF1FF" | [[RIE_Etching_Recipes#RIE_3_.28MRC.29|RIE 3<br> (MRC)]]
| width="65" bgcolor="#DAF1FF" | [[RIE_Etching_Recipes#RIE_3_.28MRC.29|RIE 3<br> (MRC)]]
| width="100" bgcolor="#DAF1FF" | [[RIE_Etching_Recipes#RIE_5_.28PlasmaTherm.29|RIE 5<br>(PlasmaTherm)]]
| width="100" bgcolor="#DAF1FF" | [[RIE_Etching_Recipes#RIE_5_.28PlasmaTherm.29|RIE 5<br>(PlasmaTherm)]]
|DSEIII (PlasmaTherm)
| width="100" bgcolor="#DAF1FF" | [[ICP_Etching_Recipes#Si_Deep_RIE_.28PlasmaTherm.2FBosch_Etch.29|Si Deep RIE<br>(PTI/Bosch)]]
| width="100" bgcolor="#DAF1FF" | [[ICP_Etching_Recipes#Si_Deep_RIE_.28PlasmaTherm.2FBosch_Etch.29|Si Deep RIE<br>(PTI/Bosch)]]
| width="120" bgcolor="#DAF1FF" | [[ICP_Etching_Recipes#ICP_Etch_1_.28Panasonic_E626I.29|ICP Etch 1<br>(Panasonic 1)]]
| width="120" bgcolor="#DAF1FF" | [[ICP_Etching_Recipes#ICP_Etch_1_.28Panasonic_E626I.29|ICP Etch 1<br>(Panasonic 1)]]
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| [[RIE Etching Recipes|A]]
| [[RIE Etching Recipes|A]]
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| {{rl|ICP Etching Recipes|Al Etch(Panasonic 1)}}
| {{rl|ICP Etching Recipes|Al Etch(Panasonic 1)}}
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| {{rl|ICP Etching Recipes|Cr Etch(Panasonic 1)}}
| {{rl|ICP Etching Recipes|Cr Etch(Panasonic 1)}}
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| {{rl|ICP Etching Recipes|Si Etch (PlasmaTherm/Bosch Etch)}}
| {{rl|ICP Etching Recipes|Si Etch (PlasmaTherm/Bosch Etch)}}
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| {{rl|ICP Etching Recipes|Ti Etch(Panasonic 1)}}
| {{rl|ICP Etching Recipes|Ti Etch(Panasonic 1)}}
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| {{rl|ICP Etching Recipes|Sapphire Etch(Panasonic 1)}}
| {{rl|ICP Etching Recipes|Sapphire Etch(Panasonic 1)}}
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|{{rl|RIE Etching Recipes|AlGaAs Etch (RIE 5)}}
|{{rl|RIE Etching Recipes|AlGaAs Etch (RIE 5)}}
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|{{rl|ICP Etching Recipes|AlGaAs Etch (Panasonic 1)}}
|{{rl|ICP Etching Recipes|AlGaAs Etch (Panasonic 1)}}
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| {{rl|RIE Etching Recipes|AlGaAs Etch (RIE 5)}}
| {{rl|RIE Etching Recipes|AlGaAs Etch (RIE 5)}}
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|{{rl|ICP Etching Recipes|AlGaAs Etch (Panasonic 1)}}
|{{rl|ICP Etching Recipes|AlGaAs Etch (Panasonic 1)}}
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|{{rl|RIE Etching Recipes|RIE 5 (PlasmaTherm)|GaN Etch (RIE 5)}}
|{{rl|RIE Etching Recipes|RIE 5 (PlasmaTherm)|GaN Etch (RIE 5)}}
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| {{rl|ICP Etching Recipes|GaN Etch (Panasonic 1)}}
| {{rl|ICP Etching Recipes|GaN Etch (Panasonic 1)}}
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| {{rl|ICP Etching Recipes|SiC Etch(Panasonic 1)}}
| {{rl|ICP Etching Recipes|SiC Etch(Panasonic 1)}}
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|{{rl|RIE Etching Recipes|RIE 3 (MRC)|SiN<sub>x</sub> Etching (RIE 3)}}
|{{rl|RIE Etching Recipes|RIE 3 (MRC)|SiN<sub>x</sub> Etching (RIE 3)}}
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| {{rl|ICP Etching Recipes|SINxEtch(Panasonic 1)}}
| {{rl|ICP Etching Recipes|SINxEtch(Panasonic 1)}}
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| {{rl|RIE Etching Recipes|RIE 3 (MRC)|SiO<sub>2</sub> Etching (RIE 3)}}
| {{rl|RIE Etching Recipes|RIE 3 (MRC)|SiO<sub>2</sub> Etching (RIE 3)}}
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| {{rl|ICP Etching Recipes|SIO2Etch(Panasonic 1)}}
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| {{rl|ICP Etching Recipes|W-TiW Etch(Panasonic 1)}}
| {{rl|ICP Etching Recipes|W-TiW Etch(Panasonic 1)}}
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| bgcolor="#DAF1FF" | [[RIE_Etching_Recipes#RIE_3_.28MRC.29|RIE 3<br> (MRC)]]
| bgcolor="#DAF1FF" | [[RIE_Etching_Recipes#RIE_3_.28MRC.29|RIE 3<br> (MRC)]]
| bgcolor="#DAF1FF" | [[RIE_Etching_Recipes#RIE_5_.28PlasmaTherm.29|RIE 5<br>(PlasmaTherm)]]
| bgcolor="#DAF1FF" | [[RIE_Etching_Recipes#RIE_5_.28PlasmaTherm.29|RIE 5<br>(PlasmaTherm)]]
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| bgcolor="#DAF1FF" | [[ICP_Etching_Recipes#Si_Deep_RIE_.28PlasmaTherm.2FBosch_Etch.29|Si Deep RIE<br>(PlasmaTherm/Bosch Etch)]]
| bgcolor="#DAF1FF" | [[ICP_Etching_Recipes#Si_Deep_RIE_.28PlasmaTherm.2FBosch_Etch.29|Si Deep RIE<br>(PlasmaTherm/Bosch Etch)]]
| bgcolor="#DAF1FF" | [[ICP_Etching_Recipes#ICP_Etch_1_.28Panasonic_E626I.29|ICP Etch 1<br>(Panasonic E626I)]]
| bgcolor="#DAF1FF" | [[ICP_Etching_Recipes#ICP_Etch_1_.28Panasonic_E626I.29|ICP Etch 1<br>(Panasonic E626I)]]

Revision as of 22:03, 6 November 2017

  • R = Recipe is available. Clicking this link will take you to the recipe.
  • A = Material is available for use, but no recipes are provided.
Dry Etching Recipes
RIE Etching ICP Etching Oxygen Plasma Systems Other Dry Etchers
Material RIE 1
(Retired) 		RIE 2
(MRC) 		RIE 3
(MRC) 		RIE 5
(PlasmaTherm) 		DSEIII (PlasmaTherm) Si Deep RIE
(PTI/Bosch) 		ICP Etch 1
(Panasonic 1) 		ICP Etch 2
(Panasonic 2) 		ICP-Etch
(Unaxis VLR) 		Ashers
(Technics PEII) 		Plasma Clean
(Gasonics 2000) 		UV Ozone Reactor Plasma Activation
(EVG 810) 		XeF2 Etch
(Xetch) 		Vapor HF Etch
(uETCH) 		CAIBE
(Oxford)
Ag
Al A R1 R1
Au R1
Cr A R1 A
Cu
Ge
Mo
Ni R1
Pt R1
Ru
Si R1 R1
Ta
Ti R1 A
Al2O3
Al2O3 (Sapphire) R1 A
AlGaAs R1 R1 GaAs-AlGaAs Etch (Unaxis VLR)
AlGaN R1
AlN R1
CdZnTe R1
GaAs R1 R1 R1 GaAs-AlGaAs Etch (Unaxis VLR)
GaN GaN Etch (RIE 5) R1 R1
GaSb A GaSb Etch Unaxis VLR)
HfO2
InGaAlAs InP-InGaAsP-InGaAlAs Etching (RIE 2) InP-InGaAs-InAlAs Etch (Unaxis VLR)
InGaAsP InP-InGaAsP-InGaAlAs Etching (RIE 2) InP-InGaAs-InAlAs Etch (Unaxis VLR)
InP InP-InGaAsP-InGaAlAs Etching (RIE 2) A A InP-InGaAs-InAlAs Etch (Unaxis VLR)
ITO R1
SiC R1 A
SiN SiNx Etching (RIE 3) R1 R1
SiO2 SiO2 Etching (RIE 3) R1 R1 R1
SiOxNy
Ta2O5 A
TiN
TiO2
W-TiW R1 A
ZnO2
ZnS R1
ZnSe R1
ZrO2
Material RIE 1
(Retired) 		RIE 2
(MRC) 		RIE 3
(MRC) 		RIE 5
(PlasmaTherm) 		Si Deep RIE
(PlasmaTherm/Bosch Etch) 		ICP Etch 1
(Panasonic E626I) 		ICP Etch 2
(Panasonic E640) 		ICP-Etch
(Unaxis VLR) 		Ashers
(Technics PEII) 		Plasma Clean
(Gasonics 2000) 		UV Ozone Reactor Plasma Activation
(EVG 810) 		XeF2 Etch
(Xetch) 		Vapor HF Etch
(uETCH) 		CAIBE
(Oxford)
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