Bill Mitchell: Difference between revisions
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=About= |
=About= |
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=Current Work= |
=Current Work= |
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=Tools= |
=Tools= |
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{{PAGENAME}} is in charge of the following tools: |
{{PAGENAME}} is in charge of the following tools: |
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* [[E-Beam Lithography System (JEOL JBX-6300FS)]] |
* [[E-Beam Lithography System (JEOL JBX-6300FS)]] |
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* [[Atomic Force Microscope (Dimension 3100/Nanoscope IVA)]] |
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* [[AFM-based Nanolithography Tool (NanoMan)]] |
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* [[Field Emission SEM 2 (JEOL 7600F)]] |
* [[Field Emission SEM 2 (JEOL 7600F)]] |
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* [[ |
* [[Atomic Layer Deposition (Oxford FlexAL)]] |
Latest revision as of 18:32, 23 March 2020
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About
.
.
Current Work
.
.
Tools
Bill Mitchell is in charge of the following tools: