Surface Analysis (KLA/Tencor Surfscan): Difference between revisions

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(added exmaple of low particle count)
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==Documentation==
==Documentation==

*[[KLA-Tencor Surfscan - Standard Operating Procedure|Standard Operating Procedure]]
*[[KLA-Tencor Surfscan - Standard Operating Procedure|Standard Operating Procedure]]
*[https://wiki.nanotech.ucsb.edu/w/images/9/96/Surfscan-Operation-Manual.pdf Operations Manual]
*[https://wiki.nanotech.ucsb.edu/w/images/9/96/Surfscan-Operation-Manual.pdf Operations Manual]
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*[[Glossary]]
*[[Glossary]]
*[[Errors]]
*[[Errors]]

<br />

== Examples ==
<br />
{| class="wikitable"
|+A low-particle 4-inch wafer example:
!Gain 4: Small Particles
(0.160µm – 1.60µm)
!Gain 2: Large Particles
(1.60µm – 28.0µm)
|-
|[[File:Surfscan Low-Particle Example - G4.png|frameless|200x200px]]
|[[File:Surfscan Low-Particle Example - G2.png|frameless|200x200px]]
|}
{| class="wikitable"
|+A high-particle 4-inch wafer example:
!Gain 4: Small Particles
(0.160µm – 1.60µm)
!Gain 2: Large Particles
(1.60µm – 28.0µm)
|-
|''To Be Added''
|''To Be Added''
|}

Revision as of 22:09, 18 November 2021

Surface Analysis (KLA/Tencor Surfscan)
KLA.jpg
Tool Type Inspection, Test and Characterization
Location Bay 5
Supervisor Biljana Stamenic
Supervisor Phone (805) 893-4002
Supervisor E-Mail biljana@ece.ucsb.edu
Description Surface Analysis 
KLA/Tencor Surfscan
Manufacturer Tencor


About

This system uses a laser-based scattering method to count size and distribution of particles (or other scattering defects) on a flat wafer surface. It can scan wafers in size from 4 to 8 inches.

Documentation


Examples


A low-particle 4-inch wafer example:
Gain 4: Small Particles

(0.160µm – 1.60µm)

Gain 2: Large Particles

(1.60µm – 28.0µm)

Surfscan Low-Particle Example - G4.png Surfscan Low-Particle Example - G2.png
A high-particle 4-inch wafer example:
Gain 4: Small Particles

(0.160µm – 1.60µm)

Gain 2: Large Particles

(1.60µm – 28.0µm)

To Be Added To Be Added
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