OLD - PECVD2 Recipes: Difference between revisions

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m (John d moved page PECVD2 Recipes to OLD - PECVD2 Recipes without leaving a redirect: this page is not linked anywhere, looks like 2014 data only)
 
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=[[PECVD 2 (Advanced Vacuum)]]=
=[[PECVD 2 (Advanced Vacuum)]]=
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== SiN deposition (PECVD #2) ==
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*[[media:New Advanced PECVD-Nitride2 300C standard recipe.pdf|Nitride2 Standard Recipe]]
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*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dDE0R3FlenNPa2txNmRldTczMXZNNnc#gid=sharing Nitride2 Data April 2014]
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*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dERkYm85bGtYQVpjVk5GTGJuMkg2anc&usp=drive_web#gid=sharing Nitride2 Thickness uniformity 2014]


==Photos==
*Deposition Rate: ≈ 8.29 nm/min

*Refractive Index: ≈ 1.955
*[[media: Photos Sheet1.pdf|Dirty platen]]
*Stress ≈ 498MPa
*HF etch rate:~48nm/min


== SiO<sub>2</sub> deposition (PECVD #2) ==
== SiO<sub>2</sub> deposition (PECVD #2) ==
*[[media:Advanced PECVD OXIDE 300C standard recipe OXIDE Standard Recipe.pdf|Oxide Standard Recipe]]
*[[media:NewAdvPECVD OXIDE 300C standard recipe.pdf|Oxide Standard Recipe]]
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*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dGJZaGtDTVRqa1BRdW5iU1N1Y01jd0E&usp=drive_web#gid=sharing Oxide Data 2014]
*[[media:ADV OXIDE data April 2014.pdf|Oxide Data (Deposition Rate, Refractive Index, Stress, HF etch rate )]]
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*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dGJZaGtDTVRqa1BRdW5iU1N1Y01jd0E&usp=drive_web#gid=sharing Oxide Data April 2014]
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dDRjSHEtYUZRUTg4azE2U0JGUTg2M1E#gid=sharing Oxide Thickness uniformity 2014]
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dDRjSHEtYUZRUTg4azE2U0JGUTg2M1E#gid=sharing Oxide Thickness uniformity 2014]


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== SiN deposition (PECVD #2) ==
*Deposition Rate: ≈ 28.36 nm/min
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*[[media:NewAdvPECVD-Nitride2 300C standard recipe.pdf|Nitride2 Standard Recipe]]
*Refractive Index: ≈ 1.473
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*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dDE0R3FlenNPa2txNmRldTczMXZNNnc#gid=sharing Nitride2 Data 2014]
*Stress ≈ -256MPa
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*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dERkYm85bGtYQVpjVk5GTGJuMkg2anc&usp=drive_web#gid=sharing Nitride2 Thickness uniformity 2014]
*HF etch rate~582nm/min


==LS SiN deposition (PECVD #2) ==
==LS SiN deposition (PECVD #2) ==
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*[[media:NewAdvPECVD-LS Nitride2 300C standard recipe.pdf|LS Nitride2 Standard Recipe]]

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*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dEZvWVhzS1pHUXZkOGcyQWZ4LTNBWGc&usp=drive_web#gid=sharing LS Nitride2 Data 2014]
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*[[media:AdvPECVD-LS Nitride2 300C standard recipe.pdf|LS Nitride2 Standard Recipe]]
*[[media:New Advanced PECVD LS NITRIDE2 April 2014.pdf|LS Nitride2 Data (Deposition Rate, Refractive Index, Stress, HF etch rate )]]
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*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dEZvWVhzS1pHUXZkOGcyQWZ4LTNBWGc&usp=drive_web#gid=sharing LS Nitride2 Data April 2014]

*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dENSak1ZNnVaVTFEQTBzdDJMSDlDTFE&usp=drive_web#gid=1=sharing LS Nitride2 Thickness uniformity 2014]
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dENSak1ZNnVaVTFEQTBzdDJMSDlDTFE&usp=drive_web#gid=1=sharing LS Nitride2 Thickness uniformity 2014]

*Deposition Rate: ≈ 8.34 nm/min
*Refractive Index: ≈ 1.932
*Stress ≈ -46MPa


== Amorphous-Si deposition (PECVD #2) ==
== Amorphous-Si deposition (PECVD #2) ==

Latest revision as of 19:28, 3 March 2022

PECVD 2 (Advanced Vacuum)

Photos

SiO2 deposition (PECVD #2)

SiN deposition (PECVD #2)

LS SiN deposition (PECVD #2)

Amorphous-Si deposition (PECVD #2)

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