Surface Analysis (KLA/Tencor Surfscan): Difference between revisions
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|location=Bay 5 |
|location=Bay 5 |
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|description = Surface Analysis |
|description = Surface Analysis |
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|manufacturer = KLA/Tencor |
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|manufacturer = Tencor |
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|materials = |
|materials = |
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==About== |
==About== |
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This system uses a laser-based scattering method to count size and distribution of particles (or other scattering defects) on a flat wafer surface. |
This system uses a laser-based scattering method to count size and distribution of particles (or other scattering defects) on a flat wafer surface. |
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It can scan wafers in size from 4 to 8 inches. Piece-parts are more difficult but can be scanned with a custom recipe. |
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4-inch wafers are the most standard size to measure. |
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For measuring very low particle counts accurately, purchase "low particle count" (LPC) wafers from a Silicon wafer vendor, and keep the wafers in the case and clean at all times until use. |
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==Documentation== |
==Documentation== |
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===Operating Procedures=== |
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*[[KLA-Tencor Surfscan - Standard Operating Procedure|Standard Operating Procedure]] |
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*[https://wiki.nanotech.ucsb.edu/w/images/9/96/Surfscan-Operation-Manual.pdf Operations Manual] |
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*[[Errors]] |
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*[https://wiki.nanofab.ucsb.edu/w/images/2/29/Wafer_Particle_Count-Process_Traveler.pdf Wafer Scanning Instructions] |
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==Standard Recipes== |
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**''This is the procedure Staff uses to calibrate particle counts on our deposition tools. After the scan is complete you need to press ENTER on a small laptop. The Data will be saved on: Desktop/Local Disk(C)/Users/Public/Public Documentation] The data will be saved as a photo.'' |
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*[[Surfscan SOP for small substrates]] (''You must water-mount your small sample or wafer (2inch or 3 inch) to a carrier wafer)'' |
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*[[Surfscan SOP for 4inch wafers]] |
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*[[Surfscan SOP for 6inch wafers]] |
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*[[Surfscan SOP for 8inch wafers]] |
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**'' Very detailed instructions |
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===Other Documentation=== |
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*Standard Recipes |
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*[https://wiki.nanotech.ucsb.edu/w/images/9/96/Surfscan-Operation-Manual.pdf Operations Manual] |
*[https://wiki.nanotech.ucsb.edu/w/images/9/96/Surfscan-Operation-Manual.pdf Operations Manual] |
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*[[Surfscan Errors and Workarounds|Common Errors & Workarounds]] |
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==Examples== |
==Examples== |
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{| class="wikitable" |
{| class="wikitable" |
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|+A low-particle 4-inch wafer example: |
|+A low-particle 4-inch wafer example: |
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Latest revision as of 23:04, 20 November 2024
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About
This system uses a laser-based scattering method to count size and distribution of particles (or other scattering defects) on a flat wafer surface.
It can scan wafers in size from 4 to 8 inches. Piece-parts are more difficult but can be scanned with a custom recipe.
4-inch wafers are the most standard size to measure.
For measuring very low particle counts accurately, purchase "low particle count" (LPC) wafers from a Silicon wafer vendor, and keep the wafers in the case and clean at all times until use.
Documentation
Operating Procedures
- Wafer Scanning Instructions
- This is the procedure Staff uses to calibrate particle counts on our deposition tools. After the scan is complete you need to press ENTER on a small laptop. The Data will be saved on: Desktop/Local Disk(C)/Users/Public/Public Documentation] The data will be saved as a photo.
- Surfscan SOP for small substrates (You must water-mount your small sample or wafer (2inch or 3 inch) to a carrier wafer)
- Wafer Particle Count - Process Traveler
- Very detailed instructions
Other Documentation
- Operations Manual
- For detailed measurement info, it is highly recommended that you read the manual.
Examples
| Gain 4: Small Particles
(0.160µm – 1.60µm) |
Gain 2: Large Particles
(1.60µm – 28.0µm) |
|---|---|
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| Gain 4: Small Particles
(0.160µm – 1.60µm) |
Gain 2: Large Particles
(1.60µm – 28.0µm) |
|---|---|
|
|