Surface Analysis (KLA/Tencor Surfscan): Difference between revisions

From UCSB Nanofab Wiki
Jump to navigation Jump to search
No edit summary
 
(105 intermediate revisions by 4 users not shown)
Line 1: Line 1:
{{tool|{{PAGENAME}}
{{tool2|{{PAGENAME}}
|picture=KLA.jpg
|picture=KLA.jpg
|type = Inspection, Test and Characterization
|type = Inspection, Test and Characterization
|super= Biljana Stamenic
|super= Biljana Stamenic
|super2= Don Freeborn
|location=Bay 5
|location=Bay 5
|description = Surface Analysis
|description = Surface Analysis
KLA/Tencor Surfscan
|manufacturer = KLA/Tencor
|manufacturer = Tencor
|materials =
|materials =
|toolid=
|toolid=
}}
}}
=About=
==About==
This system uses a laser-based scattering method to count size and distribution of particles (or other scattering defects) on a flat wafer surface. It can scan wafers in size from 4 to 6 inches.
This system uses a laser-based scattering method to count size and distribution of particles (or other scattering defects) on a flat wafer surface.


It can scan wafers in size from 4 to 8 inches. Piece-parts are more difficult but can be scanned with a custom recipe.
⚫
=Documentation=

*[[KLA-Tencor Surfscan - Standard Operating Procedure|Standard Operating Procedure]]
4-inch wafers are the most standard size to measure.
⚫
*[[media:Surfscan-Operation-Manual.pdf|Operations Manual]]

For measuring very low particle counts accurately, purchase "low particle count" (LPC) wafers from a Silicon wafer vendor, and keep the wafers in the case and clean at all times until use.

⚫
==Documentation==

===Operating Procedures===

*[https://wiki.nanofab.ucsb.edu/w/images/2/29/Wafer_Particle_Count-Process_Traveler.pdf Wafer Scanning Instructions]
**''This is the procedure Staff uses to calibrate particle counts on our deposition tools. After the scan is complete you need to press ENTER on a small laptop. The Data will be saved on: Desktop/Local Disk(C)/Users/Public/Public Documentation] The data will be saved as a photo.''

*[[Surfscan SOP for small substrates]] (''You must water-mount your small sample or wafer (2inch or 3 inch) to a carrier wafer)''

*[[Surfscan SOP for 4inch wafers]]

*[[Surfscan SOP for 6inch wafers]]

*[[Surfscan SOP for 8inch wafers]]

* [[Wafer scanning process traveler|Wafer Particle Count - Process Traveler]]
**'' Very detailed instructions

===Other Documentation===

⚫
*[https://wiki.nanotech.ucsb.edu/w/images/9/96/Surfscan-Operation-Manual.pdf Operations Manual]
**''For detailed measurement info, it is highly recommended that you read the manual.''
**''For detailed measurement info, it is highly recommended that you read the manual.''

*[[media:Surfscan-Surfscan 6200 info.pdf|Surfscan Info]][[File:UCSBTEST.png|left|thumb|'''UCSBTEST2''' for big size particles '''(1.6-28.0)um''']][[File:UCSBTEST2 for small particles.png|left|thumb|'''UCSBTEST2''' for small size particles '''(0.16-1.6)um''']]
*[[Glossary]]
*[[Surfscan Errors and Workarounds|Common Errors & Workarounds]]

==Examples==
{| class="wikitable"
|+A low-particle 4-inch wafer example:
!Gain 4: Small Particles
(0.160µm – 1.60µm)
!Gain 2: Large Particles
(1.60µm – 28.0µm)
|-
|[[File:Surfscan Low-Particle Example - G4.png|frameless|200x200px]]
|[[File:Surfscan Low-Particle Example - G2.png|frameless|200x200px]]
|}
{| class="wikitable"
|+A high-particle 4-inch wafer example:
!Gain 4: Small Particles
(0.160µm – 1.60µm)
!Gain 2: Large Particles
(1.60µm – 28.0µm)
|-
|[[File:Surfscan - 230113A7 Gain4 high particles.jpg|frameless|199x199px]]
|[[File:Surfscan 230113A7G2 after low particles.jpg|frameless|195x195px]]
|}

Latest revision as of 23:04, 20 November 2024

Surface Analysis (KLA/Tencor Surfscan)
KLA.jpg
Location Bay 5
Tool Type Inspection, Test and Characterization
Manufacturer KLA/Tencor
Description Surface Analysis
Primary Supervisor Biljana Stamenic
(805) 893-4002
biljana@ece.ucsb.edu

Secondary Supervisor

Don Freeborn

Recipes


About

This system uses a laser-based scattering method to count size and distribution of particles (or other scattering defects) on a flat wafer surface.

It can scan wafers in size from 4 to 8 inches. Piece-parts are more difficult but can be scanned with a custom recipe.

4-inch wafers are the most standard size to measure.

For measuring very low particle counts accurately, purchase "low particle count" (LPC) wafers from a Silicon wafer vendor, and keep the wafers in the case and clean at all times until use.

Documentation

Operating Procedures

  • Wafer Scanning Instructions
    • This is the procedure Staff uses to calibrate particle counts on our deposition tools. After the scan is complete you need to press ENTER on a small laptop. The Data will be saved on: Desktop/Local Disk(C)/Users/Public/Public Documentation] The data will be saved as a photo.

Other Documentation

  • Operations Manual
    • For detailed measurement info, it is highly recommended that you read the manual.

Examples

A low-particle 4-inch wafer example:
Gain 4: Small Particles

(0.160µm – 1.60µm)

Gain 2: Large Particles

(1.60µm – 28.0µm)

Surfscan Low-Particle Example - G4.png Surfscan Low-Particle Example - G2.png
A high-particle 4-inch wafer example:
Gain 4: Small Particles

(0.160µm – 1.60µm)

Gain 2: Large Particles

(1.60µm – 28.0µm)

Surfscan - 230113A7 Gain4 high particles.jpg Surfscan 230113A7G2 after low particles.jpg
Retrieved from "https://wiki.nanofab.ucsb.edu/w/index.php?title=Surface_Analysis_(KLA/Tencor_Surfscan)&oldid=162620"