Difference between revisions of "Vacuum Deposition Recipes"
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+ | ===[[Process Group - Process Control Data#Deposition .28Process Control Data.29|<u>Process Control Data</u>]]=== |
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− | {{Recipe Table Explanation}} |
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+ | <small>''See [[Process Group - Process Control Data#Deposition .28Process Control Data.29|linked page]] for process control data (calibration data over time, such as dep. rate, refractive index, stress etc.) over time, for a selection of highly used tools/films.''</small> |
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+ | ===Deposition Tools/Materials Table=== |
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+ | *<small>'''R''': ''Recipe is available. Clicking this link will take you to the recipe.''</small> |
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+ | *<small>'''A''': ''Material is available for use, but no recipes are provided.''</small> |
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| width="65" bgcolor="#daf1ff" |[[Sputtering_Recipes#Sputter_3_.28AJA_ATC_2000-F.29|Sputter 3<br>(AJA ATC 2000-F)]] |
| width="65" bgcolor="#daf1ff" |[[Sputtering_Recipes#Sputter_3_.28AJA_ATC_2000-F.29|Sputter 3<br>(AJA ATC 2000-F)]] |
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| width="65" bgcolor="#daf1ff" |[[Sputtering_Recipes#Sputter_4_.28AJA_ATC_2200-V.29|Sputter 4<br>(AJA ATC 2200-V)]] |
| width="65" bgcolor="#daf1ff" |[[Sputtering_Recipes#Sputter_4_.28AJA_ATC_2200-V.29|Sputter 4<br>(AJA ATC 2200-V)]] |
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− | | width="65" bgcolor="#daf1ff" |[https://wiki.nanotech.ucsb.edu/ |
+ | | width="65" bgcolor="#daf1ff" |[https://wiki.nanotech.ucsb.edu/w/index.php?title=Sputtering_Recipes#Sputter_5_.28AJA_ATC_2200-V.29 Sputter 5 (AJA ATC 2200-V)] |
| width="55" bgcolor="#daf1ff" |[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|Ion Beam<br>Deposition (Veeco Nexus)]] |
| width="55" bgcolor="#daf1ff" |[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|Ion Beam<br>Deposition (Veeco Nexus)]] |
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| width="45" bgcolor="#daf1ff" |[[Thermal Evaporation Recipes#Thermal_Evap_1|Thermal<br>Evap 1]] |
| width="45" bgcolor="#daf1ff" |[[Thermal Evaporation Recipes#Thermal_Evap_1|Thermal<br>Evap 1]] |
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| bgcolor="#eeffff" |{{rl|Sputtering Recipes|Al2O3 Deposition (Sputter 4)}} |
| bgcolor="#eeffff" |{{rl|Sputtering Recipes|Al2O3 Deposition (Sputter 4)}} |
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− | | bgcolor="#eeffff" |[https://wiki.nanotech.ucsb.edu/ |
+ | | bgcolor="#eeffff" |[https://wiki.nanotech.ucsb.edu/w/index.php?title=Sputtering_Recipes#Al2O3_deposition_.28IBD.29 R] |
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| bgcolor="#eeffff" |[[Sputtering Recipes|A]] |
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| bgcolor="#eeffff" |{{rl|Sputtering Recipes|Sputter 4 (AJA ATC 2200-V)}} |
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+ | | bcolor="EEFFFF" |{{rl|Sputtering Recipes|Sputter 5 (AJA ATC 2200-V)}} |
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− | + | |{{rl|PECVD Recipes|Low-Stress SiN - LS-SiN (PECVD#1)}} |
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− | + | |{{rl|PECVD Recipes|Low-Stress SiN deposition (PECVD #2)}} |
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− | + | |{{rl|PECVD Recipes|SiN LS 250C Deposition (Unaxis VLR)}} |
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! bgcolor="#d0e7ff" align="center" |SiO<sub>2</sub> |
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− | |[https://wiki.nanotech.ucsb.edu/ |
+ | |[https://wiki.nanotech.ucsb.edu/w/index.php?title=Sputtering_Recipes#SiOxNy_deposition_.28IBD.29 R] |
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| bgcolor="#eeffff" |{{rl|Sputtering Recipes|Sputter 3 (AJA ATC 2000-F)}} |
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| bgcolor="#eeffff" |{{rl|Sputtering Recipes|Ti-Au Deposition (Sputter 4)}} |
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+ | | bgcolor="#eeffff" |{{rl|Sputtering Recipes|Sputter 5 (AJA ATC 2200-V)}} |
| bgcolor="#eeffff" |<br>[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|A]] |
| bgcolor="#eeffff" |<br>[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|A]] |
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− | |[https://wiki.nanotech.ucsb.edu/ |
+ | |[https://wiki.nanotech.ucsb.edu/w/index.php?title=Sputtering_Recipes#Sputter_4_.28AJA_ATC_2200-V.29 R] |
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|[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|A]] |
|[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|A]] |
Latest revision as of 15:44, 7 July 2022
Process Control Data
See linked page for process control data (calibration data over time, such as dep. rate, refractive index, stress etc.) over time, for a selection of highly used tools/films.
Deposition Tools/Materials Table
- R: Recipe is available. Clicking this link will take you to the recipe.
- A: Material is available for use, but no recipes are provided.