Vacuum Deposition Recipes: Difference between revisions

From UCSB Nanofab Wiki
Jump to navigation Jump to search
No edit summary
(Added AuSn to Thermal evap 2)
 
(27 intermediate revisions by 5 users not shown)
Line 1: Line 1:
===[[Process Group - Process Control Data#Deposition .28Process Control Data.29|<u>Process Control Data</u>]]===
{{Recipe Table Explanation}}
<small>''See [[Process Group - Process Control Data#Deposition .28Process Control Data.29|linked page]] for process control data (calibration data over time, such as dep. rate, refractive index, stress etc.) over time, for a selection of highly used tools/films.''</small>

===Deposition Tools/Materials Table===
''The Key/Legend for this table's <code>A...R6</code> values is at the [[Vacuum Deposition Recipes#Process Ranking Table|<u>bottom of the page</u>]].''
{| class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;" border="1"
{| class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;" border="1"
|- bgcolor="#d0e7ff"
|- bgcolor="#d0e7ff"
Line 30: Line 34:
|-
|-
! bgcolor="#d0e7ff" align="center" |Ag
! bgcolor="#d0e7ff" align="center" |Ag
| bgcolor="#eeffff" |{{Al/E1}}
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R2]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |{{Al/E3}}
| bgcolor="#eeffff" |{{Al/E4}}
| bgcolor="#eeffff" |[[Sputtering Recipes|A]]
| bgcolor="#eeffff" |[[Sputtering Recipes|A]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 3 .28Temescal.29|R2]]
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 4 .28CHA.29|R2]]
| bgcolor="#eeffff" |[[Sputtering Recipes|R1]]
| bgcolor="#eeffff" |[[Sputtering Recipes|R1]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |[[Thermal Evaporation Recipes#Thermal Evaporator 1|R1]]
| bgcolor="#eeffff" |[[Thermal Evaporation Recipes#Thermal Evaporator 2|R1]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
Line 45: Line 49:
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
|-
!AgBr
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|-
!AgCl
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|-
|-
! bgcolor="#d0e7ff" align="center" |Al
! bgcolor="#d0e7ff" align="center" |Al
|[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R2]]
|{{Al/E1}}
|<br>
|<br>
|[[E-Beam Evaporation Recipes#E-Beam 3 .28Temescal.29|R2]]
|{{Al/E3}}
|[[E-Beam Evaporation Recipes#E-Beam 4 .28CHA.29|R2]]
|{{Al/E4}}
|[[Sputtering Recipes|A]]
|[[Sputtering Recipes|R1]]
|{{rl|Sputtering Recipes|Al Deposition (Sputter 4)}}
|[[Sputtering Recipes|R3]]
|[[Sputtering Recipes|R1]]
|<br>
|R1
|<br>[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|A]]
|[[Thermal Evaporation Recipes|A]]
|[[Thermal Evaporation Recipes#Thermal Evaporator 1|R3]]
|[[Thermal Evaporation Recipes|A]]
|[[Thermal Evaporation Recipes#Thermal Evaporator 2|R1]]
|<br>
|<br>
|<br>
|<br>
Line 64: Line 102:
|-
|-
! bgcolor="#d0e7ff" align="center" |Al<sub>2</sub>O<sub>3</sub>
! bgcolor="#d0e7ff" align="center" |Al<sub>2</sub>O<sub>3</sub>
| bgcolor="#eeffff" |{{Al/E1}}
| bgcolor="#eeffff" |
| bgcolor="#eeffff" |{{Al/E2}}
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 2 .28Custom.29|R2]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |[[Sputtering Recipes|A]]
| bgcolor="#eeffff" |[[Sputtering Recipes|R3]]
| bgcolor="#eeffff" |{{rl|Sputtering Recipes|Al2O3 Deposition (Sputter 4)}}
| bgcolor="#eeffff" |[[Sputtering Recipes|R3]]
| bgcolor="#eeffff" |[[Sputtering Recipes|R1]]
| bgcolor="#eeffff" |[[Sputtering Recipes#Si3N4 deposition .28IBD.29|R5]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |[https://wiki.nanotech.ucsb.edu/w/index.php?title=Sputtering_Recipes#Al2O3_deposition_.28IBD.29 R]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |[[Atomic Layer Deposition Recipes#Al2O3 deposition .28ALD CHAMBER 3.29|R4]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
|-
| bgcolor="#eeffff" |{{rl|Atomic Layer Deposition Recipes|Al2O3 deposition (ALD CHAMBER 3)}}
!As
| bgcolor="#eeffff" |<br>
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|-
!AuPd
|
|
|
|
|
|
|
|
|[[Thermal Evaporation Recipes#Thermal Evaporator 1|R1]]
|
|
|
|
|
|
|-
!AuZn
|
|
|
|
|
|
|
|
|[[Thermal Evaporation Recipes#Thermal Evaporator 1|R1]]
|
|
|
|
|
|
|-
!AuSn
|
|
|
|
|
|
|
|
|
|[[Thermal Evaporation Recipes#Thermal Evaporator 1|R1]]
|
|
|
|
|
|-
!AuGe
|[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R1]]
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|-
|-
! bgcolor="#d0e7ff" align="center" |AlN
! bgcolor="#d0e7ff" align="center" |AlN
Line 85: Line 208:
|<br>
|<br>
|<br>
|<br>
|[[Sputtering Recipes|A]]
|[[Sputtering Recipes|R1]]
|[[Sputtering Recipes|A]]
|[[Sputtering Recipes|R1]]
|<br>
|<br>
|R1
|[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|A]]
|<br>
|<br>
|<br>
|<br>
Line 94: Line 217:
|<br>
|<br>
|<br>
|<br>
|{{rl|Atomic Layer Deposition Recipes|AlN deposition (ALD CHAMBER 3)}}
|[[Atomic Layer Deposition Recipes#AlN deposition .28ALD CHAMBER 3.29|R4]]
|<br>
|<br>
|-
|-
! bgcolor="#d0e7ff" align="center" |Au
! bgcolor="#d0e7ff" align="center" |Au
| bgcolor="#eeffff" |{{Al/E1}}
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R2]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |{{Al/E3}}
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 3 .28Temescal.29|R2]]
| bgcolor="#eeffff" |{{Al/E4}}
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 4 .28CHA.29|R2]]
| bgcolor="#eeffff" |[[Sputtering Recipes|A]]
| bgcolor="#eeffff" |[[Sputtering Recipes|R1]]
| bgcolor="#eeffff" |{{rl|Sputtering Recipes|Ti-Au Deposition (Sputter 4)}}
| bgcolor="#eeffff" |R3
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |[[Thermal Evaporation Recipes|A]]
| bgcolor="#eeffff" |[[Thermal Evaporation Recipes#Thermal Evaporator 1|R3]]
| bgcolor="#eeffff" |[[Thermal Evaporation Recipes|A]]
| bgcolor="#eeffff" |[[Thermal Evaporation Recipes#Thermal Evaporator 2|R2]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
Line 124: Line 247:
|<br>
|<br>
|<br>
|<br>
|
|<br>
|<br>
|<br>
|<br>
Line 129: Line 253:
|<br>
|<br>
|<br>
|<br>
|-
|<br>
!Be
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|-
|-
! bgcolor="#d0e7ff" align="center" |C
! bgcolor="#d0e7ff" align="center" |C
| bgcolor="#eeffff" align="center" |{{rl|E-Beam Evaporation Recipes|Materials Table (E-Beam #1)}}
| bgcolor="#eeffff" align="center" |[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R3]]
| bgcolor="#eeffff" align="center" |
| bgcolor="#eeffff" align="center" |
| bgcolor="#eeffff" align="center" |
| bgcolor="#eeffff" align="center" |
Line 147: Line 287:
| bgcolor="#eeffff" align="center" |
| bgcolor="#eeffff" align="center" |
| bgcolor="#eeffff" align="center" |
| bgcolor="#eeffff" align="center" |
|-
!Cd
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|-
!CdS
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|-
!CdTe
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|-
!CaF2
|
|
|
|
|
|
|
|
|
|[[Thermal Evaporation Recipes#Thermal Evaporator 2|R2]]
|
|
|
|
|
|-
|-
! bgcolor="#d0e7ff" align="center" |CeO<sub>2</sub>
! bgcolor="#d0e7ff" align="center" |CeO<sub>2</sub>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |{{rl|E-Beam Evaporation Recipes|E-Beam 2 (Custom)|CeO<sub>2</sub> deposition (E-Beam 2)}}
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 2 .28Custom.29|R3]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
Line 166: Line 374:
|-
|-
! bgcolor="#d0e7ff" align="center" |Co
! bgcolor="#d0e7ff" align="center" |Co
| bgcolor="#eeffff" |{{Al/E1}}
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R2]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |{{Al/E4}}
| bgcolor="#eeffff" |[[Sputtering Recipes|R]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 4 .28CHA.29|R2]]
| bgcolor="#eeffff" |[[Sputtering Recipes|R3]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |[[Thermal Evaporation Recipes#Thermal Evaporator 1|R1]]
| bgcolor="#eeffff" |[[Thermal Evaporation Recipes#Thermal Evaporator 2|R1]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
Line 183: Line 391:
|-
|-
! bgcolor="#d0e7ff" align="center" |Cr
! bgcolor="#d0e7ff" align="center" |Cr
|[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R1]]
|{{Al/E1}}
|<br>
|<br>
|<br>
|<br>
|[[E-Beam Evaporation Recipes#E-Beam 4 .28CHA.29|R2]]
|{{Al/E4}}
|[https://wiki.nanotech.ucsb.edu/w/index.php?title=Sputtering_Recipes#Sputter_3_.28AJA_ATC_2000-F.29 R]
|[https://wiki.nanotech.ucsb.edu/w/index.php?title=Sputtering_Recipes#Sputter_3_.28AJA_ATC_2000-F.29 R3]
|<br>
|<br>
|{{Rl|Sputtering_Recipes|Sputter_5_.28AJA_ATC_2200-V.29|R3}}
|<br>
|<br>
|[[Thermal Evaporation Recipes#Thermal Evaporator 1|R3]]
|<br>
|[[Thermal Evaporation Recipes|A]]
|[[Thermal Evaporation Recipes#Thermal Evaporator 2|R2]]
|[[Thermal Evaporation Recipes|A]]
|<br>
|<br>
|<br>
|<br>
Line 200: Line 408:
|-
|-
! bgcolor="#d0e7ff" align="center" |Cu
! bgcolor="#d0e7ff" align="center" |Cu
| bgcolor="#eeffff" |{{Al/E1}}
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R1]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |{{rl|Sputtering Recipes|Sputter 3 (AJA ATC 2000-F)}}
| bgcolor="#eeffff" |[[Sputtering Recipes|A]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |[[Sputtering Recipes|R3]]
| bgcolor="#eeffff" |[[Sputtering Recipes|R2]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |[[Thermal Evaporation Recipes#Thermal Evaporator 1|R2]]
| bgcolor="#eeffff" |[[Thermal Evaporation Recipes#Thermal Evaporator 2|R1]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
Line 217: Line 425:
|-
|-
! bgcolor="#d0e7ff" align="center" |Fe
! bgcolor="#d0e7ff" align="center" |Fe
|[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R2]]
|{{Al/E1}}
|<br>
|<br>
|{{Al/E4}}
|[[Sputtering Recipes|R]]
|<br>
|<br>
|<br>
|<br>
|[[E-Beam Evaporation Recipes#E-Beam 4 .28CHA.29|R2]]
|[[Sputtering Recipes|R3]]
|<br>
|<br>
|<br>
|<br>
|<br>
|<br>
|[[Thermal Evaporation Recipes#Thermal Evaporator 1|R1]]
|[[Thermal Evaporation Recipes#Thermal Evaporator 2|R1]]
|<br>
|<br>
|<br>
|<br>
Line 232: Line 440:
|<br>
|<br>
|<br>
|<br>
|-
!Ga
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|-
!GaAs
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|-
|-
! bgcolor="#d0e7ff" align="center" |Ge
! bgcolor="#d0e7ff" align="center" |Ge
| bgcolor="#eeffff" |{{Al/E1}}
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R2]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |{{Al/E3}}
| bgcolor="#eeffff" |{{Al/E4}}
| bgcolor="#eeffff" |[[Sputtering Recipes|A]]
| bgcolor="#eeffff" |[[Sputtering Recipes|A]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 3 .28Temescal.29|R2]]
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 4 .28CHA.29|R2]]
| bgcolor="#eeffff" |[[Sputtering Recipes|R1]]
| bgcolor="#eeffff" |[[Sputtering Recipes|R1]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
Line 252: Line 494:
! bgcolor="#d0e7ff" align="center" |GeO<sub>2</sub>
! bgcolor="#d0e7ff" align="center" |GeO<sub>2</sub>
|
|
|[[E-Beam Evaporation Recipes#E-Beam 2 .28Custom.29|R2]]
|{{Al/E2}}
|
|
|
|
Line 268: Line 510:
|-
|-
! bgcolor="#d0e7ff" align="center" |Gd
! bgcolor="#d0e7ff" align="center" |Gd
| bgcolor="#eeffff" |{{Al/E1}}
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R2]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |{{Al/E4}}
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 4 .28CHA.29|R1]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
Line 285: Line 527:
|-
|-
! bgcolor="#d0e7ff" align="center" |Hf
! bgcolor="#d0e7ff" align="center" |Hf
| bgcolor="#eeffff" |{{Al/E1}}
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R1]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>[[E-Beam Evaporation Recipes#E-Beam 4 .28CHA.29|R1]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
Line 306: Line 548:
|<br>
|<br>
|<br>
|<br>
|[[Sputtering Recipes|A]]
|[[Sputtering Recipes|R1]]
|[[Sputtering Recipes|A]]
|[[Sputtering Recipes|R1]]
|<br>
|<br>
|<br>
|<br>
Line 315: Line 557:
|<br>
|<br>
|<br>
|<br>
|{{rl|Atomic Layer Deposition Recipes|HfO2 deposition (ALD CHAMBER 3)}}
|[[Atomic Layer Deposition Recipes#AlN deposition .28ALD CHAMBER 3.29|R4]]
|<br>
|<br>
|-
!Hg
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|-
|-
! bgcolor="#d0e7ff" align="center" |In
! bgcolor="#d0e7ff" align="center" |In
Line 328: Line 587:
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |[[Thermal Evaporation Recipes|A]]
| bgcolor="#eeffff" |[[Thermal Evaporation Recipes#Thermal Evaporator 2|R3]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
Line 334: Line 593:
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
|-
!InSb
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|-
|-
! bgcolor="#d0e7ff" align="center" |Ir
! bgcolor="#d0e7ff" align="center" |Ir
|[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R1]]
|{{Al/E1}}
|<br>
|<br>
|<br>
|<br>
|<br>
|<br>
|<br>
|[[E-Beam Evaporation Recipes#E-Beam 4 .28CHA.29|R1]]
|<br>
|<br>
|<br>
|<br>
|<br>
|<br>
|<br>
|<br>
|
|
|<br>
|<br>
|<br>
|<br>
Line 354: Line 630:
! bgcolor="#d0e7ff" align="center" |ITO
! bgcolor="#d0e7ff" align="center" |ITO
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |{{rl|E-Beam Evaporation Recipes|E-Beam 2 (Custom)|ITO deposition (E-Beam 2)}}
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 2 .28Custom.29|R3]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |[[Sputtering Recipes|A]]
| bgcolor="#eeffff" |[[Sputtering Recipes|R1]]
| bgcolor="#eeffff" |[[Sputtering Recipes|A]]
| bgcolor="#eeffff" |[[Sputtering Recipes|R1]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|A]]
| bgcolor="#eeffff" |R1
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
Line 369: Line 645:
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
|-
|-
!KCl
! bgcolor="#d0e7ff" align="center" |MgF2
|
|
|
|
|
|
|
|
|
|
|[[Sputtering Recipes|A]]
|[[Sputtering Recipes|A]]
|
|
|
|
|
|
|
|
|
|
|
|
|
|-
!LiF
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|-
!Mg
|
|
|
|
|
|
|
|
|[[Thermal Evaporation Recipes#Thermal Evaporator 1|R1]]
|[[Thermal Evaporation Recipes#Thermal Evaporator 2|R1]]
|
|
|
|
|
|-
! bgcolor="#d0e7ff" align="center" |MgF2
|
|
|
|
|[[Sputtering Recipes|R1]]
|[[Sputtering Recipes|R1]]
|
|
|
|[[Thermal Evaporation Recipes#Thermal Evaporator 2|R1]]
|
|
|
|
Line 388: Line 715:
! bgcolor="#d0e7ff" align="center" |MgO
! bgcolor="#d0e7ff" align="center" |MgO
|
|
|[[E-Beam Evaporation Recipes#E-Beam 2 .28Custom.29|R2]]
|{{Al/E2}}
|
|
|
|
|
|
|
|
|
|
|
|
|
|-
!Mn
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|-
!MnS
|
|
|
|
|
|
Line 404: Line 765:
|-
|-
! bgcolor="#d0e7ff" align="center" |Mo
! bgcolor="#d0e7ff" align="center" |Mo
| bgcolor="#eeffff" |{{Al/E1}}
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R2]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |[[Sputtering Recipes|R]]
| bgcolor="#eeffff" |[[Sputtering Recipes|R3]]
| bgcolor="#eeffff" |[[Sputtering Recipes|A]]
| bgcolor="#eeffff" |[[Sputtering Recipes|R1]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |
| bgcolor="#eeffff" |
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
Line 419: Line 780:
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
|-
!Na
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|-
!NaCl
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|-
|-
! bgcolor="#d0e7ff" align="center" |Nb
! bgcolor="#d0e7ff" align="center" |Nb
|[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R2]]
|{{Al/E1}}
|<br>
|<br>
|<br>
|<br>
|<br>
|<br>
|<br>
|<br>
|[[Sputtering Recipes|R]]
|[[Sputtering Recipes|R3]]
|<br>
|<br>
|<br>
|<br>
|<br>
|<br>
|
|
|<br>
|<br>
|<br>
|<br>
Line 436: Line 831:
|<br>
|<br>
|<br>
|<br>
|-
!NbO5
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|-
|-
! bgcolor="#d0e7ff" align="center" |Nd
! bgcolor="#d0e7ff" align="center" |Nd
Line 443: Line 855:
|<br>
|<br>
|<br>
|<br>
|[[Sputtering Recipes|A]]
|[[Sputtering Recipes|R1]]
|<br>
|<br>
|<br>
|<br>
|<br>
|<br>
|
|
|<br>
|<br>
|<br>
|<br>
Line 455: Line 867:
|-
|-
! bgcolor="#d0e7ff" align="center" |Ni
! bgcolor="#d0e7ff" align="center" |Ni
| bgcolor="#eeffff" |{{Al/E1}}
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R2]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |{{Al/E3}}
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 3 .28Temescal.29|R2]]
| bgcolor="#eeffff" |{{Al/E4}}
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 4 .28CHA.29|R2]]
| bgcolor="#eeffff" |{{rl|Sputtering Recipes|Sputter 3 (AJA ATC 2000-F)}}
| bgcolor="#eeffff" |[[Sputtering Recipes|R3]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |[[Thermal Evaporation Recipes|A]]
| bgcolor="#eeffff" |[[Thermal Evaporation Recipes#Thermal Evaporator 1|R3]]
| bgcolor="#eeffff" |[[Thermal Evaporation Recipes|A]]
| bgcolor="#eeffff" |[[Thermal Evaporation Recipes#Thermal Evaporator 2|R2]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
Line 472: Line 884:
|-
|-
! bgcolor="#d0e7ff" align="center" |NiCr
! bgcolor="#d0e7ff" align="center" |NiCr
|[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R2]]
|{{Al/E1}}
|
|
|
|
|[[E-Beam Evaporation Recipes#E-Beam 4 .28CHA.29|R2]]
|{{Al/E4}}
|
|
|
|
|
|
|
|
|
|[[Thermal Evaporation Recipes#Thermal Evaporator 1|R3]]
|
|
|
|
Line 489: Line 901:
|-
|-
! bgcolor="#d0e7ff" align="center" |NiFe
! bgcolor="#d0e7ff" align="center" |NiFe
| bgcolor="#eeffff" |{{Al/E1}}
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R1]]
| bgcolor="#eeffff" |
| bgcolor="#eeffff" |
| bgcolor="#eeffff" |
| bgcolor="#eeffff" |
| bgcolor="#eeffff" |{{Al/E4}}
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 4 .28CHA.29|R2]]
| bgcolor="#eeffff" |[[Sputtering Recipes|A]]
| bgcolor="#eeffff" |[[Sputtering Recipes|R1]]
| bgcolor="#eeffff" |
| bgcolor="#eeffff" |
| bgcolor="#eeffff" |
| bgcolor="#eeffff" |
| bgcolor="#eeffff" |
| bgcolor="#eeffff" |
| bgcolor="#eeffff" |
| bgcolor="#eeffff" |[[Thermal Evaporation Recipes#Thermal Evaporator 1|R3]]
| bgcolor="#eeffff" |
| bgcolor="#eeffff" |
| bgcolor="#eeffff" |
| bgcolor="#eeffff" |
Line 504: Line 916:
| bgcolor="#eeffff" |
| bgcolor="#eeffff" |
| bgcolor="#eeffff" |
| bgcolor="#eeffff" |
|-
!Pb
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|-
!PbS
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|-
|-
! bgcolor="#d0e7ff" align="center" |Pd
! bgcolor="#d0e7ff" align="center" |Pd
|[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R2]]
|{{Al/E1}}
|<br>
|<br>
|[[E-Beam Evaporation Recipes#E-Beam 3 .28Temescal.29|R2]]
|{{Al/E3}}
|[[E-Beam Evaporation Recipes#E-Beam 4 .28CHA.29|R2]]
|{{Al/E4}}
|<br>
|<br>
|<br>
|<br>
|<br>
|<br>
|<br>
|<br>
|[[Thermal Evaporation Recipes|A]]
|[[Thermal Evaporation Recipes#Thermal Evaporator 1|R3]]
|[[Thermal Evaporation Recipes|A]]
|[[Thermal Evaporation Recipes#Thermal Evaporator 2|R1]]
|<br>
|<br>
|<br>
|<br>
Line 523: Line 969:
|-
|-
! bgcolor="#d0e7ff" align="center" |Pt
! bgcolor="#d0e7ff" align="center" |Pt
| bgcolor="#eeffff" |{{Al/E1}}
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R2]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |{{Al/E3}}
| bgcolor="#eeffff" |{{Al/E4}}
| bgcolor="#eeffff" |[[Sputtering Recipes|A]]
| bgcolor="#eeffff" |{{rl|Sputtering Recipes|Sputter 4 (AJA ATC 2200-V)}}
| bcolor="EEFFFF" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 3 .28Temescal.29|R2]]
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 4 .28CHA.29|R2]]
| bgcolor="#eeffff" |[[Sputtering Recipes|R3]]
| bgcolor="#eeffff" |[[Sputtering Recipes|R3]]
| bcolor="EEFFFF" |[[Sputtering Recipes|R3]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |{{rl|Atomic Layer Deposition Recipes|Pt deposition (ALD CHAMBER 1)}}
| bgcolor="#eeffff" |[[Atomic Layer Deposition Recipes#Pt deposition .28ALD CHAMBER 1.29|R4]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
|-
|-
! bgcolor="#d0e7ff" align="center" |Ru
! bgcolor="#d0e7ff" align="center" |Ru
|[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R2]]
|{{Al/E1}}
|<br>
|<br>
|<br>
|<br>
|[[E-Beam Evaporation Recipes#E-Beam 4 .28CHA.29|R2]]
|{{Al/E4}}
|<br>
|<br>
|[[Sputtering Recipes#Ru Deposition .28Sputter 4.29|R]]
|[[Sputtering Recipes#Ru Deposition .28Sputter 4.29|R3]]
|<br>
|<br>
|<br>
|<br>
Line 553: Line 999:
|<br>
|<br>
|<br>
|<br>
|{{rl|Atomic Layer Deposition Recipes|Ru deposition (ALD CHAMBER 1)}}
|[[Atomic Layer Deposition Recipes#Pt deposition .28ALD CHAMBER 1.29|R4]]
|<br>
|<br>
|-
!Sb
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|-
!Se
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|-
|-
! bgcolor="#d0e7ff" align="center" |Si
! bgcolor="#d0e7ff" align="center" |Si
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |{{Al/E2}}
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 2 .28Custom.29|R2]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |[[Sputtering Recipes|R]]
| bgcolor="#eeffff" |[[Sputtering Recipes|R3]]
| bgcolor="#eeffff" |[[Sputtering Recipes|A]]
| bgcolor="#eeffff" |[[Sputtering Recipes|R1]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|A]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |R1
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |[https://wiki.nanotech.ucsb.edu/w/index.php?title=PECVD_Recipes#Amorphous-Si_deposition_.28PECVD_.232.29 R]
| bgcolor="#eeffff" |[https://wiki.nanotech.ucsb.edu/w/index.php?title=PECVD_Recipes#Amorphous-Si_deposition_.28PECVD_.232.29 R3]
| bgcolor="#eeffff" |
| bgcolor="#eeffff" |
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
Line 578: Line 1,058:
|<br>
|<br>
|<br>
|<br>
|{{rl|Sputtering Recipes|SiN deposition (Sputter 3)}}
|[[Sputtering Recipes|R3]]
|[[Sputtering Recipes|A]]
|[[Sputtering Recipes|R1]]
|<br>
|<br>
|[[Sputtering_Recipes#Si3N4_deposition_.28IBD.29|R]]
|[[Sputtering Recipes#Si3N4 deposition .28IBD.29|R6]]
|<br>
|<br>
|<br>
|<br>
|{{rl|PECVD Recipes|SiN deposition (PECVD #1)}}
|[[PECVD Recipes#SiN deposition .28PECVD .231.29|R6]]
|{{rl|PECVD Recipes|SiN deposition (PECVD #2)}}
|[[PECVD Recipes#SiN deposition .28PECVD .232.29|R6]]
|{{rl|PECVD Recipes|SiN 250C deposition (Unaxis VLR)}}
|[[PECVD Recipes#ICP-PECVD .28Unaxis VLR.29|R6]]
|<br>
|<br>
|<br>
|<br>
Line 601: Line 1,081:
|
|
|
|
|{{rl|PECVD Recipes|Low-Stress SiN - LS-SiN (PECVD#1)}}
|[[PECVD Recipes#Low Stress Si3N4 .28PECVD.231.29|R4]]
|{{rl|PECVD Recipes|Low-Stress SiN deposition (PECVD #2)}}
|[[PECVD Recipes#Low-Stress SiN deposition .28PECVD .232.29|R6]]
|{{rl|PECVD Recipes|SiN LS 250C Deposition (Unaxis VLR)}}
|[[PECVD Recipes#ICP-PECVD .28Unaxis VLR.29|R6]]
|
|
|
|
|-
|-
! bgcolor="#d0e7ff" align="center" |SiO<sub>2</sub>
! bgcolor="#d0e7ff" align="center" |SiO<sub>2</sub>
| bgcolor="#eeffff" |{{Al/E1}}
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R2]]
| bgcolor="#eeffff" |{{Al/E2}}
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 2 .28Custom.29|R2]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |{{rl|Sputtering Recipes|SiO2 deposition (Sputter 3)}}
| bgcolor="#eeffff" |[[Sputtering Recipes|R3]]
| bgcolor="#eeffff" |[[Sputtering Recipes|A]]
| bgcolor="#eeffff" |[[Sputtering Recipes|R1]]
| bgcolor="#eeffff" |[[Sputtering Recipes|A]]
| bgcolor="#eeffff" |[[Sputtering Recipes|R2]]
| bgcolor="#eeffff" |[[Sputtering_Recipes#SiO2_deposition_.28IBD.29|R]]
| bgcolor="#eeffff" |[[Sputtering_Recipes#SiO2_deposition_.28IBD.29|R6]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |
| bgcolor="#eeffff" |[[PECVD Recipes#SiO2 deposition .28PECVD .231.29|R6]]
| bgcolor="#eeffff" |[[PECVD Recipes#SiO2 deposition .28PECVD .232.29|R6]]
| bgcolor="#eeffff" |[[PECVD Recipes#ICP-PECVD .28Unaxis VLR.29|R6]]
| bgcolor="#eeffff" |[[Atomic Layer Deposition Recipes#Pt deposition .28ALD CHAMBER 1.29|R4]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
|-
| bgcolor="#eeffff" |{{rl|PECVD Recipes|SiO2 deposition (PECVD #1)}}
!SiO<sub>x</sub>
| bgcolor="#eeffff" |{{rl|PECVD Recipes|SiO2 deposition (PECVD #2)}}
|
| bgcolor="#eeffff" |{{rl|PECVD Recipes|SiO2 LDR 250C Deposition (Unaxis VLR)}}
|[[E-Beam Evaporation Recipes#E-Beam 2 .28Custom.29|R1]]
| bgcolor="#eeffff" |{{rl|Atomic Layer Deposition Recipes|SiO2 deposition (ALD CHAMBER 3)}}
|
| bgcolor="#eeffff" |<br>
|
|
|
|
|
|
|
|
|
|
|
|
|-
!SiO
|
|
|
|
|
|
|
|
|[[Thermal Evaporation Recipes#Thermal Evaporator 1|R1]]
|[[Thermal Evaporation Recipes#Thermal Evaporator 2|R1]]
|
|
|
|
|
|-
|-
! bgcolor="#d0e7ff" align="center" |SiO<sub>x</sub>N<sub>y</sub>
! bgcolor="#d0e7ff" align="center" |SiO<sub>x</sub>N<sub>y</sub>
Line 632: Line 1,146:
|<br>
|<br>
|<br>
|<br>
|[[Sputtering Recipes#Si3N4 deposition .28IBD.29|R3]]
|[https://wiki.nanotech.ucsb.edu/w/index.php?title=Sputtering_Recipes#SiOxNy_deposition_.28IBD.29 R]
|<br>
|<br>
|<br>
|<br>
|[[PECVD Recipes#SiO2 deposition .28PECVD .231.29|R4]]
|[[PECVD_Recipes#PECVD_1_.28PlasmaTherm_790.29|R]]
|<br>
|<br>
|<br>
|<br>
Line 651: Line 1,165:
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |[[Thermal Evaporation Recipes|A]]
| bgcolor="#eeffff" |[[Thermal Evaporation Recipes#Thermal Evaporator 2|R2]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
Line 660: Line 1,174:
! bgcolor="#d0e7ff" align="center" |SrF<sub>2</sub>
! bgcolor="#d0e7ff" align="center" |SrF<sub>2</sub>
|<br>
|<br>
|[[E-Beam Evaporation Recipes#E-Beam 2 .28Custom.29|R2]]
|{{Al/E2}}
|<br>
|<br>
|<br>
|<br>
|<br>
Line 668: Line 1,181:
|<br>
|<br>
|<br>
|<br>
|[[Thermal Evaporation Recipes#Thermal Evaporator 1|R1]]
|<br>
|<br>
|<br>
|<br>
Line 676: Line 1,190:
|-
|-
! bgcolor="#d0e7ff" align="center" |Ta
! bgcolor="#d0e7ff" align="center" |Ta
| bgcolor="#eeffff" |{{Al/E1}}
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R1]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |{{rl|Sputtering Recipes|Ta deposition (Sputter 3)}}
| bgcolor="#eeffff" |[[Sputtering Recipes|R3]]
| bgcolor="#eeffff" |[[Sputtering Recipes|A]]
| bgcolor="#eeffff" |[[Sputtering Recipes|R1]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|A]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |R1
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
Line 694: Line 1,208:
! bgcolor="#d0e7ff" align="center" |Ta<sub>2</sub>O<sub>5</sub>
! bgcolor="#d0e7ff" align="center" |Ta<sub>2</sub>O<sub>5</sub>
|<br>
|<br>
|[[E-Beam Evaporation Recipes#E-Beam 2 .28Custom.29|R1]]
|<br>
|<br>
|[[E-Beam Evaporation Recipes#E-Beam 4 .28CHA.29|R1]]
|<br>
|<br>
|{{Al/E2}}
|<br>
|<br>
|<br>
|<br>
|[[Sputtering Recipes#Si3N4 deposition .28IBD.29|R6]]
|<br>
|<br>
|
|[[Sputtering_Recipes#Ta2O5_deposition_.28IBD.29|R]]
|<br>
|<br>
|<br>
|<br>
|<br>
|<br>
Line 710: Line 1,224:
|-
|-
! bgcolor="#d0e7ff" align="center" |Ti
! bgcolor="#d0e7ff" align="center" |Ti
| bgcolor="#eeffff" |{{Al/E1}}
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R2]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |{{Al/E3}}
| bgcolor="#eeffff" |{{Al/E4}}
| bgcolor="#eeffff" |{{rl|Sputtering Recipes|Sputter 3 (AJA ATC 2000-F)}}
| bgcolor="#eeffff" |{{rl|Sputtering Recipes|Ti-Au Deposition (Sputter 4)}}
| bgcolor="#eeffff" |{{rl|Sputtering Recipes|Sputter_5_(AJA_ATC_2200-V)(Sputter 5)}}
| bgcolor="#eeffff" |<br>[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|A]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 3 .28Temescal.29|R2]]
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 4 .28CHA.29|R2]]
| bgcolor="#eeffff" |[[Sputtering Recipes|R3]]
| bgcolor="#eeffff" |[[Sputtering Recipes|R3]]
| bgcolor="#eeffff" |[[Sputtering Recipes|R3]]
| bgcolor="#eeffff" |R1
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
Line 732: Line 1,246:
|<br>
|<br>
|<br>
|<br>
|[https://wiki.nanotech.ucsb.edu/w/index.php?title=Sputtering_Recipes#Sputter_4_.28AJA_ATC_2200-V.29 R]
|[https://wiki.nanotech.ucsb.edu/w/index.php?title=Sputtering_Recipes#Sputter_4_.28AJA_ATC_2200-V.29 R3]
|<br>
|<br>
|R1
|[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|A]]
|<br>
|<br>
|<br>
|<br>
Line 740: Line 1,254:
|<br>
|<br>
|<br>
|<br>
|{{rl|Atomic Layer Deposition Recipes|TiN deposition (ALD CHAMBER 3)}}
|[[Atomic Layer Deposition Recipes#Pt deposition .28ALD CHAMBER 1.29|R4]]
|<br>
|<br>
|-
|-
! bgcolor="#d0e7ff" align="center" |TiW
! bgcolor="#d0e7ff" align="center" |TiW
| bgcolor="#eeffff" |{{Al/E1}}
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R1]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |[[Sputtering Recipes|A]]
| bgcolor="#eeffff" |[[Sputtering Recipes|R2]]
| bgcolor="#eeffff" |{{rl|Sputtering Recipes|W-TiW Deposition (Sputter 4)}}
| bgcolor="#eeffff" |[[Sputtering Recipes|R3]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
Line 759: Line 1,273:
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
|-
!TiO
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|-
|-
! bgcolor="#d0e7ff" align="center" |TiO<sub>2</sub>
! bgcolor="#d0e7ff" align="center" |TiO<sub>2</sub>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |{{Al/E2}}
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 2 .28Custom.29|R2]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |[[Sputtering Recipes|A]]
| bgcolor="#eeffff" |[[Sputtering Recipes|R1]]
| bgcolor="#eeffff" |{{rl|Sputtering Recipes|Sputter 4 (AJA ATC 2200-V)}}
| bgcolor="#eeffff" |[[Sputtering Recipes|R3]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |[[Sputtering_Recipes#TiO2_deposition_.28IBD.29|R]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |[[Sputtering Recipes#Si3N4 deposition .28IBD.29|R5]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |{{rl|Atomic Layer Deposition Recipes|TiO2 deposition (ALD CHAMBER 3)}}
| bgcolor="#eeffff" |[[Atomic Layer Deposition Recipes#Pt deposition .28ALD CHAMBER 1.29|R4]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
|-
|-
Line 782: Line 1,313:
|<br>
|<br>
|<br>
|<br>
|[[Sputtering Recipes|A]]
|[[Sputtering Recipes|R1]]
|[[Sputtering Recipes|A]]
|[[Sputtering Recipes|R1]]
|<br>
|<br>
|<br>
|<br>
|<br>
|<br>
|<br>
|
|<br>
|<br>
|<br>
|<br>
Line 795: Line 1,326:
|-
|-
! bgcolor="#d0e7ff" align="center" |W
! bgcolor="#d0e7ff" align="center" |W
| bgcolor="#eeffff" |{{Al/E1}}
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R2]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |[[Sputtering Recipes|A]]
| bgcolor="#eeffff" |[[Sputtering Recipes|R2]]
| bgcolor="#eeffff" |{{rl|Sputtering Recipes|W deposition (Sputter 4)}}
| bgcolor="#eeffff" |[[Sputtering Recipes|R3]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
Line 810: Line 1,341:
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
|-
!WC
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|-
|-
! bgcolor="#d0e7ff" align="center" |Zn
! bgcolor="#d0e7ff" align="center" |Zn
Line 820: Line 1,368:
|<br>
|<br>
|<br>
|<br>
|[[Thermal Evaporation Recipes|A]]
|[[Thermal Evaporation Recipes#Thermal Evaporator 1|R3]]
|[[Thermal Evaporation Recipes|A]]
|[[Thermal Evaporation Recipes#Thermal Evaporator 2|R2]]
|<br>
|<br>
|<br>
|<br>
Line 837: Line 1,385:
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |
| bgcolor="#eeffff" |
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |[[Atomic Layer Deposition Recipes#Pt deposition .28ALD CHAMBER 1.29|R3]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
|-
| bgcolor="#eeffff" |<br>
!ZnS
| bgcolor="#eeffff" |{{rl|Atomic Layer Deposition Recipes|ZnO:Al deposition (ALD CHAMBER 1)}}
|
| bgcolor="#eeffff" |<br>
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|-
|-
! bgcolor="#d0e7ff" align="center" |Zr
! bgcolor="#d0e7ff" align="center" |Zr
|[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R2]]
|{{Al/E1}}
|<br>
|<br>
|<br>
|<br>
|[[E-Beam Evaporation Recipes#E-Beam 4 .28CHA.29|R2]]
|{{Al/E4}}
|[[Sputtering Recipes|A]]
|[[Sputtering Recipes|R1]]
|[[Sputtering Recipes|A]]
|[[Sputtering Recipes|R1]]
|<br>
|<br>
|<br>
|<br>
|<br>
|<br>
|<br>
|[[Thermal Evaporation Recipes#Thermal Evaporator 2|R1]]
|<br>
|<br>
|<br>
|<br>
Line 872: Line 1,437:
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |[[Atomic Layer Deposition Recipes#Pt deposition .28ALD CHAMBER 1.29|R4]]
| bgcolor="#eeffff" |{{rl|Atomic Layer Deposition Recipes|ZrO2 deposition (ALD CHAMBER 3)}}
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |<br>
|-
|-
Line 897: Line 1,462:
|}
|}


===Process Ranking Table===
Processes in the table above are ranked by their "''Process Maturity Level''" as follows:
{| class="wikitable"
|'''Process Level'''
| colspan="11" |'''Description of Process Level Ranking'''
|-
|A
| colspan="11" |Process '''A'''llowed and materials available but never done
|-
|R1
| colspan="11" |Process has been ran at least once
|-
|R2
| colspan="11" |Process has been ran and/or procedure is documented or/and data available
|-
|R3
| colspan="11" |Process has been ran, procedure is documented, and data is available
|-
|R4
| colspan="11" |Process has a documented procedure with regular (≥4x per year) data '''or''' lookahead/in-Situ control available
|-
|R5
| colspan="11" |Process has a documented procedure with regular (≥4x per year) data '''and''' lookahead/in-Situ control available
|-
|R6
| colspan="11" |Process has a documented procedure, regular ( ≥4x per year) data, and control charts/limits available
|}
[[Category:Processing]]
[[Category:Processing]]

Latest revision as of 21:57, 7 November 2024

Process Control Data

See linked page for process control data (calibration data over time, such as dep. rate, refractive index, stress etc.) over time, for a selection of highly used tools/films.

Deposition Tools/Materials Table

The Key/Legend for this table's A...R6 values is at the bottom of the page.

Vacuum Deposition Recipes

 E-Beam Evaporation Sputtering Thermal Evaporation Plasma Enhanced Chemical
Vapor Deposition (PECVD) 		Atomic Layer Deposition Molecular Vapor Deposition
Material E-Beam 1 (Sharon) E-Beam 2 (Custom) E-Beam 3 (Temescal) E-Beam 4 (CHA) Sputter 3
(AJA ATC 2000-F) 		Sputter 4
(AJA ATC 2200-V) 		Sputter 5 (AJA ATC 2200-V) Ion Beam
Deposition (Veeco Nexus) 		Thermal
Evap 1 		Thermal Evap 2 (Solder) PECVD 1
(PlasmaTherm 790) 		PECVD 2
(Advanced Vacuum) 		Unaxis VLR ICP-PECVD Atomic Layer Deposition (Oxford FlexAL) Molecular Vapor Deposition (Tool)
Ag R2
R2 R2 R1 R1

R1 R1




AgBr
AgCl
Al R2
R2 R2 R1 R3 R1 R1 R3 R1




Al2O3 R2

R3 R3 R1 R5




R4
As
AuPd R1
AuZn R1
AuSn R1
AuGe R1
AlN



R1 R1
R1




R4
Au R2
R2 R2 R1 R3

R3 R2




B













Be
C R3
Cd
CdS
CdTe
CaF2 R2
CeO2
R3












Co R2

R2 R3


R1 R1




Cr R1

R2 R3
R3
R3 R2




Cu R1


R3 R2

R2 R1




Fe R2

R2 R3


R1 R1




Ga
GaAs
Ge R2
R2 R2 R1 R1







GeO2 R2
Gd R2

R1










Hf R1


R1










HfO2



R1 R1






R4
Hg
In








R3




InSb
Ir R1

R1








ITO
R3

R1 R1
R1






KCl
LiF
Mg R1 R1
MgF2 R1 R1 R1
MgO R2
Mn
MnS
Mo R2


R3 R1






Na
NaCl
Nb R2



R3






NbO5
Nd



R1






Ni R2
R2 R2 R3


R3 R2




NiCr R2 R2 R3
NiFe R1 R2 R1 R3
Pb
PbS
Pd R2
R2 R2



R3 R1




Pt R2
R2 R2 R3 R3 R3




R4
Ru R2

R2
R3






R4
Sb
Se
Si
R2

R3 R1
R1

R3

SiN



R3 R1
R6

R6 R6 R6

SiN - Low Stress R4 R6 R6
SiO2 R2 R2

R3 R1 R2 R6
R6 R6 R6 R4
SiOx R1
SiO R1 R1
SiOxNy






R3

R4



Sn








R2




SrF2
R2





R1





Ta R1


R3 R1
R1





Ta2O5
R1
R1


R6





Ti R2
R2 R2 R3 R3 R3 R1





TiN




R3
R1




R4
TiW R1


R2 R3








TiO
TiO2
R2

R1 R3
R5



R4
V



R1 R1







W R2


R2 R3







WC
Zn







R3 R2




ZnO










R3
ZnS
Zr R2

R2 R1 R1


R1




ZrO2











R4
Material E-Beam 1 (Sharon) E-Beam 2 (Custom) E-Beam 3 (Temescal) E-Beam 4 (CHA) Sputter 3
(ATC 2000-F) 		Sputter 4
(ATC 2200-V) 		Sputter 5 (ATC 2200-V) Ion Beam
Deposition (Veeco Nexus) 		Thermal
Evap 1 		Thermal Evap 2 (Solder) PECVD 1
(PlasmaTherm 790) 		PECVD 2
(Advanced Vacuum) 		Unaxis VLR ICP-PECVD Atomic Layer Deposition (Oxford FlexAl) Molecular Vapor Deposition (Tool)

Process Ranking Table

Processes in the table above are ranked by their "Process Maturity Level" as follows:

Process Level Description of Process Level Ranking
A Process Allowed and materials available but never done
R1 Process has been ran at least once
R2 Process has been ran and/or procedure is documented or/and data available
R3 Process has been ran, procedure is documented, and data is available
R4 Process has a documented procedure with regular (≥4x per year) data or lookahead/in-Situ control available
R5 Process has a documented procedure with regular (≥4x per year) data and lookahead/in-Situ control available
R6 Process has a documented procedure, regular ( ≥4x per year) data, and control charts/limits available
Retrieved from "https://wiki.nanofab.ucsb.edu/w/index.php?title=Vacuum_Deposition_Recipes&oldid=162579"