Vacuum Deposition Recipes: Difference between revisions
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===Deposition Tools/Materials Table=== |
===Deposition Tools/Materials Table=== |
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''The Key/Legend for this table's <code>A...R6</code> values is at the [[Vacuum Deposition Recipes#Process Ranking Table|<u>bottom of the page</u>]].'' |
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*<small>'''R''': ''Recipe is available. Clicking this link will take you to the recipe.''</small> |
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*<small>'''A''': ''Material is available for use, but no recipes are provided.''</small> |
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! bgcolor="#d0e7ff" align="center" |Ag |
! bgcolor="#d0e7ff" align="center" |Ag |
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| bgcolor="#eeffff" | |
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R2]] |
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| bgcolor="#eeffff" |<br> |
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| bgcolor="#eeffff" |{{Al/E3}} |
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| bgcolor="#eeffff" |{{Al/E4}} |
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| bgcolor="#eeffff" |[[Sputtering Recipes|A]] |
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| bgcolor="#eeffff" |[[Sputtering Recipes|A]] |
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| bgcolor="#eeffff" |<br> |
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| bgcolor="#eeffff" |<br> |
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| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 3 .28Temescal.29|R2]] |
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| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 4 .28CHA.29|R2]] |
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| bgcolor="#eeffff" |[[Sputtering Recipes|R1]] |
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| bgcolor="#eeffff" |[[Sputtering Recipes|R1]] |
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| bgcolor="#eeffff" |[[Thermal Evaporation Recipes#Thermal Evaporator 1|R1]] |
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| bgcolor="#eeffff" |[[Thermal Evaporation Recipes#Thermal Evaporator 2|R1]] |
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!AgCl |
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! bgcolor="#d0e7ff" align="center" |Al |
! bgcolor="#d0e7ff" align="center" |Al |
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|[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R2]] |
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|{{Al/E1}} |
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|[[Sputtering Recipes|A]] |
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|{{rl|Sputtering Recipes|Al Deposition (Sputter 4)}} |
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|[[E-Beam Evaporation Recipes#E-Beam 3 .28Temescal.29|R2]] |
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|[[E-Beam Evaporation Recipes#E-Beam 4 .28CHA.29|R2]] |
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|[[Sputtering Recipes|R1]] |
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|R1 |
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|[[Thermal Evaporation Recipes| |
|[[Thermal Evaporation Recipes#Thermal Evaporator 1|R3]] |
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! bgcolor="#d0e7ff" align="center" |Al<sub>2</sub>O<sub>3</sub> |
! bgcolor="#d0e7ff" align="center" |Al<sub>2</sub>O<sub>3</sub> |
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| bgcolor="#eeffff" | |
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 2 .28Custom.29|R2]] |
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| bgcolor="#eeffff" |[[Sputtering Recipes| |
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| bgcolor="#eeffff" |[[Sputtering Recipes|R1]] |
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| bgcolor="#eeffff" |[[ |
| bgcolor="#eeffff" |[[Sputtering Recipes#Si3N4 deposition .28IBD.29|R5]] |
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| bgcolor="#eeffff" |[[Atomic Layer Deposition Recipes#Al2O3 deposition .28ALD CHAMBER 3.29|R4]] |
| bgcolor="#eeffff" |[[Atomic Layer Deposition Recipes#Al2O3 deposition .28ALD CHAMBER 3.29|R4]] |
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!AuZn |
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!AuSn |
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!AuGe |
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|[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R1]] |
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! bgcolor="#d0e7ff" align="center" |AlN |
! bgcolor="#d0e7ff" align="center" |AlN |
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! bgcolor="#d0e7ff" align="center" |Au |
! bgcolor="#d0e7ff" align="center" |Au |
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| bgcolor="#eeffff" | |
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R2]] |
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| bgcolor="#eeffff" |<br> |
| bgcolor="#eeffff" |<br> |
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| bgcolor="#eeffff" | |
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 3 .28Temescal.29|R2]] |
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| bgcolor="#eeffff" | |
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 4 .28CHA.29|R2]] |
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| bgcolor="#eeffff" |[[Sputtering Recipes| |
| bgcolor="#eeffff" |[[Sputtering Recipes|R1]] |
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| bgcolor="#eeffff" |R3 |
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| bgcolor="#eeffff" |[[Thermal Evaporation Recipes| |
| bgcolor="#eeffff" |[[Thermal Evaporation Recipes#Thermal Evaporator 1|R3]] |
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| bgcolor="#eeffff" |[[Thermal Evaporation Recipes| |
| bgcolor="#eeffff" |[[Thermal Evaporation Recipes#Thermal Evaporator 2|R2]] |
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!Be |
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! bgcolor="#d0e7ff" align="center" |C |
! bgcolor="#d0e7ff" align="center" |C |
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| bgcolor="#eeffff" align="center" |[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R3]] |
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!Cd |
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!CdS |
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!CdTe |
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!CaF2 |
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! bgcolor="#d0e7ff" align="center" |CeO<sub>2</sub> |
! bgcolor="#d0e7ff" align="center" |CeO<sub>2</sub> |
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| bgcolor="#eeffff" |<br> |
| bgcolor="#eeffff" |<br> |
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| bgcolor="#eeffff" | |
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 2 .28Custom.29|R3]] |
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! bgcolor="#d0e7ff" align="center" |Co |
! bgcolor="#d0e7ff" align="center" |Co |
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| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R2]] |
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| bgcolor="#eeffff" |<br> |
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| bgcolor="#eeffff" |<br> |
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| bgcolor="#eeffff" |{{Al/E4}} |
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| bgcolor="#eeffff" |[[Sputtering Recipes|R]] |
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| bgcolor="#eeffff" |<br> |
| bgcolor="#eeffff" |<br> |
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| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 4 .28CHA.29|R2]] |
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| bgcolor="#eeffff" |[[Sputtering Recipes|R3]] |
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| bgcolor="#eeffff" |<br> |
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| bgcolor="#eeffff" |<br> |
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| bgcolor="#eeffff" |[[Thermal Evaporation Recipes#Thermal Evaporator 1|R1]] |
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| bgcolor="#eeffff" |[[Thermal Evaporation Recipes#Thermal Evaporator 2|R1]] |
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! bgcolor="#d0e7ff" align="center" |Cr |
! bgcolor="#d0e7ff" align="center" |Cr |
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|[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R1]] |
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|{{Al/E1}} |
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|[[E-Beam Evaporation Recipes#E-Beam 4 .28CHA.29|R2]] |
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|{{Al/E4}} |
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|[https://wiki.nanotech.ucsb.edu/w/index.php?title=Sputtering_Recipes#Sputter_3_.28AJA_ATC_2000-F.29 |
|[https://wiki.nanotech.ucsb.edu/w/index.php?title=Sputtering_Recipes#Sputter_3_.28AJA_ATC_2000-F.29 R3] |
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|{{Rl|Sputtering_Recipes|Sputter_5_.28AJA_ATC_2200-V.29|R3}} |
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|[[Thermal Evaporation Recipes#Thermal Evaporator 1|R3]] |
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|[[Thermal Evaporation Recipes| |
|[[Thermal Evaporation Recipes#Thermal Evaporator 2|R2]] |
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|[[Thermal Evaporation Recipes|A]] |
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! bgcolor="#d0e7ff" align="center" |Cu |
! bgcolor="#d0e7ff" align="center" |Cu |
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| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R1]] |
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| bgcolor="#eeffff" | |
| bgcolor="#eeffff" |[[Sputtering Recipes|R3]] |
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| bgcolor="#eeffff" |[[Sputtering Recipes| |
| bgcolor="#eeffff" |[[Sputtering Recipes|R2]] |
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| bgcolor="#eeffff" |<br> |
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| bgcolor="#eeffff" |[[Thermal Evaporation Recipes#Thermal Evaporator 1|R2]] |
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| bgcolor="#eeffff" |[[Thermal Evaporation Recipes#Thermal Evaporator 2|R1]] |
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! bgcolor="#d0e7ff" align="center" |Fe |
! bgcolor="#d0e7ff" align="center" |Fe |
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|[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R2]] |
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|{{Al/E1}} |
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|<br> |
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|{{Al/E4}} |
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|[[Sputtering Recipes|R]] |
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|<br> |
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|[[E-Beam Evaporation Recipes#E-Beam 4 .28CHA.29|R2]] |
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|[[Sputtering Recipes|R3]] |
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|<br> |
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|<br> |
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|[[Thermal Evaporation Recipes#Thermal Evaporator 1|R1]] |
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!Ga |
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! bgcolor="#d0e7ff" align="center" |Ge |
! bgcolor="#d0e7ff" align="center" |Ge |
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| bgcolor="#eeffff" | |
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R2]] |
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| bgcolor="#eeffff" |<br> |
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| bgcolor="#eeffff" |{{Al/E3}} |
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| bgcolor="#eeffff" |{{Al/E4}} |
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| bgcolor="#eeffff" |[[Sputtering Recipes|A]] |
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| bgcolor="#eeffff" |[[Sputtering Recipes|A]] |
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| bgcolor="#eeffff" |<br> |
| bgcolor="#eeffff" |<br> |
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| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 3 .28Temescal.29|R2]] |
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| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 4 .28CHA.29|R2]] |
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| bgcolor="#eeffff" |[[Sputtering Recipes|R1]] |
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| bgcolor="#eeffff" |[[Sputtering Recipes|R1]] |
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! bgcolor="#d0e7ff" align="center" |GeO<sub>2</sub> |
! bgcolor="#d0e7ff" align="center" |GeO<sub>2</sub> |
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|[[E-Beam Evaporation Recipes#E-Beam 2 .28Custom.29|R2]] |
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! bgcolor="#d0e7ff" align="center" |Gd |
! bgcolor="#d0e7ff" align="center" |Gd |
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| bgcolor="#eeffff" | |
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R2]] |
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| bgcolor="#eeffff" | |
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| bgcolor="#eeffff" |<br>[[E-Beam Evaporation Recipes#E-Beam 4 .28CHA.29|R1]] |
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| bgcolor="#eeffff" |[[Thermal Evaporation Recipes| |
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| bgcolor="#eeffff" |[[Sputtering Recipes| |
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| bgcolor="#eeffff" |[[Sputtering Recipes| |
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! bgcolor="#d0e7ff" align="center" |Mo |
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| bgcolor="#eeffff" | |
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R2]] |
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| bgcolor="#eeffff" |[[Sputtering Recipes| |
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| bgcolor="#eeffff" |[[Sputtering Recipes| |
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! bgcolor="#d0e7ff" align="center" |Nb |
! bgcolor="#d0e7ff" align="center" |Nb |
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|[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R2]] |
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|{{Al/E1}} |
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Line 450: | Line 855: | ||
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Line 462: | Line 867: | ||
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! bgcolor="#d0e7ff" align="center" |Ni |
! bgcolor="#d0e7ff" align="center" |Ni |
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| bgcolor="#eeffff" | |
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R2]] |
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| bgcolor="#eeffff" |<br> |
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| bgcolor="#eeffff" | |
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 3 .28Temescal.29|R2]] |
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| bgcolor="#eeffff" | |
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 4 .28CHA.29|R2]] |
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| bgcolor="#eeffff" | |
| bgcolor="#eeffff" |[[Sputtering Recipes|R3]] |
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| bgcolor="#eeffff" |<br> |
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| bgcolor="#eeffff" |<br> |
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| bgcolor="#eeffff" |[[Thermal Evaporation Recipes| |
| bgcolor="#eeffff" |[[Thermal Evaporation Recipes#Thermal Evaporator 1|R3]] |
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| bgcolor="#eeffff" |[[Thermal Evaporation Recipes| |
| bgcolor="#eeffff" |[[Thermal Evaporation Recipes#Thermal Evaporator 2|R2]] |
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| bgcolor="#eeffff" |<br> |
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Line 479: | Line 884: | ||
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! bgcolor="#d0e7ff" align="center" |NiCr |
! bgcolor="#d0e7ff" align="center" |NiCr |
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|[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R2]] |
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|{{Al/E1}} |
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|[[E-Beam Evaporation Recipes#E-Beam 4 .28CHA.29|R2]] |
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Line 496: | Line 901: | ||
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! bgcolor="#d0e7ff" align="center" |NiFe |
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| bgcolor="#eeffff" | |
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R1]] |
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| bgcolor="#eeffff" | |
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| bgcolor="#eeffff" | |
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 4 .28CHA.29|R2]] |
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| bgcolor="#eeffff" |[[Sputtering Recipes| |
| bgcolor="#eeffff" |[[Sputtering Recipes|R1]] |
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! bgcolor="#d0e7ff" align="center" |Pd |
! bgcolor="#d0e7ff" align="center" |Pd |
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|[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R2]] |
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|{{Al/E1}} |
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|<br> |
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|[[E-Beam Evaporation Recipes#E-Beam 3 .28Temescal.29|R2]] |
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|{{Al/E3}} |
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|[[E-Beam Evaporation Recipes#E-Beam 4 .28CHA.29|R2]] |
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|[[Thermal Evaporation Recipes| |
|[[Thermal Evaporation Recipes#Thermal Evaporator 1|R3]] |
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|[[Thermal Evaporation Recipes| |
|[[Thermal Evaporation Recipes#Thermal Evaporator 2|R1]] |
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Line 530: | Line 969: | ||
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! bgcolor="#d0e7ff" align="center" |Pt |
! bgcolor="#d0e7ff" align="center" |Pt |
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| bgcolor="#eeffff" | |
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R2]] |
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| bgcolor="#eeffff" |<br> |
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| bgcolor="#eeffff" |{{Al/E3}} |
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| bgcolor="#eeffff" |{{Al/E4}} |
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| bgcolor="#eeffff" |[[Sputtering Recipes|A]] |
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| bgcolor="#eeffff" |{{rl|Sputtering Recipes|Sputter 4 (AJA ATC 2200-V)}} |
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| bcolor="EEFFFF" |{{rl|Sputtering Recipes|Sputter 5 (AJA ATC 2200-V)}} |
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| bgcolor="#eeffff" |<br> |
| bgcolor="#eeffff" |<br> |
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| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 3 .28Temescal.29|R2]] |
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| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 4 .28CHA.29|R2]] |
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| bgcolor="#eeffff" |[[Sputtering Recipes|R3]] |
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| bgcolor="#eeffff" |[[Sputtering Recipes|R3]] |
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| bcolor="EEFFFF" |[[Sputtering Recipes|R3]] |
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| bgcolor="#eeffff" |<br> |
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Line 547: | Line 986: | ||
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! bgcolor="#d0e7ff" align="center" |Ru |
! bgcolor="#d0e7ff" align="center" |Ru |
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|[[E-Beam Evaporation Recipes#E-Beam 1 .28Sharon.29|R2]] |
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|{{Al/E1}} |
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|<br> |
|<br> |
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|<br> |
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|[[E-Beam Evaporation Recipes#E-Beam 4 .28CHA.29|R2]] |
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|{{Al/E4}} |
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|<br> |
|<br> |
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|[[Sputtering Recipes#Ru Deposition .28Sputter 4.29| |
|[[Sputtering Recipes#Ru Deposition .28Sputter 4.29|R3]] |
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|<br> |
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|<br> |
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Line 562: | Line 1,001: | ||
|[[Atomic Layer Deposition Recipes#Pt deposition .28ALD CHAMBER 1.29|R4]] |
|[[Atomic Layer Deposition Recipes#Pt deposition .28ALD CHAMBER 1.29|R4]] |
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|<br> |
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! bgcolor="#d0e7ff" align="center" |Si |
! bgcolor="#d0e7ff" align="center" |Si |
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| bgcolor="#eeffff" |<br> |
| bgcolor="#eeffff" |<br> |
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| bgcolor="#eeffff" | |
| bgcolor="#eeffff" |[[E-Beam Evaporation Recipes#E-Beam 2 .28Custom.29|R2]] |
||
| bgcolor="#eeffff" |<br> |
| bgcolor="#eeffff" |<br> |
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| bgcolor="#eeffff" |<br> |
| bgcolor="#eeffff" |<br> |
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| bgcolor="#eeffff" |[[Sputtering Recipes| |
| bgcolor="#eeffff" |[[Sputtering Recipes|R3]] |
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| bgcolor="#eeffff" |[[Sputtering Recipes| |
| bgcolor="#eeffff" |[[Sputtering Recipes|R1]] |
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| bgcolor="#eeffff" |<br> |
| bgcolor="#eeffff" |<br> |
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| bgcolor="#eeffff" |R1 |
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| bgcolor="#eeffff" | |
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| bgcolor="#eeffff" |<br> |
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| bgcolor="#eeffff" |[https://wiki.nanotech.ucsb.edu/w/index.php?title=PECVD_Recipes#Amorphous-Si_deposition_.28PECVD_.232.29 R3] |
| bgcolor="#eeffff" |[https://wiki.nanotech.ucsb.edu/w/index.php?title=PECVD_Recipes#Amorphous-Si_deposition_.28PECVD_.232.29 R3] |
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Line 585: | Line 1,058: | ||
|<br> |
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|[[Sputtering Recipes|R3]] |
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|[[Sputtering Recipes| |
|[[Sputtering Recipes|R1]] |
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|<br> |
|<br> |
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|[[Sputtering Recipes#Si3N4 deposition .28IBD.29|R6]] |
|[[Sputtering Recipes#Si3N4 deposition .28IBD.29|R6]] |
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Line 593: | Line 1,066: | ||
|[[PECVD Recipes#SiN deposition .28PECVD .231.29|R6]] |
|[[PECVD Recipes#SiN deposition .28PECVD .231.29|R6]] |
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|[[PECVD Recipes#SiN deposition .28PECVD .232.29|R6]] |
|[[PECVD Recipes#SiN deposition .28PECVD .232.29|R6]] |
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| |
|[[PECVD Recipes#ICP-PECVD .28Unaxis VLR.29|R6]] |
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|<br> |
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| bgcolor="#eeffff" |[[Sputtering_Recipes#SiO2_deposition_.28IBD.29|R6]] |
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| bgcolor="#eeffff" |[[Thermal Evaporation Recipes| |
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===Process Ranking Table=== |
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Processes in the table above are ranked by their "''Process Maturity Level''" as follows: |
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{| class="wikitable" |
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|'''Process Level''' |
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| colspan="11" |'''Description of Process Level Ranking''' |
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|A |
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| colspan="11" |Process '''A'''llowed and materials available but never done |
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| colspan="11" |Process has been ran at least once |
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| colspan="11" |Process has been ran and/or procedure is documented or/and data available |
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| colspan="11" |Process has been ran, procedure is documented, and data is available |
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| colspan="11" |Process has a documented procedure with regular (≥4x per year) data '''or''' lookahead/in-Situ control available |
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| colspan="11" |Process has a documented procedure with regular (≥4x per year) data '''and''' lookahead/in-Situ control available |
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| colspan="11" |Process has a documented procedure, regular ( ≥4x per year) data, and control charts/limits available |
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[[Category:Processing]] |
[[Category:Processing]] |
Latest revision as of 21:57, 7 November 2024
Process Control Data
See linked page for process control data (calibration data over time, such as dep. rate, refractive index, stress etc.) over time, for a selection of highly used tools/films.
Deposition Tools/Materials Table
The Key/Legend for this table's A...R6
values is at the bottom of the page.
Process Ranking Table
Processes in the table above are ranked by their "Process Maturity Level" as follows:
Process Level | Description of Process Level Ranking | ||||||||||
A | Process Allowed and materials available but never done | ||||||||||
R1 | Process has been ran at least once | ||||||||||
R2 | Process has been ran and/or procedure is documented or/and data available | ||||||||||
R3 | Process has been ran, procedure is documented, and data is available | ||||||||||
R4 | Process has a documented procedure with regular (≥4x per year) data or lookahead/in-Situ control available | ||||||||||
R5 | Process has a documented procedure with regular (≥4x per year) data and lookahead/in-Situ control available | ||||||||||
R6 | Process has a documented procedure, regular ( ≥4x per year) data, and control charts/limits available |