Bill Mitchell: Difference between revisions
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|email = mitchell@ece.ucsb.edu |
|email = mitchell@ece.ucsb.edu |
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=About= |
=About= |
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=Current Work= |
=Current Work= |
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Nullam auctor ligula vel tortor luctus porttitor quis vitae arcu. Mauris venenatis tincidunt leo, vel vehicula lacus ornare in. Suspendisse blandit egestas lectus, sed hendrerit metus condimentum sed. Etiam adipiscing sagittis mattis. Class aptent taciti sociosqu ad litora torquent per conubia nostra, per inceptos himenaeos. Phasellus eu velit justo, nec semper lacus. Sed a quam orci. Maecenas in semper tortor. Etiam ac nunc dui, in laoreet est. Fusce erat nisl, pellentesque iaculis cursus et, sollicitudin a quam. Mauris quis ligula vel enim viverra eleifend. Sed cursus commodo sodales. Nullam dictum odio in augue pharetra placerat. Sed ligula quam, laoreet id sodales at, lacinia a ligula. |
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=Tools= |
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{{PAGENAME}} is in charge of the following tools: |
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* [[E-Beam Lithography System (JEOL JBX-6300FS)]] |
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* [[Atomic Force Microscope (Dimension 3100/Nanoscope IVA)]] |
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* [[Field Emission SEM 2 (JEOL 7600F)]] |
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* [[Atomic Layer Deposition (Oxford FlexAL)]] |
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Latest revision as of 18:32, 23 March 2020
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About
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.
Current Work
.
.
Tools
Bill Mitchell is in charge of the following tools: