Vacuum Deposition Recipes: Difference between revisions

Revision as of 17:30, 18 July 2012

Vacuum Deposition Recipes
	E-Beam Evaporation				Sputtering					Thermal Evaporation		Plasma Enhanced Chemical Vapor Deposition (PECVD)			Atomic Layer Deposition	Ion-Beam Deposition (IBD)	Molecular Vapor Deposition
Material	E-Beam 1 (Sharon)	E-Beam 2 (Custom)	E-Beam 3 (Temescal)	E-Beam 4 (CHA)	Sputter 1 (Custom)	Sputter 2 (SFI Endeavor)	Sputter 3 (ATC 2000-F)	Sputter 4 (ATC 2200-V)	Sputter 5 (Lesker AXXIS)	Thermal Evap 1	Thermal Evap 2 (Solder)	PECVD 1 (PlasmaTherm 790)	PECVD 2 (Advanced Vacuum)	Unaxis VLR ICP-PECVD
Ag
Al
Al₂O₃
AlN
Au
B
Co
Cr
Cu
Fe
Ge
Hf
HfO₂
In
Ir
ITO
Mo
Nb
Ni
Pd
Pt
Ru
Si
SiN												Y	Y
SiO₂												Y	Y
SiO_xN_y
Sn
SrF₂
Ta
Ta₂O₅
Ti
TiN
TiO₂
V
W
Zn
ZnO₂
Zr
ZrO₂
Material	E-Beam 1 (Sharon)	E-Beam 2 (Custom)	E-Beam 3 (Temescal)	E-Beam 4 (CHA)	Sputter 1 (Custom)	Sputter 2 (SFI Endeavor)	Sputter 3 (ATC 2000-F)	Sputter 4 (ATC 2200-V)	Sputter 5 (Lesker AXXIS)	Thermal 1	Thermal 2	PECVD 1 (PlasmaTherm 790)	PECVD 2 (Advanced Vacuum)	Unaxis VLR ICP-PECVD	Atomic Layer Deposision	Ion Beam Deposition	Molecular Vapor Deposition

@@ Line 480: / Line 480: @@
 |
 |
-| [[Vacuum Deposition Recipes#SiN_deposition_.28PECVD_.231.29|Y]]
+| [[PECVD Recipes#SiN_deposition_.28PECVD_.231.29|Y]]
-| [[Vacuum Deposition Recipes#SiN deposition (PECVD #2)|Y]]
+| [[PECVD Recipes#SiN deposition (PECVD #2)|Y]]
 |
 |
@@ Line 499: / Line 499: @@
 | bgcolor="EEFFFF" |
 | bgcolor="EEFFFF" |
-| bgcolor="EEFFFF" | [[Vacuum Deposition Recipes#SiO2 deposition (PECVD #1)|Y]]
+| bgcolor="EEFFFF" | [[PECVD Recipes#SiO2 deposition (PECVD #1)|Y]]
-| bgcolor="EEFFFF" | [[Vacuum Deposition Recipes#SiO2 deposition (PECVD #2)|Y]]
+| bgcolor="EEFFFF" | [[PECVD Recipes#SiO2 deposition (PECVD #2)|Y]]
 | bgcolor="EEFFFF" |
 | bgcolor="EEFFFF" |