Vacuum Deposition Recipes: Difference between revisions

From UCSB Nanofab Wiki
Jump to navigation Jump to search
No edit summary
No edit summary
Line 1: Line 1:
{| border="1" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;" class="collapsible wikitable"
{| border="1" class="collapsible wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;"
|- bgcolor="#D0E7FF"
|- bgcolor="#D0E7FF"
! width="1675" height="45" colspan="18" | <div style="font-size: 150%;">Vacuum Deposition Recipes</div>
! width="1675" height="45" colspan="18" | <div style="font-size: 150%;">Vacuum Deposition Recipes</div>
Line 13: Line 13:
|-
|-
! width="75" bgcolor="#D0E7FF" align="center" | '''Material'''
! width="75" bgcolor="#D0E7FF" align="center" | '''Material'''
| width="65" | [[E-Beam 1 (Sharon)]]
| width="65" bgcolor="#DAF1FF" | [[E-Beam 1 (Sharon)]]
| width="65" | [[E-Beam 2 (Custom)]]
| width="65" bgcolor="#DAF1FF" | [[E-Beam 2 (Custom)]]
| width="65" | [[E-Beam 3 (Temescal)]]
| width="65" bgcolor="#DAF1FF" | [[E-Beam 3 (Temescal)]]
| width="65" | [[E-Beam 4 (CHA)]]
| width="65" bgcolor="#DAF1FF" | [[E-Beam 4 (CHA)]]
| width="65" | [[Sputter 1 (Custom)]]
| width="65" bgcolor="#DAF1FF" | [[Sputter 1 (Custom)]]
| width="85" | [[Sputter 2 (SFI Endeavor)|Sputter 2<br>(SFI Endeavor)]]
| width="65" bgcolor="#DAF1FF" | [[Sputter 2 (SFI Endeavor)|Sputter 2<br>(SFI Endeavor)]]
| width="75" | [[Sputter 3 (ATC 2000-F)|Sputter 3<br>(ATC 2000-F)]]
| width="65" bgcolor="#DAF1FF" | [[Sputter 3 (ATC 2000-F)|Sputter 3<br>(ATC 2000-F)]]
| width="75" | [[Sputter 4 (ATC 2200-V)|Sputter 4<br>(ATC 2200-V)]]
| width="65" bgcolor="#DAF1FF" | [[Sputter 4 (ATC 2200-V)|Sputter 4<br>(ATC 2200-V)]]
| width="85" | [[Sputter 5 (Lesker AXXIS)]]
| width="65" bgcolor="#DAF1FF" | [[Sputter 5 (Lesker AXXIS)]]
| width="65" | [[Thermal Evap 1]]
| width="65" bgcolor="#DAF1FF" | [[Thermal Evap 1]]
| width="65" | [[Thermal Evap 2 (Solder)]]
| width="65" bgcolor="#DAF1FF" | [[Thermal Evap 2 (Solder)]]
| width="115" | [[PECVD 1 (PlasmaTherm 790)|PECVD 1<br>(PlasmaTherm 790)]]
| width="65" bgcolor="#DAF1FF" | [[PECVD 1 (PlasmaTherm 790)|PECVD 1<br>(PlasmaTherm 790)]]
| width="115" | [[PECVD 2 (Advanced Vacuum)|PECVD 2<br>(Advanced Vacuum)]]
| width="65" bgcolor="#DAF1FF" | [[PECVD 2 (Advanced Vacuum)|PECVD 2<br>(Advanced Vacuum)]]
| width="75" | [[Unaxis VLR ICP-PECVD]]
| width="65" bgcolor="#DAF1FF" | [[Unaxis VLR ICP-PECVD]]
| width="65" bgcolor="#DAF1FF" |
|
| width="65" bgcolor="#DAF1FF" |
|
| width="65" bgcolor="#DAF1FF" |
|
|-
|-
! width="75" bgcolor="#D0E7FF" align="center" | Ag
! width="75" bgcolor="#D0E7FF" align="center" | Ag
| bgcolor="EEFFFF" |
| bgcolor="EEFFFF" |
| bgcolor="EEFFFF" |
| bgcolor="EEFFFF" |
| bgcolor="EEFFFF" |
| bgcolor="EEFFFF" |
Line 481: Line 481:
|
|
| [[PECVD Recipes#SiN_deposition_.28PECVD_.231.29|Y]]
| [[PECVD Recipes#SiN_deposition_.28PECVD_.231.29|Y]]
| [[PECVD Recipes#SiN deposition (PECVD #2)|Y]]
| [[PECVD Recipes#SiN_deposition_.28PECVD_.232.29|Y]]
|
|
|
|
Line 499: Line 499:
| bgcolor="EEFFFF" |
| bgcolor="EEFFFF" |
| bgcolor="EEFFFF" |
| bgcolor="EEFFFF" |
| bgcolor="EEFFFF" | [[PECVD Recipes#SiO2 deposition (PECVD #1)|Y]]
| bgcolor="EEFFFF" | [[PECVD Recipes#SiO2_deposition_.28PECVD_.231.29|Y]]
| bgcolor="EEFFFF" | [[PECVD Recipes#SiO2 deposition (PECVD #2)|Y]]
| bgcolor="EEFFFF" | [[PECVD Recipes#SiO2_deposition_.28PECVD_.232.29|Y]]
| bgcolor="EEFFFF" |
| bgcolor="EEFFFF" |
| bgcolor="EEFFFF" |
| bgcolor="EEFFFF" |
Line 770: Line 770:
| bgcolor="EEFFFF" |
| bgcolor="EEFFFF" |
| bgcolor="EEFFFF" |
| bgcolor="EEFFFF" |
| bgcolor="EEFFFF" |
| bgcolor="EEFFFF" |
|-
|-
! width="75" bgcolor="#D0E7FF" align="center" | '''Material'''
! width="75" bgcolor="#D0E7FF" align="center" | '''Material'''
| width="65" | [[E-Beam 1 (Sharon)]]
| width="65" bgcolor="#DAF1FF" | [[E-Beam 1 (Sharon)]]
| width="65" | [[E-Beam 2 (Custom)]]
| width="65" bgcolor="#DAF1FF" | [[E-Beam 2 (Custom)]]
| width="65" | [[E-Beam 3 (Temescal)]]
| width="65" bgcolor="#DAF1FF" | [[E-Beam 3 (Temescal)]]
| width="65" | [[E-Beam 4 (CHA)]]
| width="65" bgcolor="#DAF1FF" | [[E-Beam 4 (CHA)]]
| width="65" | [[Sputter 1 (Custom)]]
| width="65" bgcolor="#DAF1FF" | [[Sputter 1 (Custom)]]
| width="85" | [[Sputter 2 (SFI Endeavor)|Sputter 2<br>(SFI Endeavor)]]
| width="65" bgcolor="#DAF1FF" | [[Sputter 2 (SFI Endeavor)|Sputter 2<br>(SFI Endeavor)]]
| width="75" | [[Sputter 3 (ATC 2000-F)|Sputter 3<br>(ATC 2000-F)]]
| width="65" bgcolor="#DAF1FF" | [[Sputter 3 (ATC 2000-F)|Sputter 3<br>(ATC 2000-F)]]
| width="75" | [[Sputter 4 (ATC 2200-V)|Sputter 4<br>(ATC 2200-V)]]
| width="65" bgcolor="#DAF1FF" | [[Sputter 4 (ATC 2200-V)|Sputter 4<br>(ATC 2200-V)]]
| width="85" | [[Sputter 5 (Lesker AXXIS)]]
| width="65" bgcolor="#DAF1FF" | [[Sputter 5 (Lesker AXXIS)]]
| width="65" | [[Thermal 1]]
| width="65" bgcolor="#DAF1FF" | [[Thermal 1]]
| width="65" | [[Thermal 2]]
| width="65" bgcolor="#DAF1FF" | [[Thermal 2]]
| width="115" | [[PECVD 1 (PlasmaTherm 790)|PECVD 1<br>(PlasmaTherm 790)]]
| width="65" bgcolor="#DAF1FF" | [[PECVD 1 (PlasmaTherm 790)|PECVD 1<br>(PlasmaTherm 790)]]
| width="115" | [[PECVD 2 (Advanced Vacuum)|PECVD 2<br>(Advanced Vacuum)]]
| width="65" bgcolor="#DAF1FF" | [[PECVD 2 (Advanced Vacuum)|PECVD 2<br>(Advanced Vacuum)]]
| width="75" | [[Unaxis VLR ICP-PECVD]]
| width="65" bgcolor="#DAF1FF" | [[Unaxis VLR ICP-PECVD]]
| [[Atomic Layer Deposision (Oxford FlexAL)|Atomic Layer Deposision]]
| width="65" bgcolor="#DAF1FF" | [[Atomic Layer Deposision (Oxford FlexAL)|Atomic Layer Deposision]]
| [[Ion Beam Deposition (Veeco NEXUS)|Ion Beam Deposition]]
| width="65" bgcolor="#DAF1FF" | [[Ion Beam Deposition (Veeco NEXUS)|Ion Beam Deposition]]
| [[Molecular Vapor Deposition]]
| width="65" bgcolor="#DAF1FF" | [[Molecular Vapor Deposition]]
|-
|}
|}

Revision as of 17:33, 18 July 2012

Vacuum Deposition Recipes

 E-Beam Evaporation Sputtering Thermal Evaporation Plasma Enhanced Chemical
Vapor Deposition (PECVD) 		Atomic Layer Deposition Ion-Beam Deposition (IBD) Molecular Vapor Deposition
Material E-Beam 1 (Sharon) E-Beam 2 (Custom) E-Beam 3 (Temescal) E-Beam 4 (CHA) Sputter 1 (Custom) Sputter 2
(SFI Endeavor) 		Sputter 3
(ATC 2000-F) 		Sputter 4
(ATC 2200-V) 		Sputter 5 (Lesker AXXIS) Thermal Evap 1 Thermal Evap 2 (Solder) PECVD 1
(PlasmaTherm 790) 		PECVD 2
(Advanced Vacuum) 		Unaxis VLR ICP-PECVD
Ag
Al
















Al2O3
AlN
















Au
B
















Co
Cr
















Cu
Fe
















Ge
Hf
















HfO2
In
















Ir
ITO
Mo
Nb
Ni
Pd
Pt
Ru
Si
SiN Y Y
SiO2 Y Y
SiOxNy
Sn
SrF2
Ta
Ta2O5
Ti
TiN
TiO2
V
W
Zn
ZnO2
Zr
ZrO2
Material E-Beam 1 (Sharon) E-Beam 2 (Custom) E-Beam 3 (Temescal) E-Beam 4 (CHA) Sputter 1 (Custom) Sputter 2
(SFI Endeavor) 		Sputter 3
(ATC 2000-F) 		Sputter 4
(ATC 2200-V) 		Sputter 5 (Lesker AXXIS) Thermal 1 Thermal 2 PECVD 1
(PlasmaTherm 790) 		PECVD 2
(Advanced Vacuum) 		Unaxis VLR ICP-PECVD Atomic Layer Deposision Ion Beam Deposition Molecular Vapor Deposition
Retrieved from "https://wiki.nanofab.ucsb.edu/w/index.php?title=Vacuum_Deposition_Recipes&oldid=1190"