Vacuum Deposition Recipes: Difference between revisions

Revision as of 15:46, 19 September 2017

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Vacuum Deposition Recipes
	E-Beam Evaporation				Sputtering						Thermal Evaporation		Plasma Enhanced Chemical Vapor Deposition (PECVD)			Atomic Layer Deposition	Molecular Vapor Deposition
Material	E-Beam 1 (Sharon)	E-Beam 2 (Custom)	E-Beam 3 (Temescal)	E-Beam 4 (CHA)	Sputter 1 (Custom)	Sputter 2 (SFI Endeavor)	Sputter 3 (ATC 2000-F)	Sputter 4 (ATC 2200-V)	Sputter 5 (Lesker AXXIS)	Ion Beam Deposition (Veeco Nexus)	Thermal Evap 1	Thermal Evap 2 (Solder)	PECVD 1 (PlasmaTherm 790)	PECVD 2 (Advanced Vacuum)	Unaxis VLR ICP-PECVD	Atomic Layer Deposition (Oxford FlexAL)	Molecular Vapor Deposition (Tool)
Ag	A		A	A			A	A
Al	A		A	A		R1	A	R			A	A
Al₂O₃	A	A					A	A		A						R1
AlN						R1	A	A		A						R1
Au	A		A	A		R1	A	R1			A	A
B
C	R1
CeO₂		CeO₂ deposition (E-Beam 2)
Co	A			A			R
Cr	A			A			R				A	A
Cu	A						A R1	A
Fe	A			A			R
Ge	A		A	A			A	A
GeO₂		A
Gd	A			A
Hf	A
HfO₂							A	A								R1
In												A
Ir	A
ITO		ITO deposition (E-Beam 2)					A	A		A
MgF2							A	A
MgO		A
Mo	A						R	A
Nb	A							R
Nd								A
Ni	A		A	A			R1				A	A
NiCr	A			A
NiFe	A			A			A
Pd	A		A	A							A	A
Pt	A		A	A			A	R1								R1
Ru	A			A
Si		A					R	A						Amorphous-Si deposition (PECVD#2	R
SiN							R1	A		R			R1	R1	R1
SiO₂	A	A					R1	A	A	R			R1	R1	R1	R1
SiO_xN_y										A			R
Sn												A
SrF₂		A
Ta	A						R1	A
Ta₂O₅				A						R
Ti	A		A	A			A R1	R1
TiN						A		R		A						R1
TiW	A						A	R1
TiO₂		A				R1	A	A R1		R						R1
V							A	A
W	A						A	R1
Zn											A	A
ZnO																R1
Zr	A			A			A	A
ZrO₂																R1
Material	E-Beam 1 (Sharon)	E-Beam 2 (Custom)	E-Beam 3 (Temescal)	E-Beam 4 (CHA)	Sputter 1 (Custom)	Sputter 2 (SFI Endeavor)	Sputter 3 (ATC 2000-F)	Sputter 4 (ATC 2200-V)	Sputter 5 (Lesker AXXIS)	Ion Beam Deposition (Veeco Nexus)	Thermal Evap 1	Thermal Evap 2 (Solder)	PECVD 1 (PlasmaTherm 790)	PECVD 2 (Advanced Vacuum)	Unaxis VLR ICP-PECVD	Atomic Layer Deposition (Oxford FlexAl)	Molecular Vapor Deposition (Tool)

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