PECVD Recipes: Difference between revisions
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(→PECVD 1 (PlasmaTherm 790): added placeholders for varying-stress SiN & SiOxNy) |
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*[[media:PECVD1-SiN-Recipe.pdf|SiN Deposition Recipe]] |
*[[media:PECVD1-SiN-Recipe.pdf|SiN Deposition Recipe]] |
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*[[media:PECVD1-SiN-Data.pdf|SiN Deposition Particle Thickness Data]] |
*[[media:PECVD1-SiN-Data.pdf|SiN Deposition Particle Thickness Data]] |
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<!-- Placeholders - Not uploaded yet--> |
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* [[media:PECVD1-SiON-Recipe.pdf|Low Stress Si<sub>3</sub>N<sub>4</sub> - Variable Stress Recipes]] |
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* [[media:PECVD1-SiON-Recipe.pdf|Low Stress Si<sub>3</sub>N<sub>4</sub> - Variable Stress Plot]] |
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== SiO<sub>2</sub> deposition (PECVD #1) == |
== SiO<sub>2</sub> deposition (PECVD #1) == |
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*[[media:PECVD1-SiO2-Recipe.pdf|SiO<sub>2</sub> Deposition Recipe]] |
*[[media:PECVD1-SiO2-Recipe.pdf|SiO<sub>2</sub> Deposition Recipe]] |
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*[[media:PECVD1-SiO2-Data.pdf|SiO<sub>2</sub> Deposition Particle Thickness Data]] |
*[[media:PECVD1-SiO2-Data.pdf|SiO<sub>2</sub> Deposition Particle Thickness Data]] |
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== SiO<sub>x</sub>N<sub>y</sub> deposition (PECVD #1) == |
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<!-- Placeholders - Not uploaded yet--> |
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*[[media:PECVD1-SiON-Recipe.pdf|SiO<sub>x</sub>N<sub>y</sub> Deposition Recipes - Varying N/O Ratio]] |
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*[[media:PECVD1-SiON-Plot.pdf|SiO<sub>x</sub>N<sub>y</sub> Stress/Index vs. O/N Ratio]] |
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=[[PECVD 2 (Advanced Vacuum)]]= |
=[[PECVD 2 (Advanced Vacuum)]]= |
Revision as of 21:02, 13 August 2013
Back to Vacuum Deposition Recipes.
PECVD 1 (PlasmaTherm 790)
SiN deposition (PECVD #1)
- SiN Deposition Recipe
- SiN Deposition Particle Thickness Data
- Low Stress Si3N4 - Variable Stress Recipes
- Low Stress Si3N4 - Variable Stress Plot
SiO2 deposition (PECVD #1)
SiOxNy deposition (PECVD #1)
PECVD 2 (Advanced Vacuum)
SiN deposition (PECVD #2)
SiO2 deposition (PECVD #2)
ICP-PECVD (Unaxis VLR)
SiN deposition (Unaxis VLR)
SiN (2% SiH4)
SiN (2% SiH4 - No-Ar)
50° | 100° | 250° |
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SiN (2% SiH4 - No-Ar - Extra N2)
50° | 100° | 250° |
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SiN (100% SiH4 )
50° | 100° | 250° |
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SiO2 deposition (Unaxis VLR)
SiO2 (2% SiH4)
50° | 100° | 250° |
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SiO2 (2% SiH4 - No Ar)
50° | 100° | 250° |
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SiO2 (100% SiH4 HDR)
50° | 100° | 250° |
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SiO2 (100% SiH4 LDR)
50° | 100° | 250° |
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