Sputtering Recipes: Difference between revisions
Jump to navigation
Jump to search
(→TiO{{sub|2}} deposition (IBD): rates & indices) |
|||
| Line 6: | Line 6: | ||
=[[Sputter 5 (Lesker AXXIS)]]= |
=[[Sputter 5 (Lesker AXXIS)]]= |
||
=[[Ion Beam Deposition (Veeco NEXUS)]]= |
=[[Ion Beam Deposition (Veeco NEXUS)]]= |
||
[https://docs.google.com/spreadsheet/ccc?key=0AuBs1GfMrpnXcEdXanZQNko3X0lUcHhVUlNyYnVDUkE&usp=sharing IBD Calibrations Spreadsheet] - Records of historical film depositions (rates, indices), Uniformity etc. |
[https://docs.google.com/spreadsheet/ccc?key=0AuBs1GfMrpnXcEdXanZQNko3X0lUcHhVUlNyYnVDUkE&usp=sharing IBD Calibrations Spreadsheet] - Records of historical film depositions (rates, indices), Uniformity etc. |
||
'''All users are required to enter their calibration deps (simple test deps only)''' |
|||
==SiO{{sub|2}} deposition (IBD)== |
==SiO{{sub|2}} deposition (IBD)== |
||
Revision as of 20:12, 13 August 2013
Back to Vacuum Deposition Recipes.
Sputter 1 (Custom)
Sputter 2 (SFI Endeavor)
Sputter 3 (AJA ATC 2000-F)
Sputter 4 (AJA ATC 2200-V)
Sputter 5 (Lesker AXXIS)
Ion Beam Deposition (Veeco NEXUS)
IBD Calibrations Spreadsheet - Records of historical film depositions (rates, indices), Uniformity etc.
All users are required to enter their calibration deps (simple test deps only)
SiO2 deposition (IBD)
- Refractive Index: ≈1.485
- Rate: ≈6.1nm/min (users must calibrate this prior to critical deps)
- Stress ≈ -320MPa (compressive)
Si3N4 deposition (IBD)
- Refractive Index ≈ 2.01
- Rate ≈ 4.5nm/min (users must calibrate this prior to critical deps)
- Stress ≈ -1756MPa (compressive)
Ta2O5 deposition (IBD)
- Refractive Index ≈ 2.10
- Rate ≈7.8nm/min (users must calibrate this prior to critical deps)
- Stress ≈ -140MPa (compressive)
TiO2 deposition (IBD)
- Refractive Index ≈ 2.3-2.4
- Rate ≈ 1.8nm/min
- Recipe: TiO2_dep