Tube Furnace (Tystar 8300): Difference between revisions
(→Process Information: recipe descriptions, added AlGaAs.001) |
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=Process Information= |
=Process Information= |
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Use the BYU Thermal Oxidation |
Use the [http://cleanroom.byu.edu/OxideTimeCalc BYU] or [http://www.lelandstanfordjunior.com/thermaloxide.html Stanford] Thermal Oxidation Calculators to determine the time and temperature that will be necessary for your process needs. You can "calibrate" your oxidations to the Stanford calculator by adjusting the ''Partial Pressure'' on the calculator to match your experimental data. |
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Keep in mind that all process must be 30 minutes in length at a minimum. Processes less than 30 minutes will suffer from poor uniformity because the process tube will not have sufficient time to saturate with O<sub>2</sub> or DI-H<sub>2</sub>O. |
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=Recipes= |
=Recipes= |
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Tube 1 |
Tube 1: |
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* SOG425.001 - ''Spin-On Glass Cure'' |
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* ALGAAS.001 - ''Oxidation of AlGaAs'' |
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Tube 2 - WET1050.002, DRY1050.002, WETVAR.002, DRYVAR.002 |
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Tube 2: |
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* WET1050.002 - ''WetOx at 1050°C'' |
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Tube 3 - WET1050.003, DRY1050.003, WETVAR.003, DRYVAR.003, ANNEAL.003 |
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* DRY1050.002 - ''DryOx at 1050°C'' |
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* WETVAR.002 - ''WetOx, variable temp.'' |
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* DRYVAR.002 - ''DryOx, variable temp.'' |
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Tube 3: |
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* WET1050.003 - ''WetOx at 1050°C'' |
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* DRY1050.003 - ''DryOx at 1050°C'' |
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* WETVAR.003 - ''WetOx, variable temp.'' |
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* DRYVAR.003 - ''DryOx, variable temp.'' |
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* ANNEAL.003 - ''Anneal with variable time and temperature'' |
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=Useful Information= |
=Useful Information= |
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=Operational Instructions= |
=Operational Instructions= |
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*[[media: |
*[[media:Tystar Operational Procedure.pdf|Operating Instructions]] |
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Revision as of 22:58, 24 January 2018
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About
The three stack Tystar 8” furnace is used primarily for 3 processes. The processes are dedicated for one tube each:
- SOG curing - Tube 1
- Dry or wet oxidation of silicon - Tubes 2 and 3
- General furnace annealing - Tube 3
Each process tube can accomodate up to one hundred 8” wafers per cycle. We have boats for 2", 3", 4", 6", 8" and irregular shaped pieces. The maximum temperature is 1050°C for the system. Gases used are O2, Steam from DI-H2O, N2.
Process Information
Use the BYU or Stanford Thermal Oxidation Calculators to determine the time and temperature that will be necessary for your process needs. You can "calibrate" your oxidations to the Stanford calculator by adjusting the Partial Pressure on the calculator to match your experimental data.
Keep in mind that all process must be 30 minutes in length at a minimum. Processes less than 30 minutes will suffer from poor uniformity because the process tube will not have sufficient time to saturate with O2 or DI-H2O.
Recipes
Tube 1:
- SOG425.001 - Spin-On Glass Cure
- ALGAAS.001 - Oxidation of AlGaAs
Tube 2:
- WET1050.002 - WetOx at 1050°C
- DRY1050.002 - DryOx at 1050°C
- WETVAR.002 - WetOx, variable temp.
- DRYVAR.002 - DryOx, variable temp.
Tube 3:
- WET1050.003 - WetOx at 1050°C
- DRY1050.003 - DryOx at 1050°C
- WETVAR.003 - WetOx, variable temp.
- DRYVAR.003 - DryOx, variable temp.
- ANNEAL.003 - Anneal with variable time and temperature
Useful Information
Tystar Wafer Boat Drawing - 4" Wafer with 0.5mm Slots
See Also
- Tystar - Manufacturer of the tool
- Silicon Thermal Oxide Thickness Calculator - Use this on-line calculator to calculate times for silicon oxidation.